Patents by Inventor Masao Koshi

Masao Koshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5723800
    Abstract: According to the present invention there is provided a wear resistant vane for alternate flow that is appropriate for a rotary compressor that employs HFC flow as an alternate refrigerant, and which vane possesses: a reciprocal or opposed characteristic in that it does not cause to wear a piston to which it contacts and nevertheless causes little wear to itself; a preferable corrosion resistance; and an ensured reliability, in that when employed for an operation that continues for an extended period of time there is no possibility of a surface layer suddenly peeling off.
    Type: Grant
    Filed: July 3, 1996
    Date of Patent: March 3, 1998
    Assignee: Nachi-Fujikoshi Corp.
    Inventors: Takashi Yoshimoto, Yasushi Hara, Hirokuni Amano, Masao Koshi
  • Patent number: 4579639
    Abstract: A method of sensing the amount of a thin film deposited during an ion plating process, based upon either fixing the value of voltage applied to a plasma-generating probe and measuring the current which flows through the probe into the plasma, this current varying in proportion to the rate of formation of the thin film, or fixing the level of current which flows through the probe into the plasma at a fixed value and measuring the voltage which develops at the probe, this voltage varying in proportion to the rate of formation of the thin film. The results of such measurement can be used to control the thickness of a deposited thin film to a desired value.
    Type: Grant
    Filed: July 11, 1983
    Date of Patent: April 1, 1986
    Assignee: Citizen Watch Company Limited
    Inventors: Mitsugu Enomoto, Yoji Yoshikawa, Masao Koshi
  • Patent number: 4480010
    Abstract: By use of an ion plating apparatus having an ionizing means which can be operated independently of the electric potential of a substrate, at the initial and final stages of the process of ion plating, a negative potential relative to that of a vapor source is applied to the substrate in order to facilitate the bombardment effect and at the intermediate stage of the process, the potential of the substrate is left floating while the ionization means is being driven in order to control the bombardment effect. In a preferred example, the apparatus has thermoelectron emitting filaments located near the substrate and a pair of anodes located on the side of the vapor source with respect to the substrate and on the opposite side of the substrate. This process permits producing relatively thick and adherent coatings.
    Type: Grant
    Filed: May 25, 1983
    Date of Patent: October 30, 1984
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Yasutomo Sasanuma, Masao Koshi, Teruaki Takahashi, Shotaro Shimizu, Mitsugu Enomoto, Youji Yoshikawa