Patents by Inventor Masakazu Odaka

Masakazu Odaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liquid crystal device and method for manufacturing same with spacers formed by photolithography
    Patent number: 6853431
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: February 8, 2005
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Masakazu Odaka, Akira Mase, Toru Takayama, Kaoru Tabata, Chizuru Ishigaki, Ippei Kobayashi, Toshimitsu Konuma, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Hiroyuki Sakayori, Akio Osabe, Shunpei Yamazaki
  • CVD apparatus
    Publication number: 20030140941
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Application
    Filed: January 10, 2003
    Publication date: July 31, 2003
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
  • Liquid crystal device and method for manufacturing same with spacers formed by photolithography
    Publication number: 20030071957
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.
    Type: Application
    Filed: November 27, 2002
    Publication date: April 17, 2003
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Masakazu Odaka, Akira Mase, Toru Takayama, Kaoru Tabata, Chizuru Ishigaki, Ippei Kobayashi, Toshimitsu Konuma, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Hiroyuki Sakayori, Akio Osabe, Shunpei Yamazaki
  • CVD apparatus
    Patent number: 6520189
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: September 17, 1999
    Date of Patent: February 18, 2003
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
  • Liquid crystal device and method for manufacturing same with spacers formed by photolithography
    Patent number: 6493057
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: December 10, 2002
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Toshimitsu Konuma, Masakazu Odaka, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Kaoru Tabata, Chizuru Isigaki, Hiroyuki Sakayori, Ippei Kobayashi, Akio Osabe, Shunpei Yamazaki, Toru Takayama, Akira Mase
  • CVD apparatus
    Patent number: 6013338
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: November 10, 1998
    Date of Patent: January 11, 2000
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
  • Method of forming a film on a substrate
    Patent number: 5855970
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: December 18, 1996
    Date of Patent: January 5, 1999
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
  • Method for forming a multi-layer planarization structure
    Patent number: 5629245
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: January 23, 1995
    Date of Patent: May 13, 1997
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
  • CVD apparatus
    Patent number: 5427824
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: September 8, 1992
    Date of Patent: June 27, 1995
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose