Abstract: The present invention relates to an optical element fixing component having a hollow portion which includes an optical element. The optical element fixing component is made from a non-crystalline alloy, and a ratio of a linear expansion coefficient of the optical element fixing component toward a linear expansion coefficient of the optical element is 1.5 or less.

Abstract: An ultrasonic transmission member including one end part and the other end part and transmitting an ultrasonic wave input into the one end part to the other end part is formed by preparing a main mold having a casting cavity corresponding to a whole outer shape of the ultrasonic transmission member, melting an alloy which is a material of a metallic glass, and pouring the melted alloy into the casting cavity of the main mold to solidify the melted alloy in a liquid phase state thereof.

Abstract: The present invention relates to an optical element fixing component having a hollow portion which includes an optical element. The optical element fixing component is made from a non-crystalline alloy, and a ratio of a linear expansion coefficient of the optical element fixing component toward a linear expansion coefficient of the optical element is 1.5 or less.

Abstract: An ultrasonic transmission member including one end part and the other end part and transmitting an ultrasonic wave input into the one end part to the other end part is formed by preparing a main mold having a casting cavity corresponding to a whole outer shape of the ultrasonic transmission member, melting an alloy which is a material of a metallic glass, and pouring the melted alloy into the casting cavity of the main mold to solidify the melted alloy in a liquid phase state thereof.

Abstract: A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof; and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

Abstract: The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.

Abstract: A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

Abstract: A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

Abstract: The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.

Abstract: The nonaqueous solvent employed in drying as a final step of cleaning is regenerated. The nonaqueous solvent is contacted with a separation fluid having low compatibility with the nonaqueous solvent and high compatibility with a hydrophilic solvent to cause the hydrophilic solvent contained in the nonaqueous solvent to be absorbed in the separation fluid, thereby regenerating the nonaqueous solvent. When the hydrophilic solvent is an alcohol, a low-molecular-weight silicone compound and demineralized water may be used as the nonaqueous solvent and the separation fluid, respectively, in which the silicone compound can be regenerated to a purity of 99.0 to 99.8% so that the silicone compound can be recycled for use in the drying.

Abstract: A cleaning and drying solvent is disclosed which has excellent cleaning power and drying property and finds uses as a hand-cleaning agent, a precise cleaning agent and a drying agent for industrial parts. Since it does not contain halogens causing the depletion of the ozone layer, it is available as a solvent replacing freon. The cleaning and drying solvent is composed of a siloxane compound, in particular, hexamethyldisiloxane, an azeotropic or azeotrope-like composition of hexamethyldisiloxane and a lower alcohol, or a mixture of hexamethyldisiloxane and each of ketones, carboxylic esters, low molecular saturated hydrocarbons and low molecular alcohols.

Abstract: The nonaqueous solvent employed in drying as a final step of cleaning is regenerated. The nonaqueous solvent is contacted with a separation fluid having low compatibility with the nonaqueous solvent and high compatibility with a hydrophilic solvent to cause the hydrophilic solvent contained in the nonaqueous solvent to be absorbed in the separation fluid, thereby regenerating the nonaqueous solvent. When the hydrophilic solvent is an alcohol, a low-molecular-weight silicone compound and demineralized water may be used as the nonaqueous solvent and the separation fluid, respectively, in which the silicone compound can be regenerated to a purity of 99.0 to 99.8% so that the silicone compound can be recycled for use in the drying.

Abstract: A method for post-cleaning finish drying is provided, by which finish drying of industrial parts can be conducted without leaving residues or corroding the cleaned material. In this method, finish drying can be performed without the use of freon being a cause of destruction of the ozonosphere. Preferably, a cleaned material is dipped (rinsed) in a low molecular weight siloxane having a content of organic compounds, such as dodecamethylpentasiloxane, of less than 0.01% by weight, taken out and dried. Also, preferably, the material rinsed with the low molecular weight siloxane is subjected to a vapor cleaning using a perfluorocarbon compound.