Abstract: The double-side polishing apparatus is capable of uniformly polishing a wafer and highly preventing an outer edge of the wafer from being damaged. The apparatus comprises: a lower polishing plate and an upper polishing plate for polishing both sides of the wafer; a carrier having a main body part, in which a through-hole for holding the wafer is formed. Edges of the through-hole in an upper face and a lower face of the carrier are coated with coating layers, which are composed of an abrasion-resistant material and which have a prescribed width and a prescribed thickness. A resin cushion ring, which has a prescribed width and whose thickness is equal to that of the main body part of the carrier, is provided to an inner circumferential face of the thorough-hole. The wafer is held in the resin cushion ring.

Abstract: Provided is a platform door device which makes it possible to reduce the length of time for a replacement operation when a panel-shaped portion of a door is damaged. The platform door device comprises a door, and a driving mechanism for moving the door forwardly and backwardly to close and open a gate on a platform. The driving mechanism includes a motor, a rotation body adapted to be rotated by the motor, and a driven body adapted to be driven according to the rotation of the rotation body so as to move the door, and the door has a panel-shaped main body, and a base segment detachably joined to the main body and attached to the driven body.

Abstract: Provided is a platform door device which makes it possible to reduce the length of time for a replacement operation when a panel-shaped portion of a door is damaged. The platform door device comprises a door, and a driving mechanism for moving the door forwardly and backwardly to close and open a gate on a platform. The driving mechanism includes a motor, a rotation body adapted to be rotated by the motor, and a driven body adapted to be driven according to the rotation of the rotation body so as to move the door, and the door has a panel-shaped main body, and a base segment detachably joined to the main body and attached to the driven body.

Abstract: The double-side polishing apparatus is capable of uniformly polishing a wafer and highly preventing an outer edge of the wafer from being damaged. The apparatus comprises: a lower polishing plate and an upper polishing plate for polishing both sides of the wafer; a carrier having a main body part, in which a through-hole for holding the wafer is formed. Edges of the through-hole in an upper face and a lower face of the carrier are coated with coating layers, which are composed of an abrasion-resistant material and which have a prescribed width and a prescribed thickness. A resin cushion ring, which has a prescribed width and whose thickness is equal to that of the main body part of the carrier, is provided to an inner circumferential face of the thorough-hole. The wafer is held in the resin cushion ring.

Abstract: The present invention is a planar template for a CMP tool polishing head possessing a means of securing a wafer in CMP polishing where the back surface of the template is held to the polishing head by retaining means and a method for using the planar template.

Abstract: A method for (a) determining the shear force between a wafer head and a polishing pad in a polishing tool using a CMP polishing tool with a plate above the wafer head which hangs or rests on the plate. The plate is connected to the CMP polishing tool by (b) low friction motion means (c). A load cell sensor is fixed to the framework of the polishing tool or another immovable structure. (d) The load cell determines the force from the leading edge of the plate when the wafer head is in contact with the polishing pad. (e) Signals from the load cell sensor reporting the shear force. A CMP polishing tool which includes elements corresponding to each of points (a)-(e) in the above method.

Abstract: A process for forming a thin metal oxide film is disclosed that comprises molding an amorphous powder of organic metal chelate complexes to obtain a target. The process also includes subjecting the target to a PVD process that forms the thin metal oxide.

Abstract: Metallic materials are mixed with an organic chelating agent so as to result in a given metal composition to prepare a transparent aqueous solution of organic metal chelate complexes. The aqueous solution is spray-dried to obtain an amorphous powder containing the amorphous organic metal chelate complexes. The powder is sintered to produce a metal oxide. Alternatively, the powder containing the complexes is molded into a tablet to obtain a target, which is used to form a thin metal oxide film.

Abstract: A polyoxymethylene copolymer which is a polyoxymethylene copolymer obtained by copolymerizing trioxane and 8 to 20 mol, per 100 mol of the trioxane, of 1,3-dioxolane and which (i) has a crystallization time period of 10 to 2,000 seconds at 143° C., (ii) withstands 30 to 1,000 cycles of a bending durability test and (iii) has residence heat stability for 40 minutes or more, and a molded article formed of the copolymer. According to the present invention, there can be provided a polyoxymethylene copolymer excellent in bending durability and heat stability and excellent in moldability, and a molded article formed thereof.

Abstract: A process for preparing a target for use in production of a thin metal oxide film that comprises molding an amorphous powder of organic metal chelate complexes to obtain the target. The process also includes mixing metallic materials with an organic chelating agent so as to give a predetermined metal composition to prepare a transparent aqueous solution of organic metal chelate complexes. The process also includes spray-drying the aqueous solution to obtain an amorphous powder of the organic metal chelate complexes.

Abstract: A polyoxymethylene copolymer which is a polyoxymethylene copolymer obtained by copolymerizing trioxane and 8 to 20 mol, per 100 mol of the trioxane, of 1,3-dioxolane and which (i) has a crystallization time period of 10 to 2,000 seconds at 143° C., (ii) withstands 30 to 1,000 cycles of a bending durability test and (iii) has residence heat stability for 40 minutes or more, and a molded article formed of the copolymer.

Abstract: A polyoxymethylene resin composition consisting essentially of 100 parts by weight of a polyoxymethylene copolymer containing an oxymethylene unit as a main recurring unit and 1 to 30 mol, per 100 mol of the oxymethylene unit, of an oxyalkylene unit having at least 2 carbon atoms as a unit from a comonomer and 1 to 50 parts by weight of a polyalkylene glycol, and a molded article formed of the resin composition. The polyoxymethylene resin composition has high tenacity and high flexibility, is excellent in folding durability and is excellent in compatibility and dispersibility, and it gives a molded article having excellent folding durability and an excellent surface condition.

Abstract: An amino acid-N,N-diacetic acid (AADA) or its salt with an equivalent or less of an alkali metal is produced by reducing, through electrodialysis, alkali metal ions from an aqueous solution of the alkali metal salt of an AADA. By this configuration, an AADA salt can be produced in a much higher yield than conventional equivalents without requiring a regeneration operation of a resin as in the use of an ion exchange resin or without requiring crystallization-separation of crystals of the AADA salt as in the addition of an organic solvent. A salt of an amino acid-N,N-diacetic acid is also produced by reacting an AADA with any of metal oxides, metal hydroxides, metal carbonates, metal hydrogencarbonates, ammonium hydroxide, ammonium carbonate, ammonium hydrogencarbonate or organic amine compounds. By this configuration, a metal salt, aromonium salt or organic amine salt of an AADA can be produced with efficiency without the formation of by-products.

Abstract: The abrasive machine is capable of preventing deformation and bad abrasion of an abrasive cloth, maintaining flatness of an abrasive face of an abrasive plate and improving abrading accuracy. The abrasive machine comprises the abrasive plate and a holding unit for holding a work piece. In the holding unit, an inner head has a first concave section. An outer head has a second concave section. A holding plate is provided in the first concave section. An elastic holding member forms a first chamber. An outer enclosing member is provided to the outer head. An inner enclosing member is provided between the outer enclosing member and the inner head. A pressing member presses the abrasive face of the abrasive plate and encloses the holding plate. An elastic ring member a second chamber. A pressurizing unit pressurizes the chambers so as to press the work piece and the pressing member onto the abrasive face.

Abstract: A process for producing an oxymethylene copolymer by polymerizing trioxan and 1,3-dioxolan in the presence of a cationically active catalyst, wherein (1) 1,3-dioxolan is used in an amount of 0.01 to 2.9 mol % based on trioxan; and (2) the cationically active catalyst is used in an amount of 1×10−7 to 1.2×10−4 mol based on 1 mol of trioxan. The process of the present invention makes it possible to obtain at a high yield an oxymethylene copolymer which has almost as high mechanical strength and stiffness as an oxymethylene homopolymer while retaining the tenacity and heat stability of an oxymethylene copolymer.

Abstract: An amino acid-N,N-diacetic acid (AADA) or its salt with an equivalent or less of an alkali metal is produced by reducing, through electrodialysis, alkali metal ions from an aqueous solution of the alkali metal salt of an AADA. By this configuration, an AADA salt can be produced in a much higher yield than conventional equivalents without requiring a regeneration operation of a resin as in the use of an ion exchange resin or without requiring crystallization-separation of crystals of the AADA salt as in the addition of an organic solvent.

Abstract: A process for producing an oxymethylene copolymer by polymerizing trioxan and 1,3-dioxolan in the presence of a cationically active catalyst, wherein

Abstract: An amino acid-N,N-diacetic acid (AADA) or its salt with an equivalent or less of an alkali metal is produced by reducing, through electrodialysis, alkali metal ions from an aqueous solution of the alkali metal salt of an AADA. By this configuration, an AADA salt can be produced in a much higher yield than conventional equivalents without requiring a regeneration operation of a resin as in the use of an ion exchange resin or without requiring crystallization-separation of crystals of the AADA salt as in the addition of an organic solvent. A salt of an amino acid-N,N-diacetic acid is also produced by reacting an AADA with any of metal oxides, metal hydroxides, metal carbonates, metal hydrogencarbonates, ammonium hydroxide, ammonium carbonate, ammonium hydrogencarbonate or organic amine compounds. By this configuration, a metal salt, ammonium salt or organic amine salt of an AADA can be produced with efficiency without the formation of by-products.

Abstract: The abrasive machine is capable of preventing deformation and bad abrasion of an abrasive cloth, maintaining flatness of an abrasive face of an abrasive plate and improving abrading accuracy. The abrasive machine comprises the abrasive plate and a holding unit for holding a work piece. In the holding unit, an inner head has a first concave section. An outer head has a second concave section. A holding plate is provided in the first concave section. An elastic holding member forms a first chamber. An outer enclosing member is provided to the outer head. An inner enclosing member is provided between the outer enclosing member and the inner head. A pressing member presses the abrasive face of the abrasive plate and encloses the holding plate. An elastic ring member a second chamber. A pressurizing unit pressurizes the chambers so as to press the work piece and the pressing member onto the abrasive face.

Abstract: A high-concentration liquid detergent composition, which does not have strong alkalinity, which has excellent compatibility even if the surfactant concentration is increased, and which is free of white turbidity, comprising (A) one or more surfactants selected from a nonionic surfactant and an anionic surfactant, (B) one or more builders selected from an amine salt and an alkali metal-amine mixed salt of aminopolycarboxylic acid chelating agent, and (C) one or more solubilizing agents selected from alcohols, with component (A) being present in a concentration of 20 wt % or more.