Abstract: The invention provides a polishing liquid for polishing a barrier layer of a semiconductor integrated circuit, the polishing liquid comprising: a diquaternary ammonium cation; a corrosion inhibiting agent; and a colloidal silica, wherein the pH of the polishing liquid is in the range of 2.5 to 5.0. According to the invention, a polishing liquid capable of achieving a superior barrier layer polishing rate, as well as suppressing the occurrence of scratching due to the agglomeration of solid abrasive grains can be provided.

Abstract: The present invention provides a colored curable composition including a phthalocyanine pigment, a dioxazine pigment, a dye, a polymerization initiator, a polymerizable compound and a solvent; and a colored curable composition including a phthalocyanine pigment, a dye multimer having a polymerizable group and a group derived from a dipyrromethene dye, a polymerization initiator, a polymerizable compound and a solvent.

Abstract: It is an object of the invention to provide a sliding material composition and a sliding member capable of achieving low friction property at starting time and during sliding and also being excellent in abrasion resistance, especially when a counterpart sliding member is a rubber-based material. The invention relates to a sliding material composition for use in a sliding member whose counterpart sliding member is configured of rubber, the sliding material composition comprising a binder resin, 5 to 25 vol % of an N?-monoacyl basic amino acid, 5 to 25 vol % of molybdenum disulfide, and 5 to 20 vol % of polytetrafluoroethylene.

Abstract: The present invention provides a colored curable composition including a phthalocyanine pigment, a dioxazine pigment, a dye, a polymerization initiator, a polymerizable compound and a solvent; and a colored curable composition including a phthalocyanine pigment, a dye multimer having a polymerizable group and a group derived from a dipyrromethene dye, a polymerization initiator, a polymerizable compound and a solvent.

Abstract: The invention provides a colored composition including a dye multimer having an alkali-soluble group as a dye, the dye multimer having a weight-average molecular weight (Mw) of from 5,000 to 20,000 and a dispersity (weight-average molecular weight (Mw)/number-average molecular weight (Mn)) of from 1.00 to 2.50.

Abstract: A black curable composition for a wafer-level lens including (A) a metal-containing inorganic pigment, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a cardo resin.

Abstract: A metal polishing slurry which is capable of simultaneously realizing a high polishing speed and reduced dishing in the polishing of a subject to be polished is provided.

Abstract: A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.

Abstract: The invention provides a dispersed composition including: (A) titanium black; (B) a polymer compound including a constituent component having a side chain structure to which an acidic group is linked via a linking group; and (C) a solvent. The (B) polymer compound is a polymer having a structure in which an acidic group is linked to a main chain part via a linking group.

Abstract: The present invention aims to provide an optical compensation film that allows superior phase difference between a first optically anisotropic layer and a second optically anisotropic layer and excellent wavelength dispersibility in terms of front and inclined retardation of liquid crystal layers in liquid crystal cells, a polarizing plate containing the optical compensation film, and a liquid-crystal display device that can display superior images with less color change due to the polarizing plate. In order to attain the object, an optical compensation film etc. is provided that comprises at least a first optically anisotropic layer and a second optically anisotropic layer, wherein the first optically anisotropic layer satisfies at least one of the following Equations (i) to (iii): 1?Re1450)(0°)/Re1650)(0°)?1.25:??Equation (i) 1?Re1450)(40°)/Re1650)(40°)?1.25:??Equation (ii) 1?Re1450)(?40°)/Re1650)(?40°)?1.25:??Equation (iii).

Abstract: The present invention provides a colored curable composition including a phthalocyanine pigment, a dioxazine pigment, a dye, a polymerization initiator, a polymerizable compound and a solvent; and a colored curable composition including a phthalocyanine pigment, a dye multimer having a polymerizable group and a group derived from a dipyrromethene dye, a polymerization initiator, a polymerizable compound and a solvent.

Abstract: A composition comprising at least one liquid-crystal compound and a polymer having at least one group of the following formula: wherein Mp represents a trivalent linking group; L represents a single bond, or a divalent linking group; X represents a substituted or unsubstituted cyclic linking group; Y represents a single bond, or a divalent linking group; Z represents a substituted or unsubstituted cyclic group; n is 1 to 10.

Abstract: (Task) A PTFE-based sliding material, wherein the porous sintered layer on the surface of backing metal is impregnated with baked PTFE, and occasionally, with one or both of the solid lubricant and wear-resistant additive together with fibrous PTFE, is used for a bearing of air-conditioner. Resistance of the bearing for local wear is required. Such wear resistance is to be enhanced. (Solution Means) Carbides of oligomer or polymer 2 are incorporated in the entangled structure of fibrous PTFE 1.

Abstract: A sliding device 1 is constituted of a swash plate 3 including a first sliding surface 3A and a semispherical shoe 4 sliding with the swash plate 3. The swash plate 3 is constituted of a base material 3B of high strength brass containing Mn and Si, and very small granular Mn—Si compounds 6 are exposed on an inside of the base material 3B and on the first sliding surface 3A (surface of the base material 3B). The above described swash plate 3 increases in exposure amount of the Mn—Si compounds 6 exposed on the first sliding surface 3A by applying etching to the base material 3B after cutting the base material 3B. The sliding device 1 is favorable in seizure resistance and has a low manufacturing cost as compared with conventional sliding devices.

Abstract: A method of producing a dispersion composition containing titanium black, a solvent and a dispersant including at least a first dispersant and a second dispersant, and the method includes dispersing a mixed liquid containing the titanium black, the first dispersant and the solvent, and adding the second dispersant to the dispersed mixed liquid and dispersing the same, wherein at least a part of the dispersant has an acid value of 50 mgKOH/g or more.

Abstract: The invention provides a metal polishing slurry containing a compound represented by the general formula (1): (X1)n-L wherein X1 represents a heterocycle containing at least one nitrogen atom, n represents an integer of 2 or more, and L represents a linking group having a valence of 2 or more, provided that X1s whose number is n may be the same or different, an oxidizer and an organic acid; and a method of chemical mechanical polishing using such slurry. The metal polishing slurry and the chemical mechanical polishing method are used in chemical mechanical polishing in the step of manufacturing semiconductor devices and enable a high polishing rate to be achieved while causing minimal dishing in polishing an object (wafer).

Abstract: An optical compensation film capable of contributing to improvement in a viewing angle characteristic of a liquid crystal display device, especially an IPS mode liquid crystal display device is proposed. A composition comprises at least one onium salt, at least one rod-like liquid crystalline compound, and at least one additive capable of promoting a vertical alignment of molecules of the rod-like liquid crystalline compound at an air interface; and an optical compensation film comprising an optically anisotropic layer formed of the composition are disclosed.

Abstract: A liquid for polishing a metal is provided that is used for chemically and mechanically polishing a conductor film including copper or a copper alloy in production of a semiconductor device, and a polishing method using the metal-polishing liquid is also provided. The liquid includes: (a) colloidal silica particles having an average primary particle size of from 10 nm to 25 nm and an average secondary particle size of from 50 nm to 70 nm; (b) a metal anticorrosive agent; (c) at least one compound selected from the group consisting of a surfactant and a water-soluble polymer compound; (d) an oxidizing agent; and (e) an organic acid.

Abstract: A metal polishing slurry which is capable of simultaneously realizing a high polishing speed and reduced dishing in the polishing of a subject to be polished is provided.

Abstract: A metal polishing slurry which is capable of simultaneously realizing a high polishing speed and reduced dishing in the polishing of a subject to be polished is provided. The metal polishing slurry includes a compound represented by the following general formula (1): wherein X represents a heterocyclic group containing at least one nitrogen atom, Y represents hydrogen atom, an aliphatic hydrocarbon group, an aryl group, or a —C(?O)Z? wherein Z? is as defined for Z, and Z represents hydrogen atom, an optionally substituted aliphatic hydrocarbon group, an optionally substituted aryl group, an optionally substituted heterocyclic group, —NZ1Z2, or —OZ3 wherein Z1, Z2, and Z3 independently represent hydrogen atom, an optionally substituted aliphatic hydrocarbon group, an optionally substituted aryl group, or an optionally substituted heterocyclic group, with the proviso that Y and Z may together form a ring; an oxidizing agent; and an organic acid.