Patents by Inventor Masato Satomura

Masato Satomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4438245
    Abstract: A composition for use in light-sensitive elements which comprises a functional group containing polymer having aromatic sulfonic acid ester or amido groups and sensitizer and a process for preparing the functional polymer and light-sensitive element employing the functional polymer.
    Type: Grant
    Filed: October 16, 1973
    Date of Patent: March 20, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura
  • Patent number: 4411700
    Abstract: A desensitizer composition containing an imidazole derivative shown by the following general formula (I) ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms; R.sub.2 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an amino group, or an alkylthio group having 1 to 20 carbon atoms; R.sub.3 and R.sub.4 each is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 20 carbon atoms; and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each may be substituted, can be effectively used for partially desensitizing a developer sheet of pressure-sensitive copying papers, particularly where diphenylamine series color formers are used.
    Type: Grant
    Filed: October 16, 1981
    Date of Patent: October 25, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuyoshi Sekikawa, Ken Iwakura, Akio Miyamoto, Masato Satomura
  • Patent number: 4356109
    Abstract: A method for preparing microcapsules comprising polymerizing urea and formaldehyde in the presence of an anionic polyelectrolyte and an ammonium salt of an acid and forming a wall membrane of a urea/formaldehyde resin around droplets of a hydrophobic oily liquid.
    Type: Grant
    Filed: February 7, 1980
    Date of Patent: October 26, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiso Saeki, Hiroharu Matsukawa, Masato Satomura
  • Patent number: 4298673
    Abstract: A lithographic type diffusion transfer developing composition which provides high contrast images having sharp toe-gradation for developing silver halide light-sensitive materials contains at least one amine represented by one of the following general formulae (I), (II) or (III):H.sub.2 N-C.sub.n H.sub.2n -X (I) ##STR1## X, X', R.sub.1, n and m are defined in the specification. The process of developing using such a composition is also disclosed.
    Type: Grant
    Filed: March 6, 1978
    Date of Patent: November 3, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kikuo Kubotera, Eiichi Mizuki, Masato Satomura, Haruhiko Iwano, Tadahiro Fujiwara
  • Patent number: 4297470
    Abstract: A process for forming an image comprising image-wise exposing a support having thereon a cinnamoyl group containing light-sensitive polymers containing at least 64 mol % of cinnamoyl groups is disclosed.
    Type: Grant
    Filed: February 4, 1974
    Date of Patent: October 27, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Chiaki Osada, Masato Satomura, Hisatake Ono
  • Patent number: 4269893
    Abstract: A recording material in which a particular salicylic acid derivative is employed as a color developer, which derivative is a reaction product of a styrene dimer, an alkylstyrene dimer or the halogen substituted products thereof which material exhibits improved water resistivity, keeping stability and workability, does not produce color contamination when dipped in water and can exhibit its color-developing ability without special treatment.
    Type: Grant
    Filed: May 10, 1979
    Date of Patent: May 26, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hajime Kato, Masato Satomura, Kozo Sato
  • Patent number: 4251386
    Abstract: A method for preparing microcapsules comprising polymerizing urea and formaldehyde in the presence of an anionic polyelectrolyte and an ammonium salt of an acid and forming a wall membrane of a urea/formaldehyde resin around droplets of a hydrophobic oily liquid.
    Type: Grant
    Filed: July 20, 1978
    Date of Patent: February 17, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiso Saeki, Hiroharu Matsukawa, Masato Satomura
  • Patent number: 4245857
    Abstract: Recording elements of the type which form color upon contact with a color developer such as acid clay and are provided with microcapsules are disclosed having incorporated therein alcohols or ketones having at least 6 carbon atoms. Coloring speed of the recording elements are superior while maintaining high color developability.
    Type: Grant
    Filed: December 19, 1978
    Date of Patent: January 20, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura
  • Patent number: 4181328
    Abstract: A recording element comprising a support and microcapsules provided thereon, which microcapsules contain a specific color-former and, as a solvent therefor, a triarylmethane type hydrocarbon compound.
    Type: Grant
    Filed: September 30, 1977
    Date of Patent: January 1, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masato Satomura, Masataka Kiritani, Taiichi Nishimura
  • Patent number: 4147543
    Abstract: Developer compositions for diffusion transfer photographic materials containing amino compounds and imidazole compounds are used in a diffusion transfer photographic process for obtaining litho-type positive images of high contrast and of good short toe effect, the amino compounds being represented by the following formula I and the imidazole compounds by the following formula II:formula I(a) NH.sub.2 --C.sub.m H.sub.2m --Xwherein X represents a hydrogen atom, hydroxyl group, carboxyl group or amino group, and m represents a natural number of 0-12, but X represents a hydroxyl group when m is 0, ##STR1## wherein X and X' represent each a hydrogen atom, hydroxyl group, carboxyl group or amino group, and m and each represents a natural number of 0-12, but X and/or X' represents a hydroxyl group when m and/or n is 0. ##STR2## WHEREIN Y represents an oxygen atom, --CH.sub.
    Type: Grant
    Filed: March 30, 1973
    Date of Patent: April 3, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kikuo Kubotera, Eiichi Mizuki, Masato Satomura, Haruhiko Iwano, Tadahiro Fujiwara
  • Patent number: 4065430
    Abstract: A functional group containing polymer, particularly useful for producing relief images, printing plates, and photographic duplications, containing 1 to 90 mol percent of the monomer unit represented by general formula (I) ##STR1## wherein R.sub.1 is a hydrogen atom or a methyl group; R.sub.2 is a divalent group containing 2 to 10 carbon atoms; R.sub.3 is a hydrogen atom, a halogen atom (such as chlorine, bromine) a methoxy group, a nitro group or a methyl group; R.sub.4 is a hydrogen atom, a cyano group or a carbamoyl group; X and Y each represents --O--, --S--, or --NR.sub.5 --; and R.sub.5 represents a hydrogen atom, a methyl group or an ethyl group, a method of preparing the above described functional group containing polymer and a composition containing the functional group containing polymer.
    Type: Grant
    Filed: October 9, 1975
    Date of Patent: December 27, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura
  • Patent number: 4060685
    Abstract: Light sensitive high molecular weight compounds containing furanacrylate groups in the molecule, which can be suitably used for the preparation of photopolymerizable compositions used in light sensitive materials such as, e.g., a photoresist, a method for forming images using the high molecular weight compounds which undergo a change in solubility or are rendered in soluble upon irradiation and a method for preparing the high molecular weight compounds containing the novel structure by homo- or copolymerization of a monomeric vinyl ether or epoxy compound containing a furanacrylate group in the molecule.
    Type: Grant
    Filed: April 28, 1976
    Date of Patent: November 29, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yukio Maekawa, Masato Satomura, Akira Umehara
  • Patent number: 4053415
    Abstract: A polyester ether containing in its main chain the moiety represented by the formula:--R.sub.2 OArR.sub.3 COO--wherein Ar is an arylene group, R.sub.2 is an alkylene group or an oxaalkylene group, and R.sub.3 is a vinylene group, a butadienylene group or a vinylene or a butadienylene group substituted by one or more groups containing not more than 6 carbon atoms. A light-sensitive composition containing the above polyester ether is also disclosed.
    Type: Grant
    Filed: January 9, 1976
    Date of Patent: October 11, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura
  • Patent number: 4041017
    Abstract: A high polymer compound containing therein the reactive group represented by the following general formula; ##STR1## wherein X represents O or S; Y represents a hydrogen atom or a cyano group; and R.sub.2 represents a hydrogen atom, an alkyl group having not more than 4 carbon atoms, a halogen atom or a nitro group.
    Type: Grant
    Filed: June 13, 1975
    Date of Patent: August 9, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yukio Maekawa, Masato Satomura, Akira Umehara
  • Patent number: 4033890
    Abstract: Novel liquid developers contain in a carrier liquid a toner produced by graft-copolymerization of an addition-polymerizable monomer represented by the formula: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group and R.sub.2 represents an alkyl group having 6 to 20 carbon atoms, an addition-polymerizable monomer having an alkoxysilane group or a phenoxysilane group, and carbon black. The carrier liquid has a high electric resistance and a low dielectric constant.
    Type: Grant
    Filed: February 26, 1975
    Date of Patent: July 5, 1977
    Assignees: Fuji Photo Film Co., Ltd., Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yasuo Tamai, Satoru Honjo, Sadao Osawa, Masato Satomura, Chiaki Osada, Wakio Nagashima, Naomitsu Takashina
  • Patent number: 3993624
    Abstract: Light sensitive high molecular weight compounds containing furanacrylate groups in the molecule, which can be suitably used for the preparation of photopolymerizable compositions used in light sensitive materials such as, e.g., a photoresist, a method for forming images using the high molecular weight compounds which undergo a change in solubility or are rendered insoluble upon irradiation and a method for preparing the high molecular weight compounds containing the novel structure by homo- or copolymerization of a monomeric vinyl ether or epoxy compound containing a furanacrylate group in the molecule.
    Type: Grant
    Filed: November 8, 1973
    Date of Patent: November 23, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yukio Maekawa, Masato Satomura, Akira Umehara
  • Patent number: 3957517
    Abstract: Dry stabilization of a silver halide photographic material, which comprises heating a silver halide photographic material containing silver halide grains at least 50 mol% of which consists of silver bromide to a temperature of at least 80.degree.C. in the presence of 0.1 to 33 mol%, based on the silver halide, of an onium compound having an iodine ion or an anion containing iodine, such as methyltriethylammonium iodide, N-methylpyridinium iodide, or trimethylsulfonium iodide. Preferably, the heating is carried out after the formation of an image on the photographic material.
    Type: Grant
    Filed: December 6, 1973
    Date of Patent: May 18, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shinpei Ikenoue, Takao Masuda, Masato Satomura
  • Patent number: 3945831
    Abstract: Photosensitive resins comprising high molecular weight compounds containing a thienylacrylic acid ester or amide group. These resins can be used for formation of images, optionally, in combination with at least one sensitizer. These resins have extremely high photosensitivity in comparison with conventional photosensitive high molecular weight compounds. The methods of preparing the polymer and the thienylacrylic acid ester or amide functional group containing monomers are disclosed.
    Type: Grant
    Filed: January 2, 1974
    Date of Patent: March 23, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura
  • Patent number: 3936429
    Abstract: A quaternary salt-type reactive polymer composition comprising therein repeating monomer units represented by the following general formula ##SPC1##Wherein R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R.sub.1 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxycarbonyl group, having 2 to 8 carbon atoms an aryl group, a carbamoyl group having 1 to 8 carbon atoms, a carboxy group, or an acyl group having 1 to 8 carbon atoms; R.sub.2 represents a hydrogen atom, a methyl group or a cyano group; R.sub.3 represents a hydrogen atom, a carbamoyl group having 1 to 8 carbon atoms, a nitro group, a cyano group, an alkoxy group having 1 to 3 carbon atoms or an alkoxy carbonyl group having 2 to 8 carbon atoms; Y represents a divalent radical having 1 to 12 carbon atoms; and X.sup.
    Type: Grant
    Filed: January 29, 1974
    Date of Patent: February 3, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoshio Seoka, Masato Satomura, Akira Umehara
  • Patent number: 3933885
    Abstract: A monomer unit represented by general formula (I) ##SPC1##wherein R.sub.1 is a hydrogen atom or a methyl group; R.sub.2 is a divalent group containing 2 to 10 carbon atoms; R.sub.3 is a hydrogen atom, a halogen atom (such as chlorine, bromine) a methoxy group, a nitro group or a methyl group; R.sub.4 is a hydrogen atom, a cyano group or a carbamoyl group; X and Y each represents --O--, --S--, or --NR.sub.5 --; and R.sub.5 represents a hydrogen atom, a methyl group or an ethyl group.
    Type: Grant
    Filed: February 12, 1974
    Date of Patent: January 20, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masato Satomura