Patents by Inventor Masato Satomura
Masato Satomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 4438245Abstract: A composition for use in light-sensitive elements which comprises a functional group containing polymer having aromatic sulfonic acid ester or amido groups and sensitizer and a process for preparing the functional polymer and light-sensitive element employing the functional polymer.Type: GrantFiled: October 16, 1973Date of Patent: March 20, 1984Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura
-
Patent number: 4411700Abstract: A desensitizer composition containing an imidazole derivative shown by the following general formula (I) ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms; R.sub.2 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an amino group, or an alkylthio group having 1 to 20 carbon atoms; R.sub.3 and R.sub.4 each is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aryl group having 6 to 20 carbon atoms; and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each may be substituted, can be effectively used for partially desensitizing a developer sheet of pressure-sensitive copying papers, particularly where diphenylamine series color formers are used.Type: GrantFiled: October 16, 1981Date of Patent: October 25, 1983Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobuyoshi Sekikawa, Ken Iwakura, Akio Miyamoto, Masato Satomura
-
Patent number: 4356109Abstract: A method for preparing microcapsules comprising polymerizing urea and formaldehyde in the presence of an anionic polyelectrolyte and an ammonium salt of an acid and forming a wall membrane of a urea/formaldehyde resin around droplets of a hydrophobic oily liquid.Type: GrantFiled: February 7, 1980Date of Patent: October 26, 1982Assignee: Fuji Photo Film Co., Ltd.Inventors: Keiso Saeki, Hiroharu Matsukawa, Masato Satomura
-
Patent number: 4298673Abstract: A lithographic type diffusion transfer developing composition which provides high contrast images having sharp toe-gradation for developing silver halide light-sensitive materials contains at least one amine represented by one of the following general formulae (I), (II) or (III):H.sub.2 N-C.sub.n H.sub.2n -X (I) ##STR1## X, X', R.sub.1, n and m are defined in the specification. The process of developing using such a composition is also disclosed.Type: GrantFiled: March 6, 1978Date of Patent: November 3, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Kikuo Kubotera, Eiichi Mizuki, Masato Satomura, Haruhiko Iwano, Tadahiro Fujiwara
-
Patent number: 4297470Abstract: A process for forming an image comprising image-wise exposing a support having thereon a cinnamoyl group containing light-sensitive polymers containing at least 64 mol % of cinnamoyl groups is disclosed.Type: GrantFiled: February 4, 1974Date of Patent: October 27, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Chiaki Osada, Masato Satomura, Hisatake Ono
-
Patent number: 4269893Abstract: A recording material in which a particular salicylic acid derivative is employed as a color developer, which derivative is a reaction product of a styrene dimer, an alkylstyrene dimer or the halogen substituted products thereof which material exhibits improved water resistivity, keeping stability and workability, does not produce color contamination when dipped in water and can exhibit its color-developing ability without special treatment.Type: GrantFiled: May 10, 1979Date of Patent: May 26, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Hajime Kato, Masato Satomura, Kozo Sato
-
Patent number: 4251386Abstract: A method for preparing microcapsules comprising polymerizing urea and formaldehyde in the presence of an anionic polyelectrolyte and an ammonium salt of an acid and forming a wall membrane of a urea/formaldehyde resin around droplets of a hydrophobic oily liquid.Type: GrantFiled: July 20, 1978Date of Patent: February 17, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Keiso Saeki, Hiroharu Matsukawa, Masato Satomura
-
Patent number: 4245857Abstract: Recording elements of the type which form color upon contact with a color developer such as acid clay and are provided with microcapsules are disclosed having incorporated therein alcohols or ketones having at least 6 carbon atoms. Coloring speed of the recording elements are superior while maintaining high color developability.Type: GrantFiled: December 19, 1978Date of Patent: January 20, 1981Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura
-
Patent number: 4181328Abstract: A recording element comprising a support and microcapsules provided thereon, which microcapsules contain a specific color-former and, as a solvent therefor, a triarylmethane type hydrocarbon compound.Type: GrantFiled: September 30, 1977Date of Patent: January 1, 1980Assignee: Fuji Photo Film Co., Ltd.Inventors: Masato Satomura, Masataka Kiritani, Taiichi Nishimura
-
Patent number: 4147543Abstract: Developer compositions for diffusion transfer photographic materials containing amino compounds and imidazole compounds are used in a diffusion transfer photographic process for obtaining litho-type positive images of high contrast and of good short toe effect, the amino compounds being represented by the following formula I and the imidazole compounds by the following formula II:formula I(a) NH.sub.2 --C.sub.m H.sub.2m --Xwherein X represents a hydrogen atom, hydroxyl group, carboxyl group or amino group, and m represents a natural number of 0-12, but X represents a hydroxyl group when m is 0, ##STR1## wherein X and X' represent each a hydrogen atom, hydroxyl group, carboxyl group or amino group, and m and each represents a natural number of 0-12, but X and/or X' represents a hydroxyl group when m and/or n is 0. ##STR2## WHEREIN Y represents an oxygen atom, --CH.sub.Type: GrantFiled: March 30, 1973Date of Patent: April 3, 1979Assignee: Fuji Photo Film Co., Ltd.Inventors: Kikuo Kubotera, Eiichi Mizuki, Masato Satomura, Haruhiko Iwano, Tadahiro Fujiwara
-
Patent number: 4065430Abstract: A functional group containing polymer, particularly useful for producing relief images, printing plates, and photographic duplications, containing 1 to 90 mol percent of the monomer unit represented by general formula (I) ##STR1## wherein R.sub.1 is a hydrogen atom or a methyl group; R.sub.2 is a divalent group containing 2 to 10 carbon atoms; R.sub.3 is a hydrogen atom, a halogen atom (such as chlorine, bromine) a methoxy group, a nitro group or a methyl group; R.sub.4 is a hydrogen atom, a cyano group or a carbamoyl group; X and Y each represents --O--, --S--, or --NR.sub.5 --; and R.sub.5 represents a hydrogen atom, a methyl group or an ethyl group, a method of preparing the above described functional group containing polymer and a composition containing the functional group containing polymer.Type: GrantFiled: October 9, 1975Date of Patent: December 27, 1977Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura
-
Patent number: 4060685Abstract: Light sensitive high molecular weight compounds containing furanacrylate groups in the molecule, which can be suitably used for the preparation of photopolymerizable compositions used in light sensitive materials such as, e.g., a photoresist, a method for forming images using the high molecular weight compounds which undergo a change in solubility or are rendered in soluble upon irradiation and a method for preparing the high molecular weight compounds containing the novel structure by homo- or copolymerization of a monomeric vinyl ether or epoxy compound containing a furanacrylate group in the molecule.Type: GrantFiled: April 28, 1976Date of Patent: November 29, 1977Assignee: Fuji Photo Film Co., Ltd.Inventors: Yukio Maekawa, Masato Satomura, Akira Umehara
-
Patent number: 4053415Abstract: A polyester ether containing in its main chain the moiety represented by the formula:--R.sub.2 OArR.sub.3 COO--wherein Ar is an arylene group, R.sub.2 is an alkylene group or an oxaalkylene group, and R.sub.3 is a vinylene group, a butadienylene group or a vinylene or a butadienylene group substituted by one or more groups containing not more than 6 carbon atoms. A light-sensitive composition containing the above polyester ether is also disclosed.Type: GrantFiled: January 9, 1976Date of Patent: October 11, 1977Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura
-
Patent number: 4041017Abstract: A high polymer compound containing therein the reactive group represented by the following general formula; ##STR1## wherein X represents O or S; Y represents a hydrogen atom or a cyano group; and R.sub.2 represents a hydrogen atom, an alkyl group having not more than 4 carbon atoms, a halogen atom or a nitro group.Type: GrantFiled: June 13, 1975Date of Patent: August 9, 1977Assignee: Fuji Photo Film Co., Ltd.Inventors: Yukio Maekawa, Masato Satomura, Akira Umehara
-
Patent number: 4033890Abstract: Novel liquid developers contain in a carrier liquid a toner produced by graft-copolymerization of an addition-polymerizable monomer represented by the formula: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group and R.sub.2 represents an alkyl group having 6 to 20 carbon atoms, an addition-polymerizable monomer having an alkoxysilane group or a phenoxysilane group, and carbon black. The carrier liquid has a high electric resistance and a low dielectric constant.Type: GrantFiled: February 26, 1975Date of Patent: July 5, 1977Assignees: Fuji Photo Film Co., Ltd., Mitsubishi Gas Chemical Company, Inc.Inventors: Yasuo Tamai, Satoru Honjo, Sadao Osawa, Masato Satomura, Chiaki Osada, Wakio Nagashima, Naomitsu Takashina
-
Patent number: 3993624Abstract: Light sensitive high molecular weight compounds containing furanacrylate groups in the molecule, which can be suitably used for the preparation of photopolymerizable compositions used in light sensitive materials such as, e.g., a photoresist, a method for forming images using the high molecular weight compounds which undergo a change in solubility or are rendered insoluble upon irradiation and a method for preparing the high molecular weight compounds containing the novel structure by homo- or copolymerization of a monomeric vinyl ether or epoxy compound containing a furanacrylate group in the molecule.Type: GrantFiled: November 8, 1973Date of Patent: November 23, 1976Assignee: Fuji Photo Film Co., Ltd.Inventors: Yukio Maekawa, Masato Satomura, Akira Umehara
-
Patent number: 3957517Abstract: Dry stabilization of a silver halide photographic material, which comprises heating a silver halide photographic material containing silver halide grains at least 50 mol% of which consists of silver bromide to a temperature of at least 80.degree.C. in the presence of 0.1 to 33 mol%, based on the silver halide, of an onium compound having an iodine ion or an anion containing iodine, such as methyltriethylammonium iodide, N-methylpyridinium iodide, or trimethylsulfonium iodide. Preferably, the heating is carried out after the formation of an image on the photographic material.Type: GrantFiled: December 6, 1973Date of Patent: May 18, 1976Assignee: Fuji Photo Film Co., Ltd.Inventors: Shinpei Ikenoue, Takao Masuda, Masato Satomura
-
Patent number: 3945831Abstract: Photosensitive resins comprising high molecular weight compounds containing a thienylacrylic acid ester or amide group. These resins can be used for formation of images, optionally, in combination with at least one sensitizer. These resins have extremely high photosensitivity in comparison with conventional photosensitive high molecular weight compounds. The methods of preparing the polymer and the thienylacrylic acid ester or amide functional group containing monomers are disclosed.Type: GrantFiled: January 2, 1974Date of Patent: March 23, 1976Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura
-
Patent number: 3936429Abstract: A quaternary salt-type reactive polymer composition comprising therein repeating monomer units represented by the following general formula ##SPC1##Wherein R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R.sub.1 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxycarbonyl group, having 2 to 8 carbon atoms an aryl group, a carbamoyl group having 1 to 8 carbon atoms, a carboxy group, or an acyl group having 1 to 8 carbon atoms; R.sub.2 represents a hydrogen atom, a methyl group or a cyano group; R.sub.3 represents a hydrogen atom, a carbamoyl group having 1 to 8 carbon atoms, a nitro group, a cyano group, an alkoxy group having 1 to 3 carbon atoms or an alkoxy carbonyl group having 2 to 8 carbon atoms; Y represents a divalent radical having 1 to 12 carbon atoms; and X.sup.Type: GrantFiled: January 29, 1974Date of Patent: February 3, 1976Assignee: Fuji Photo Film Co., Ltd.Inventors: Yoshio Seoka, Masato Satomura, Akira Umehara
-
Patent number: 3933885Abstract: A monomer unit represented by general formula (I) ##SPC1##wherein R.sub.1 is a hydrogen atom or a methyl group; R.sub.2 is a divalent group containing 2 to 10 carbon atoms; R.sub.3 is a hydrogen atom, a halogen atom (such as chlorine, bromine) a methoxy group, a nitro group or a methyl group; R.sub.4 is a hydrogen atom, a cyano group or a carbamoyl group; X and Y each represents --O--, --S--, or --NR.sub.5 --; and R.sub.5 represents a hydrogen atom, a methyl group or an ethyl group.Type: GrantFiled: February 12, 1974Date of Patent: January 20, 1976Assignee: Fuji Photo Film Co., Ltd.Inventor: Masato Satomura