Abstract: A management system includes a plurality of resources configured to be electrically connected to an external power supply, and a management device configured to manage the resources. The management device includes a planning unit and a management unit. The planning unit is configured to determine a power balancing plan of each of the resources by using first information on a use schedule of each of the resources and second information indicating a magnitude of an environmental load in a process of generating electric power to be supplied by the external power supply. The management unit is configured to manage the resources to cause each of the resources to operate according to the power balancing plan or a modified power balancing plan in power balancing of the external power supply.

Abstract: An information processing device includes a controller configured to acquire a record of a predetermined action for maintaining a commercial value of a first vehicle by a first user who rents the first vehicle from a first service that is a vehicle rental service, and provide an incentive to the first user when the record of the predetermined action is at a level equal to or higher than a predetermined reference.

Abstract: An information processing device includes a controller configured to acquire a record of a predetermined action for maintaining a commercial value of a first vehicle by a first user who rents the first vehicle from a first service that is a vehicle rental service, and provide an incentive to the first user when the record of the predetermined action is at a level equal to or higher than a predetermined reference.

Abstract: An information processor obtains first data related to movement of a first user, and determines an incentive provided to a plurality of users including the first user, when determining that the users who got together by vehicle received a predetermined service while traveling together, in a predetermined area, based on at least the first data.

Abstract: An information processing device includes a controller configured to: obtain data related to a service received by each of a plurality of users at one or more spots; and determine an incentive provided in a given area, based on the number of the users each receiving the service at the one or more spots included in the given area.

Abstract: An information processing device provides a first service related to movement online. The information processing device includes a processor. The processor is configured to perform a first process regarding a reservation for a service a user is going to receive at a destination, and perform a second process regarding a reservation for transportation the user is going to use. The processor is configured not to perform the second process when the user is using a second service that is a service for renting a vehicle and is going to use the first service.

Abstract: A processor of a server acquires information related to a person involved in a long-term use agreement on a vehicle when information indicating a request to use a rental car is acquired from a terminal of a user. When determination is made that the user is the person involved in the long-term use agreement on the vehicle, the processor outputs a discounted fee obtained by reducing a fee for the use of the rental car.

Abstract: An information processing device includes a controller configured to acquire a record of a predetermined action for maintaining a commercial value of a first vehicle by a first user who rents the first vehicle from a first service that is a vehicle rental service, and provide an incentive to the first user when the record of the predetermined action is at a level equal to or higher than a predetermined reference.

Abstract: An information processing apparatus that provides an online service associated with movement is configured to: acquire skill information that is information about driving skills for a predetermined user; and give an incentive associated with the online service to the user based on the skill information.

Abstract: An information processing device includes a processor. The processor is configured to providing a second service online, the second service being a service related to temporary use of a specific vehicle rented to a first user who is a user of a first service, the first service being a vehicle rental service. The processor is also configured to generate proposal information for proposing use of a third service to a second user who temporarily uses the specific vehicle by using the second service, the third service being a service related to movement.

Abstract: An information processing apparatus includes a processor configured to provide, on-line, a first service associated with movement, and provide, when a user who is using a second service, which is a vehicle rental service, executes the movement using the first service by a rented first vehicle, the user with an incentive on at least the second service.

Abstract: In one embodiment in which a technology which is capable of reducing voids that can occur when burying an insulating film into a trench while suppressing process complication, a method MT for processing a wafer W is provided. The wafer W has a groove 62 formed on the main surface 61 of the wafer W. The method MT includes: step S1 of accommodating the wafer W in a processing chamber 4 of a plasma processing apparatus 10; step S2 of starting supplying a first gas into the processing chamber 4; step S3 of starting supplying plasma generation high-frequency power into the processing chamber 4; and step S4 of starting intermittent supplying a second gas into the processing chamber 4 and starting supplying a third gas into the processing chamber 4 together, the first gas is a nitrogen-containing gas, the second gas is a gas that does not contain halogen, and the third gas is a gas that contains halogen.

Abstract: A plasma electrode is provided with an electrode plate, a ground plate, and an insulating plate arranged between the electrode plate and the ground plate. Protrusions of the electrode plate are arranged inside through holes of the ground plate and inside through holes of the insulating plate. One of the through hole provided on the center axes of the protrusions and the through hole provided around the through hole discharges a first processing gas to below the ground plate. The other of the through holes exhausts a gas existing below the ground plate. A second flow path around the protrusions supplies a second processing gas supplied via a first flow path to a gap between outer walls of the protrusions and inner walls of the through holes. The second processing gas supplied to the gap is converted into plasma by high frequency power applied to the electrode plate.

Abstract: In one embodiment in which a technology which is capable of reducing voids that can occur when burying an insulating film into a trench while suppressing process complication, a method MT for processing a wafer W is provided. The wafer W has a groove 62 formed on the main surface 61 of the wafer W. The method MT includes: step S1 of accommodating the wafer W in a processing chamber 4 of a plasma processing apparatus 10; step S2 of starting supplying a first gas into the processing chamber 4; step S3 of starting supplying plasma generation high-frequency power into the processing chamber 4; and step S4 of starting intermittent supplying a second gas into the processing chamber 4 and starting supplying a third gas into the processing chamber 4 together, the first gas is a nitrogen-containing gas, the second gas is a gas that does not contain halogen, and the third gas is a gas that contains halogen.

Abstract: A plasma electrode is provided with an electrode plate, a ground plate, and an insulating plate arranged between the electrode plate and the ground plate. Protrusions of the electrode plate are arranged inside through holes of the ground plate and inside through holes of the insulating plate. One of the through hole provided on the center axes of the protrusions and the through hole provided around the through hole discharges a first processing gas to below the ground plate. The other of the through holes exhausts a gas existing below the ground plate. A second flow path around the protrusions supplies a second processing gas supplied via a first flow path to a gap between outer walls of the protrusions and inner walls of the through holes. The second processing gas supplied to the gap is converted into plasma by high frequency power applied to the electrode plate.

Abstract: There is provided a method of forming a sealing film to seal a device formed on a substrate, including: supplying a mixture gas including a silicon-containing gas and a halogen element-containing gas or a mixture gas including a silicon-containing gas and a gas containing a functional group having an electronegative property stronger than that of nitrogen, as a first mixture gas, into a processing container; generating plasma of the first mixture gas within the processing container; and forming a first sealing film to cover the device using the first mixture gas activated by the plasma.

Abstract: There is provided a method of forming a sealing film to seal a device formed on a substrate, including: supplying a mixture gas including a silicon-containing gas and a halogen element-containing gas or a mixture gas including a silicon-containing gas and a gas containing a functional group having an electronegative property stronger than that of nitrogen, as a first mixture gas, into a processing container; generating plasma of the first mixture gas within the processing container; and forming a first sealing film to cover the device using the first mixture gas activated by the plasma.

Abstract: A refrigerant compressor comprises an electric element; a compression element; and a sealed container; wherein the compression element includes: a crankpin; a piston pin; and a connecting rod having a large hole portion into which the crankpin is inserted, a small hole portion in which the piston pin is rotatably disposed, and a coupling rod portion; wherein an oil guide hole is provided in the coupling rod portion of the connecting rod such that the large hole portion and the small hole portion are communicated with each other via the oil guide hole; a circular first groove is provided on an outer peripheral surface of the piston pin such that the first groove communicates with the oil guide hole; and a second groove extending in a center axis direction of the piston pin is provided in a first region of the small hole portion of the connecting rod.

Abstract: A substrate processing apparatus that can appropriately carry out desired plasma processing on a substrate. The substrate is accommodated in an accommodating chamber. An ion trap partitions the accommodating chamber into a plasma producing chamber and a substrate processing chamber. High-frequency antennas are disposed in the plasma producing chamber. A process gas is introduced into the plasma producing chamber. The substrate is mounted on a mounting stage disposed in the substrate processing chamber, and a bias voltage is applied to the mounting stage. The ion trap has grounded conductors and insulating materials covering surfaces of the conductors.

Abstract: A film forming device forms a thin film on a substrate by reacting reaction gases in a process vessel. Electrode portions each oriented vertically are arranged to be spaced from each other in a horizontal direction. By applying high-frequency powers having different phases to adjacent electrode portions, a strong plasma generation space is formed above the substrate placed on a mounting table, while a weak plasma generation space is formed in the gap between the electrode portions and the substrate. A first reaction gas is supplied to the strong plasma generation space and a second reaction gas that forms the thin film by reacting with the active species of the first reaction gas is supplied to the weak plasma generation space. The reaction gases in the weak plasma generation space are discharged through exhaust channels.