Patents by Inventor Masakazu Ihara

Masakazu Ihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170252889
    Abstract: A polishing apparatus includes a table rotating motor configured to rotate a polishing table about its own axis, a top ring rotating motor configured to rotate a top ring about its own axis, a dresser configured to dress a polishing pad, and a pad-height measuring device configured to measure a height of the polishing pad. The polishing apparatus also includes a diagnostic device configured to calculate an amount of wear of the polishing pad from the height of the polishing pad and to determine the end of a life of the polishing pad based on the amount of the wear of the polishing pad, the torque or current of the table rotating motor, and the torque or current of the top ring rotating motor.
    Type: Application
    Filed: May 19, 2017
    Publication date: September 7, 2017
    Inventors: Katsuhide WATANABE, Masakazu IHARA
  • Patent number: 9687955
    Abstract: A polishing apparatus includes a table rotating motor configured to rotate a polishing table about its own axis, a top ring rotating motor configured to rotate a top ring about its own axis, a dresser configured to dress a polishing pad, and a pad-height measuring device configured to measure a height of the polishing pad. The polishing apparatus also includes a diagnostic device configured to calculate an amount of wear of the polishing pad from the height of the polishing pad and to determine the end of a life of the polishing pad based on the amount of the wear of the polishing pad, the torque or current of the table rotating motor, and the torque or current of the top ring rotating motor.
    Type: Grant
    Filed: September 8, 2011
    Date of Patent: June 27, 2017
    Assignee: EBARA CORPORATION
    Inventors: Katsuhide Watanabe, Masakazu Ihara
  • Publication number: 20120064800
    Abstract: A polishing apparatus includes: a table rotating motor configured to rotate the polishing table about its own axis; a top ring rotating motor configured to rotate the top ring about its own axis; a dresser configured to dress the polishing pad; a pad-height measuring device configured to measure a height of the polishing pad; and a diagnostic device configured to calculate an amount of wear of the polishing pad from the height of the polishing pad and to determine the end of a life of the polishing pad based on the amount of the wear of the polishing pad, the torque or current of the table rotating motor, and the torque or current of the top ring rotating motor.
    Type: Application
    Filed: September 8, 2011
    Publication date: March 15, 2012
    Inventors: Katsuhide WATANABE, Masakazu Ihara