Patents by Inventor Masaru Odawara

Masaru Odawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive working O-quinone diazide photocopying process with organic resin overlayer
    Patent number: 4207106
    Abstract: A light-sensitive copying material comprising at least two organic coating layers on a support, at least one of the coating layers being a light-sensitive layer which comprises an O-quinone diazide compound whose alkali solubility is increased by irradiation with active rays.
    Type: Grant
    Filed: May 10, 1978
    Date of Patent: June 10, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaru Odawara, Tadao Yoyama, Azusa Ohashi