Patents by Inventor Masao Tonda

Masao Tonda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for forming photoresist images
    Patent number: 4528262
    Abstract: A process for forming photoresist images by sticking photosensitive layer formed on a film of a polyvinyl alcohol resin which is not soluble in water, but is swellable with water, to a substrate, exposing the photosensitive layer to light through the polyvinyl alcohol resin film, washing away the polyvinyl alcohol resin film with water and developing the photosensitive layer with a developer.
    Type: Grant
    Filed: April 12, 1983
    Date of Patent: July 9, 1985
    Assignee: Nippon Gohsei Kagaku Kogyo Kabushiki Kaisha
    Inventors: Yoshio Nakano, Masao Tonda