Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide, discharged from an operating room. In the present invention, a waste anesthetic gas containing a volatile anesthetic and nitrous oxide is introduced into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively this gas is introduced into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen.

Abstract: A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence metal fluoride and heating the high-valence metal fluoride. The process may comprise a step (2) of allowing the high-valence metal fluoride, from which a fluorine gas has been generated in the step (1), to occlude a fluorine gas. According to the process of the invention, a high-purity fluorine gas that is employable as an etching gas or a cleaning gas in the process for manufacturing semiconductors or liquid crystals can be produced inexpensively on a mass scale.

Abstract: Disclosed is a process for producing manganese fluoride, comprising a step (1) of allowing a manganese compound such as MnF2 having been dried at a temperature of not lower than 100° C. to react with a fluorinating agent such as F2 at a temperature of 50 to 250° C. and a step (2) of further allowing a product obtained in the step (1) to react with a fluorinating agent at a temperature of 250 to 450° C. According to this process, manganese fluoride capable of generating a fluorine gas can be easily and inexpensively produced on a mass scale under the conditions of low temperature and low pressure without going through steps of sublimation and solidification.

Abstract: A method of manufacturing manganese tetrafluoride comprises reacting a manganese compound and a fluorinating agent at a temperature of 250-350° C. and a pressure of 1.0-10.0 MPs to fluorinate the compound, while constantly or discontinuously crushing or grinding the starting compound and the manganese compound being reacted. According lo the method, since. fluorine is deeply penetrated into the interior of the manganese salt particles, the ratio of conversion to manganese tetrafluoride, MnF4 can he improved.

Abstract: A process for producing a fluorine gas of the invention comprises a step (1) of generating a fluorine gas by sectioning the interior of a fluorine gas generation container equipped with a heating means, by the use of a structure having gas permeability, then filling each section with a high-valence metal fluoride and heating the high-valence metal fluoride. The process may comprise a step (2) of allowing the high-valence metal fluoride, from which a fluorine gas has been generated in the step (1), to occlude a fluorine gas. According to the process of the invention, a high-purity fluorine gas that is employable as an etching gas or a cleaning gas in the process for manufacturing semiconductors or liquid crystals can be produced inexpensively on a mass scale.

Abstract: Disclosed is a process for producing manganese fluoride, comprising a step (1) of allowing a manganese compound such as MnF2 having been dried at a temperature of not lower than 100° C. to react with a fluorinating agent such as F2 at a temperature of 50 to 250° C. and a step (2) of further allowing a product obtained in the step (1) to react with a fluorinating agent at a temperature of 250 to 450° C. According to this process, manganese fluoride capable of generating a fluorine gas can be easily and inexpensively produced on a mass scale under the conditions of low temperature and low pressure without going through steps of sublimation and solidification.

Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively introducing the gas into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen. By using the process and the apparatus for treating a waste anesthetic gas of the present invention, a volatile anesthetic having a possibility of destroying the ozone layer or nitrous oxide as a global warming gas can be made harmless while preventing the release into atmosphere.

Abstract: The invention relates to a method for producing tetrafluorosilane by decomposing hexafluorosilicic acid with sulfuric acid, which comprises: step 1 of decomposing hexafluorosilicic acid in concentrated sulfuric acid in the first reactor to give SiF4 and HF and taking out the SiF4; step 2 of transferring part of the concentrated sulfuric acid solution of step 1 containing HF into the second reactor to react the HF with silicon dioxide fed thereinto, thereby producing SiF4 containing (SiF3)2O; and step 3 of bringing the reaction product of step 2 containing (SiF3)2O and SiF4 to the first reactor to react (SiF3)2O contained in the reactin product with HF to convert it into SiF4 and then taking out the SiF4 along with SiF4 formed in step 1. According to the invention, high-purity SiF4 can be obtained with (SiF3)2O being reduced, free from HF generated as a problematic side product in conventional method.

Abstract: Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a high valent metal fluoride, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a high valent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

Abstract: A fluorine compound having iodine within the molecule is decomposed by a decomposition reactive agent comprising alumina and an alkaline earth metal compound, the produced chlorine, fluorine and/or sulfur are fixed as a chloride, a fluoride and/or a sulfate of alkaline earth metal in the reactive agent, and iodine, which cannot be fixed as a salt of alkaline earth metal, is removed by an adsorbent.

Abstract: [Problem to be Solved]To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide, discharged from an operating room. [Means to Solve the Problem]A waste anesthetic gas containing a volatile anesthetic and nitrous oxide is introduced into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively this gas is introduced into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen.

Abstract: The invention relates to a catalyst for decomposing nitrous oxide, which is [1] a catalyst comprising a support having supported thereon aluminum, magnesium and rhodium, [2] a catalyst comprising an alumina support having supported thereon magnesium and rhodium, [3] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by magnesium and at least a part of aluminum, [4] a catalyst comprising a support having supported thereon aluminum, rhodium and at least one metal selected from zinc, iron, manganese and nickel, [5] a catalyst comprising an alumina support having supported thereon rhodium and at least one metal selected from zinc, iron, manganese and nickel, or [6] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by at least a part of aluminum and the at least one metal selected from zinc, iron, manganese and nickel.

Abstract: Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a highvalent metal fluoxide, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a highvalent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively introducing the gas into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen. By using the process and the apparatus for treating a waste anesthetic gas of the present invention, a volatile anesthetic having a possibility of destroying the ozone layer or nitrous oxide as a global warming gas can be made harmless while preventing the release into atmosphere.

Abstract: The invention relates to a catalyst for decomposing nitrous oxide, which is [1] a catalyst comprising a support having supported thereon aluminum, magnesium and rhodium, [2] a catalyst comprising an alumina support having supported thereon magnesium and rhodium, [3] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by magnesium and at least a part of aluminum, [4] a catalyst comprising a support having supported thereon aluminum, rhodium and at least one metal selected from zinc, iron, manganese and nickel, [5] a catalyst comprising an alumina support having supported thereon rhodium and at least one metal selected from zinc, iron, manganese and nickel, or [6] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by at least a part of aluminum and the at least one metal selected from zinc, i