Abstract: An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.

Abstract: An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects the electron beams together, thereby performing writing on a wafer. One side of a unit writing area of the electon beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.

Abstract: In a charged-particle-beam exposure apparatus for exposing a wafer using a charged-particle beam, an electron beam emitted from an electron source serving as a source of charged particles is substantially collimated by a collimator lens and irradiates an aperture array (3), which has apertures for forming a plurality of electron beams used to expose a wafer. A current detector array has current detectors for measuring the intensities (currents) of electron beams at portions of the-aperture array other than where the apertures are present. During the wafer exposure operation, each current detector of the current detector array measures the intensity of the electron beam. The electron-beam intensity distribution is evaluated based upon the results of measurement and, when necessary, the optical power of electrostatic lenses that construct the collimator lens (2) is adjusted to uniformalize the electron-beam intensity distribution.

Abstract: There is provided a multi-charged beam lens constituted by stacking, via fiber chips serving as insulator members along the optical path of a charged beam, a plurality of electrodes having a charged beam passing region where a plurality of charged beam apertures are formed. The electrodes have shield apertures between the charged beam passing region and the fiber chips. A conductive shield extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region and the fiber chips serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

Abstract: This invention provides a multielectron gun which generates a plurality of electron beams having uniform characteristics. A multielectron gun (2) is formed of a plurality of electron guns (2a-2c). The electron gun (2a) has, in addition to an electron source (21a), Wehnelt electrode (22a), and anode electrode (23), a shield electrode (24) between the Wehnelt electrode (22a) and anode electrode (23). The shield electrode reduces field interference among the electron guns.

Abstract: An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.

Abstract: A case of a pressure sensor has an atmospheric pressure introduction port for introducing atmospheric pressure into the case, and a water repellent filter that is attached to the atmospheric pressure introduction port to prevent passage of moisture, dust and the like while allowing flow of air. The filter is disposed to have a filter surface extending along a gravitational direction when the pressure sensor is used.

Abstract: The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.

Abstract: In a charged-particle-beam exposure apparatus for exposing a wafer using a charged-particle beam, an electron beam emitted from an electron source serving as a source of charged particles is substantially collimated by a collimator lens and irradiates an aperture array (3), which has apertures for forming a plurality of electron beams used to expose a wafer. A current detector array has current detectors for measuring the intensities (currents) of electron beams at portions of the-aperture array other than where the apertures are present. During the wafer exposure operation, each current detector of the current detector array measures the intensity of the electron beam. The electron-beam intensity distribution is evaluated based upon the results of measurement and, when necessary, the optical power of electrostatic lenses that construct the collimator lens (2) is adjusted to uniformalize the electron-beam intensity distribution.

Abstract: There is provided a multi-charged beam lens constituted by stacking, via fiber chips serving as insulator members along the optical path of a charged beam, a plurality of electrodes having a charged beam passing region where a plurality of charged beam apertures are formed. The electrodes have shield apertures between the charged beam passing region and the fiber chips. A conductive shield extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region and the fiber chips serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

Abstract: This invention provides a multielectron gun which generates a plurality of electron beams having uniform characteristics. A multielectron gun (2) is formed of a plurality of electron guns (2a-2c). The electron gun (2a) has, in addition to an electron source (21a), Wehnelt electrode (22a), and anode electrode (23), a shield electrode (24) between the Wehnelt electrode (22a) and anode electrode (23). The shield electrode reduces field interference among the electron guns.

Abstract: The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same.

Abstract: The present invention intends to improve the writing accuracy in an electron beam writing system using discrete multi beams in which the interval of the beams is larger than the size of the beams. In electron beam writing equipment which uses means generating multi electron beams; means on/off controlling each of the multi electron beams according to pattern data that should be written; and means deflecting the multi electron beams together, thereby performing writing on a wafer, one side of a unit writing area of the multi electron beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.

Abstract: A pressure sensor has a sensor element portion for detecting pressure, and a pressure conduction portion connectable to a detected member and defining therein a conduction passage for conducting pressure from the detected member to the sensor element portion. A protective cap is detachably attached to the pressure conduction portion to cover a sealed portion where the pressure conduction portion is to be sealed to the detected member until before the pressure sensor is connected to the detected member. The protective cap has an opening portion through which the conduction passage communicates with an outside thereof. Accordingly, pressure characteristics can be checked without detaching the protective cap from the pressure conduction portion.

Abstract: A target mark member having a mark pattern with a plurality of marks and a controlled width of the marks provides accuracy and efficiency in electron beam shape measurement and focus of the electron beam. The target mark member for adjusting a focus of an electron beam and measuring a shape of said electron beam in an electron beam processing apparatus includes a metal mark portion having a predetermined mark pattern, said metal mark portion comprising an epitaxial metal material; and a substrate that supports said metal mark portion.

Abstract: A case of a pressure sensor has an atmospheric pressure introduction port for introducing atmospheric pressure into the case, and a water repellent filter that is attached to the atmospheric pressure introduction port to prevent passage of moisture, dust and the like while allowing flow of air. The filter is disposed to have a filter surface extending along a gravitational direction when the pressure sensor is used.

Abstract: A pressure sensor portion having a pressure-responsive element for detecting gas pressure in reference to the atmospheric pressure is connected to a mounting body such as a canister mounted on a vehicle by means of a fragile connecting member. The connecting member breaks off to dismount the sensor device from the mounting body when a high impact due to an accidental collision or crash is imposed on the sensor device, and thereby an inlet port connected to the sensor portion for introducing gas pressure thereinto is prevented from being broken or damaged by such a collision impact. The fragile connecting member may include a tubular pipe formed integrally with a cover that hermetically closes an inner cavity of the sensor portion. A mounting bracket connected to the sensor portion via the fragile connecting member may be used to mount the sensor device on the mounting body.

Abstract: When a compressed air is led into a reference pressure chamber along with a boundary between a resin housing and a terminal, such compressed air may cause a wire breaking. A barrier wall for blocking the compressed air from penetrating toward the wire is disposed. The reference pressure chamber is divided into a main chamber and a subchamber by the barrier wall. Since the barrier wall blocks the compressed air, the compressed air can not reach a silicon gel in the main chamber. Therefore, the wire breaking caused by the compressed air when connecting a connector therewith can be precluded.

Abstract: A pressure sensor has a resin housing containing a pressure sensor positioned between a reference pressure chamber and a pressure to be measured. A terminal extends through the housing toward the sensor. A wire connects the terminal to the sensor. When a connector is connected to the terminal, it may compress air around the terminal. The compressed air may travel along the terminal and break the wire connected to the sensor. To prevent such breakage, a barrier wall is provided to block the compressed air from penetrating toward the wire. The reference pressure chamber is divided into a main chamber and a subchamber by the barrier wall. Since the barrier wall blocks the compressed air, the compressed air can not reach a silicon gel on the sensor and the wire in the main chamber. Therefore, the wire is protected.