Abstract: It is an object to provide a high-performance and compact exposure apparatus which can perform a projection exposure operation with satisfactory optical performance by using a plurality of compact projection optical systems each capable of ensuring a sufficient working distance and having excellent imaging performance, while preventing a decrease in throughput even in a large exposure area. An exposure apparatus for projecting and exposing an image of a mask onto a plate while moving a mask and a plate has a first projection optical system and a second projection optical system each of which is real-size and both-side telecentric and forms the erect image of the mask on the plate. The first or second projection optical system has a refraction optical system having a positive refracting power, and a concave reflecting mirror for reflecting a light beam from the refraction optical system toward the refraction optical system.

Abstract: There is disclosed an exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of the first object onto the second object.

Abstract: An apparatus for measuring dimensions of a micropattern has a photoelectric sensor for scanning an enlarged image of a pattern and detects the positions of the leading and trailing edges by use of a predetermined slice level from a photoelectric signal which is derived by this sensor, thereby detecting the interval between those edges. The slice level is corrected in accordance with the interval between the edges to be measured. An amount of correction is stored as a predetermined table. A determination is made by an interval discriminating section to see if the correction needs to be performed or not.