Patents by Inventor Masashi Kawasaki

Masashi Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7485937
    Abstract: A tunnel junction device capable of controlling its spin retention is provided. The tunnel junction device includes a La0.6Sr0.4MnO3-? electrode (12), a La0.6Sr0.4Mn1-yRuyO3-? electrode (14), both as ferromagnetic (including ferrimagnetic) metal materials, and a LaAlO3-? (electrically insulating layer) (13) arranged between the two electrodes (12) and (14).
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: February 3, 2009
    Assignees: National Institute of Advanced Industrial Science and Technology, Japan Science and Technology Agency
    Inventors: Yoshinori Tokura, Masashi Kawasaki, Hiroshi Akoh, Hiroyuki Yamada, Yuji Ishii, Hiroshi Sato, Yoshio Kaneko
  • Publication number: 20080245297
    Abstract: A container of a material supply apparatus is configured of a crucible and an orifice. The crucible has a cylindrical shape, a rectangular-column shape or the like, and is hollow. Heat sources such as heaters are disposed around the crucible. The orifice including an opening is provided on a side of the crucible in a material element supplying direction. The orifice includes a pipe portion that extends in the material element supplying direction. The opening is formed on a tip of the pipe portion. An opening area of the pipe portion is formed to become gradually narrower towards the material element supplying side, namely in a direction of the opening.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 9, 2008
    Applicant: ROHM CO., LTD.
    Inventors: Ken Nakahara, Hiroyuki Yuji, Kentaro Tamura, Shunsuke Akasaka, Masashi Kawasaki, Akira Ohtomo, Atsushi Tsukazaki
  • Publication number: 20080187776
    Abstract: Provided is a multilayer substrate having the configuration in which a multilayer film is formed on a principal surface opposite to a principal surface in the oxide-thin-film lamination direction in a translucent substrate. The multilayer film is formed by sequentially laminating a dielectric film, Au (gold) film, and oxide film in this order from the translucent substrate. On the principal surface opposite to the principal surface on which the oxide thin film is disposed, the multilayer film containing the Au film is formed, the Au film can reflect and block the excessive infrared light from a substrate holder or a heat source at the time of growth. As a result, temperature can be accurately measured.
    Type: Application
    Filed: February 6, 2008
    Publication date: August 7, 2008
    Applicant: ROHM CO., LTD.
    Inventors: Ken Nakahara, Hiroyuki Yuji, Kentaro Tamura, Shunsuke Akasaka, Yoshio Nishimoto, Masashi Kawasaki, Akira Ohtomo, Atsushi Tsukazaki
  • Publication number: 20080118769
    Abstract: There is provided a method of manufacturing a thin film, in which not only high crystallinity and surface flatness can be realized but also dopant doping can be performed at high concentration. The method includes a low temperature highly doped layer growing step of performing dopant doping while growing the thin film at a given first temperature; an annealing step of interrupting the growth of the thin film and annealing the thin film at a given second temperature higher than the first temperature; and a high temperature lowly doped layer growing step of growing the thin film at the second temperature.
    Type: Application
    Filed: September 10, 2004
    Publication date: May 22, 2008
    Applicant: TOHOKU UNIVERSITY
    Inventors: Masashi Kawasaki, Akira Ohtomo, Tomoaki Fukumura, Atsushi Tsukazaki, Makoto Ohtani
  • Publication number: 20070212572
    Abstract: A tunnel junction device capable of controlling its spin retention is provided. The tunnel junction device includes a La0.6Sr0.4MnO3-? electrode (12), a La0.6Sr0.4Mn1-yRuyO3-? electrode (14), both as ferromagnetic (including ferrimagnetic) metal materials, and a LaAlO3-? (electrically insulating layer) (13) arranged between the two electrodes (12) and (14).
    Type: Application
    Filed: February 25, 2005
    Publication date: September 13, 2007
    Applicants: National Inst of Adv Industrial Science, Japn Science and Technology Agency
    Inventors: Yoshinori Tokura, Masashi Kawasaki, Hiroshi Akoh, Hiroyuki Yamada, Yuji Ishii, Hiroshi Sato, Yoshio Kaneko
  • Patent number: 7205640
    Abstract: In an inverse-stagger MOSFET (1), a gate insulating layer (4) made of amorphous aluminum oxide is so formed as to face a channel layer (5) which serves as the semiconductor layer, and which is made of zinc oxide. With this arrangement, a defect level at an interface between the channel layer (5) and the gate insulating layer (4) is reduced, thereby obtaining performance equivalent to that of a semiconductor apparatus in which all the layered films are crystalline. This technique is applicable to a staggered MOSFET and the like, and has high versatility.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: April 17, 2007
    Assignees: Sharp Kabushiki Kaisha
    Inventors: Hiroto Yoshioka, Tatsuya Fujita, Hisao Ochi, Toshinori Sugihara, Takeshi Hara, Masashi Kawasaki, Hideo Ohno
  • Publication number: 20070058302
    Abstract: To provide a tunnel junction device having a high MR ratio even at room temperature, a tunneling film as a nonmagnetic layer of three-layer structure of LaMnO3/SrTiO3/LaMnO3 is arranged between a ferromagnetic metal material La0.6Sr0.4MnO3 (12) and a ferromagnetic metal film material La0.6Sr0.4MnO3 (14). The tunneling film comprises two unit layers of LaMnO3 (13A) arranged on the ferromagnetic metal material La0.6Sr0.4MnO3 (12); five unit layers of SrTiO3 (13B); and two unit layers of LaMnO3 (13C) arranged at the interface between the SrTiO3 (13B) and the ferromagnetic metal film material La0.6Sr0.4MnO3 (14).
    Type: Application
    Filed: June 4, 2004
    Publication date: March 15, 2007
    Applicants: NAT INST OF ADV INDUSTRIAL SCI AND TECH, JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Yoshinori Tokura, Masashi Kawasaki, Hiroyuki Yamada, Yoshihiro Ogawa, Yoshio Kaneko
  • Patent number: 7150788
    Abstract: A method of adjusting the in-plane lattice constant of a substrate and an in-plane lattice constant adjusted substrate are provided. A crystalline substrate (1) made of SrTiO3 is formed at a first preestablished temperature thereon with a first epitaxial thin film (2) made of a first material, e. g., BaTiO3, and then on the first epitaxial thin film (2) with a second epitaxial thin film (6) made of a second material, e. g., BaxSr1?xTiO3 (where 0<x<1), that contains a substance of the first material and another substance which together therewith is capable of forming a solid solution in a preestablished component ratio. Thereafter, the substrate is heat-treated at a second preselected temperature. Heat treated at the second preestablished temperature, the substrate has dislocations (4) introduced therein and the second epitaxial thin film (6) has its lattice constant relaxed to a value close to the lattice constant of bulk crystal of the second material.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: December 19, 2006
    Assignee: Japan Science and Technology Agency
    Inventors: Hideomi Koinuma, Masashi Kawasaki, Tomoteru Fukumura, Kota Terai
  • Publication number: 20060244107
    Abstract: In a thin film transistor (1), a gate insulating layer (4) is formed on a gate electrode (3) formed on an insulating substrate (2). Formed on the gate insulating layer (4) is a semiconductor layer (5). Formed on the semiconductor layer (5) are a source electrode (6) and a drain electrode (7). A protective layer (8) covers them, so that the semiconductor layer (5) is blocked from an atmosphere. The semiconductor layer (5) (active layer) is made of, e.g., a semiconductor containing polycrystalline ZnO to which, e.g., a group V element is added. The protective layer (8) thus formed causes decrease of a surface level of the semiconductor layer (5). This eliminates a depletion layer spreading therewithin. Accordingly, the ZnO becomes an n-type semiconductor indicating an intrinsic resistance, with the result that too many free electrons are generated. However, the added element works on the ZnO as an accepter impurity, so that the free electrons are reduced.
    Type: Application
    Filed: June 14, 2004
    Publication date: November 2, 2006
    Inventors: Toshinori Sugihara, Hideo Ohno, Masashi Kawasaki
  • Patent number: 7116027
    Abstract: A magnet for a dynamo-electric machine has a plurality of magnetic poles disposed substantially in a circular shape and opposite a plurality of teeth disposed substantially in a circular shape, the magnetic poles and teeth separated by a gap in an axial direction of a revolving shaft. A plurality of inter-pole sections extend circumferentially between adjacent magnetic poles out of the plurality of magnetic poles. The inter-pole sections have tooth-opposed surfaces that are recessed relative to the surfaces of the magnetic poles opposite the teeth in the direction of the revolving shaft. The plurality of magnetic poles and the plurality of inter-pole sections are integrally formed.
    Type: Grant
    Filed: February 16, 2005
    Date of Patent: October 3, 2006
    Assignee: Yamaha Motor Co. LTD
    Inventors: Shinya Naito, Haruyoshi Hino, Hiroyuki Ishihara, Junji Terada, Tomohiro Ono, Motokuni Nishiyama, Masashi Kawasaki
  • Patent number: 7084624
    Abstract: The present invention provides a magnetic sensor capable of reproducing a magnetic record even if the size of a recorded magnetization is a minute one, directly reading a magnetization recorded on a magneto-optical disk without applying incident light itself to the magneto-optical disk, and obtaining signals of a second harmonic having a high S/N ratio. This magnetic sensor includes a magnetic sensor element (102) having electric polarization disposed with respect to a perpendicular recording medium (101), and laser generating means acting on the magnetic sensor element (102). The magnetic sensor reads information in the perpendicular recording medium (101) based on the variation of the rotation angle ? of the polarization plane of a second harmonic (105) of a frequency 2? exiting the magnetic sensor element (102) by the application of laser light (104) with a frequency ? from the laser generation means to the magnetic sensor element (102).
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 1, 2006
    Assignees: National Institute of Advanced Industrial Science and Technology, Japan Science and Technology Agency
    Inventors: Yoshinori Tokura, Masashi Kawasaki, Hiroyuki Yamada, Yoshihiro Ogawa, Yoshio Kaneko
  • Patent number: 7064346
    Abstract: In an npn-type transistor, the emitter 42 and the collector 43 are formed of an n-type transparent semiconductor, and the base 41 is formed by a p-type transparent semiconductor. The base electrode 44, the emitter electrode 45 and the collector electrode 46 are formed respectively on the base 41, the emitter 42 and the collector 43. As the n-type transparent semiconductor, for example, n-type ZnO is used. The n-type ZnO is ZnO doped with, for example, group III elements, group VII elements. As the p-type transparent semiconductor, for example, p-type ZnO is used. The p-type ZnO is ZnO doped with, for example, group I elements and group V elements.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: June 20, 2006
    Assignee: Japan Science and Technology Agency
    Inventors: Masashi Kawasaki, Hideo Ohno
  • Publication number: 20060014815
    Abstract: This invention relates to a process for making pyrazole compounds of formula I.
    Type: Application
    Filed: October 22, 2003
    Publication date: January 19, 2006
    Inventors: Toshiaki Mase, Takehiko Iida, Masashi Kawasaki, Kenichi Asakawa
  • Publication number: 20050179034
    Abstract: The invention provides a thin film device where ionic crystals are epitaxially grown on a Si single crystal substrate through a proper buffer layer, and its for fabrication method. A ZnS layer is first deposited on a Si single crystal substrate. Ionic crystal thin films (an n-GaN layer, a GaN layer, and a p-GaN layer) are deposited thereon. The ZnS thin film is an oriented film excellent in crystallinity and has excellent surface flatness. When ZnS can be once epitaxially grown on the Si single crystal substrate, the ionic crystal thin films can be easily epitaxially grown subsequently. Therefore, ZnS is formed to be a buffer layer, whereby even ionic crystals having differences in lattice constants from Si can be easily epitaxially grown in an epitaxial thin film with few lattice defects on the Si single crystal substrate. The characteristics of a thin film device utilizing it can be enhanced.
    Type: Application
    Filed: April 4, 2005
    Publication date: August 18, 2005
    Applicants: National Institute for Materials Science, Tokyo Institute of Technology, Fuji Electric Corporate Research and Development, Ltd.
    Inventors: Toyohiro Chikyow, Hideomi Koinuma, Masashi Kawasaki, Yoo Zo, Yoshinori Konishi, Yoshiyuki Yonezawa
  • Patent number: 6929695
    Abstract: The present invention is an tri-phase epitaxy method for preparing a single crystal oxide thin film, comprising the steps of depositing on a substrate an oxide thin film serving as a seed layer and having the same composition as that of an oxide thin film to be formed, depositing on the seed layer a thin film comprising a substance capable of being melted and liquidized by heat from the substrate and dissolving the oxide to be subsequent by deposited onto the seed layer, heating the substrate to form a liquid layer, and depositing an oxide on the seed layer through the liquid layer by use of a vapor-phase epitaxy method to form the single crystal oxide thin film. In this method, the oxygen partial pressure on the liquid layer is set in the range of 1.0 to 760 Torr during the film-forming step.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: August 16, 2005
    Assignee: Japan Science and Technology Agency
    Inventors: Hideomi Koinuma, Masashi Kawasaki, Yuji Matsumoto
  • Publication number: 20050174003
    Abstract: A magnet for a dynamo-electric machine has a plurality of magnetic poles disposed substantially in a circular shape and opposite a plurality of teeth disposed substantially in a circular shape, the magnetic poles and teeth separated by a gap in an axial direction of a revolving shaft. A plurality of inter-pole sections extend circumferentially between adjacent magnetic poles out of the plurality of magnetic poles. The inter-pole sections have tooth-opposed surfaces that are recessed relative to the surfaces of the magnetic poles opposite the teeth in the direction of the revolving shaft. The plurality of magnetic poles and the plurality of inter-pole sections are integrally formed.
    Type: Application
    Filed: February 16, 2005
    Publication date: August 11, 2005
    Inventors: Shinya Naito, Haruyoshi Hino, Hiroyuki Ishihara, Junji Terada, Tomohiro Ono, Motokuni Nishiyama, Masashi Kawasaki
  • Publication number: 20050173734
    Abstract: In an inverse-stagger MOSFET (1), a gate insulating layer (4) made of amorphous aluminum oxide is so formed as to face a channel layer (5) which serves as the semiconductor layer, and which is made of zinc oxide. With this arrangement, a defect level at an interface between the channel layer (5) and the gate insulating layer (4) is reduced, thereby obtaining performance equivalent to that of a semiconductor apparatus in which all the layered films are crystalline. This technique is applicable to a staggered MOSFET and the like, and has high versatility.
    Type: Application
    Filed: March 26, 2003
    Publication date: August 11, 2005
    Inventors: Hiroto Yoshioka, Tatsuya Fujita, Hisao Ochi, Toshinori Sugihara, Takeshi Hara, Masashi Kawasaki, Hideo Ohno
  • Publication number: 20050176968
    Abstract: The present invention provides a process for industrially advantageously producing a compound represented by the formula (I): or a pharmaceutically acceptable salt thereof, which is useful as an anticancer agent, and also provides a catalyst used for hydrogenation reaction in the process.
    Type: Application
    Filed: August 22, 2003
    Publication date: August 11, 2005
    Inventors: Atsushi Akao, Masashi Kawasaki, Asayuki Kamatani, Toshiaki Mase
  • Publication number: 20050127380
    Abstract: A transistor is provided, which is entirely and partially transparent by the use of a transparent channel layer made of zinc oxide or the like. A channel layer 11 formed of a transparent semiconductor such as zinc oxide ZnO. A transparent electrode is used for all of a source 12, a drain 13 and a gate 14, or a part of them. As the transparent electrode, a transparent conductive material such as conductive ZnO doped with, for example, group III elements is used. As a gate insulating layer 15, a transparent insulative material such as insulative ZnO doped with elements capable of taking a valence of one as a valence number or group V elements is used. If a substrate 16 must be transparent, for example, glass, sapphire, plastic or the like can be used as a transparent material.
    Type: Application
    Filed: January 29, 2004
    Publication date: June 16, 2005
    Inventors: Masashi Kawasaki, Hideo Ohno
  • Publication number: 20050122828
    Abstract: A magnetic switching device of the present invention includes: at least one transition member; at least one electrode; and at least one free magnetic member. The transition member contains a perovskite compound that contains at least a rare earth element and an alkaline-earth metal, the electrode and the free magnetic member are arranged in parallel and in a noncontact manner on the transition member, at least one of the free magnetic members is coupled magnetically with the transition member, and the transition member undergoes at least ferromagnetism-antiferromagnetism transition by injecting or inducing electrons or holes, whereby a magnetization direction of at least one of the free magnetic members changes. This configuration is applicable to a magnetic memory that records/reads out magnetization information of the free magnetic layer and various magnetic devices that utilize a resistance change of the magnetoresistive effect portion.
    Type: Application
    Filed: September 28, 2004
    Publication date: June 9, 2005
    Applicants: Matsushita Electric Industrial Co., Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Akihiro Odagawa, Hiroshi Sato, Toshikazu Yamada, Yuji Ishii, Isao Inoue, Hiroshi Akoh, Masashi Kawasaki, Hidenori Takagi