Abstract: Electric bipolar tweezers include a pair of elongated portions that extend from a base of the tweezers in a forked manner. An electrode is located on the distal end of each electrode. When a legion is held between the elongated portions, high-frequency current is supplied to the electrodes. A perfusate tube is attached to the tweezers and has an cutlet that opens near one electrode. A gas line is connected to an intermediate portion of the perfusate tube. Gas is thus mixed with perfusate in the perfusate tube such that perfusate mist is blown from the outlet of the perfusate tube. The mist blows away perfusate between the electrodes, thus preventing the electrodes from short-circuiting.

Abstract: Image-formation methods and photosensitive materials used in such methods are disclosed that form very high-resolution patterns. The photosensitive materials comprise an ingredient that is triggered by a radical to undergo a latent-image-forming reaction. The radicals are produced by photons from an illumination light. Alternatively, the ingredient is triggered by a reactive-intermediate compound that is activated by the exposure-produced radical. The photosensitive materials possess a non-linear sensitivity characteristic in which the latent-image reaction density increases according to the mth power (m>1) of the incident light intensity. The photosensitive material can be applied to a sensitive substrate for exposure. Multiple exposures of the sensitive substrate are performed using a projected mask pattern in the presence of a radical deactivator.

Abstract: An illumination optical apparatus (IOA1) and an exposure apparatus (EA1) having same, that reduces coherence in the illumination light beam, which in turn eliminates illumination non-uniformities at the mask (13) and wafer (17). The illumination apparatus comprises, in order along an optical axis (AX), a coherent light source (1) capable of generating a first light beam (b1) having a coherence length, the light beam being directed along a first optical path. Further included is a depolarizer (3) and a first optical delay element (4). The latter is capable of splitting from the first light beam a second light beam (b4) which travels a delay optical path (DOP1) with a path length not less than the coherence length of the first light beam. The delay optical path returns to said first optical path at a deflection angle from said optical delay element. The illumination optical system may also include a plurality (i.e., second, third, etc.) optical delay elements or splitting delay stages (e.g.

Abstract: After a photoresist is applied onto a wafer, a contrast enhancement material (CEM) layer is applied onto this photoresist. A pattern is projected through this CEM layer onto the photoresist. Next, this CEM layer is removed from the photoresist and thereafter a new CEM layer is again applied onto the photoresist. Another pattern is projected through this new CEM layer onto the photoresist, whereby the photoresist is exposed in accordance with a composite pattern of the two patterns. This composite pattern can surpass the resolution limit of projection optical system.

Abstract: Apparatus and methods are disclosed for increasing the illuminance at a mask used for proximity-type microlithography and for achieving increases in throughput. A mask defining a pattern is illuminated by an illumination optical system. The pattern is transferred to a workpiece separated from the mask by a prescribed standoff. The mask and workpiece can be relatively moved in a scan direction. With respect to the illumination optical system, the workpiece-side numerical aperture in a first direction on the plane of the mask is different from the workpiece-side numerical aperture in a second direction, perpendicular to the first direction, on the plane of the mask. A reflective-type relay optical system can be included that comprises first and second spherical mirrors that do not produce chromatic aberrations.

Abstract: Methods and apparatus are disclosed for microlithographically exposing a photosensitive substrate comprising single-exposure areas and multiple-exposure areas. After exposing the substrate, line widths in the single-exposure areas are substantially the same as line widths in the multiple-exposure areas. Also disclosed are masks comprising a first mask pattern used to expose the single-exposure areas once and a plurality of other mask patterns for exposing the multiple-exposure areas a predetermined number of times. Each of the other mask patterns allows a lower intensity of illumination light flux to be distributed to the multiple-exposure areas per exposure of the substrate than allowed by the first mask pattern. Consequently, the average intensity of illumination-light flux distributed to the single-exposure area after one exposure is substantially equal to the average intensity of illumination-light flux distributed to the multiple-exposure areas after a predetermined number of exposures of such areas.

Abstract: Projection exposure systems and methods are disclosed that achieve higher light intensities and reduce the time required for each exposure in multiple exposures of non-linear resists such as a two-photon-absorption resist. Using spatial redistribution of laser light, an illumination optical system forms an illumination region that illuminates only a portion of the pattern on a mask with spatially coherent light from a light source. The system forms the entire mask pattern on a substrate by repeating a non-linear exposure while moving the illumination region and the mask pattern relative to one another. To exploit temporal redistribution of laser light, an illumination optical system employs a pulsed-oscillation-type laser light source to form a mask pattern while varying the light intensity profile on a mask.

Abstract: The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective light intensity distribution is nonlinear to the intensity of incident exposure light. Further, multiple exposure is made with plural patterns having a certain lateral shift therebetween, or multiple exposure is made with shifting the position of an identical pattern, whereby multiple exposure is effected with patterns different in intensity distribution on the photosensitive material. A high-resolution pattern can be formed over the resolution limit of projection optical system by the above arrangement.

Abstract: In an interferometer, reflected light from a reference surface and a subject surface are introduced to an imaging optical system through a beam splitter, and an interference fringe formed from light reflected from the both surfaces is observed with a detection optical system. An alignment optical member is disposed in an optical path between the imaging optical system and an image plane of the interference fringe such that the rear focal point of the alignment optical member is located at the image plane. The alignment optical member is inserted in the optical path in aligning the subject surface and is removed in measuring the interference fringe. Accurate alignment of the subject surface is easily attained. A beam expander is interposed between a polarizing beam splitter and the subject surface and a 90.degree. retarder is interposed between the beam expander and the subject surface. The 90.degree. retarder is constructed of one or a plurality of reflecting mirrors formed of dielectric multilayer films.

Abstract: An illumination optical system for supplying polarized illumination light to an object to be illuminated. The light from a light source is separated by a polarizing beam splitter into a first polarized light component as the illumination light and a second polarized light component which is different in polarizing direction from the first polarized light component. A first reflecting optical member for returning the second polarized light component to the light source side and a converging optical system are arranged in such a manner that a light source image due to the backward light from the first reflecting optical member is formed at a position apart from the light source in a direction substantially perpendicular to the optical axis of the converging optical system.

Abstract: A scanning type microscope includes a coherent light source, a condenser for condensing rays of light supplied from the coherent light source on an object, and a phase member disposed between the coherent light source and the condenser, the phase member having first and second phase areas to provide a desired phase difference on the wave front of the rays of light reaching the object. The microscope further includes an objective for guiding the rays of light coming from the object, a photodetector arrangement which separately detects light from a first of two optical path areas respectively corresponding to the first phase area of the phase member and the second phase area of the phase member, and a scanning arrangement for relatively moving the object and the position at which the rays of light are condensed by the condenser. A phase pattern on the object diffracts light from the second phase area into the optical path area corresponding to the first phase area.

Abstract: A projection optical apparatus has a projection optical system for projecting an image of a reticle pattern on a stage-mounted semi-conductor wafer and includes a light-emitting surface of the stage. A photoelectric detector receives light from the light-emitting surface through the projection optical system and the reticle. The stage is moved to move a projected image of the light-emitting surface relative to the reticle, and the positional relation between the projected image of the light-emitting surface and the reticle is determined. Numerical apertures of various components of the projection optical apparatus are set for optimal performance.

Abstract: An apparatus for detecting the level of an object surface comprises a light source for supplying a light beam obliquely incident on the object surface, an imaging optical system provided to image the light beam reflected by the object surface, a light-receiving element having a detecting surface coincident with the imaging plane of the imaging optical system and determining the level of the object surface on the basis of the position of the image of the light beam on the detecting surface, and polarization correcting optics provided on an optical path leading from the light source via the object surface to the detecting surface for adjusting the intensity ration between the two mutally orthogonal polarized light components of the light beam.

Abstract: An illumination optical arrangement comprises light source means emitting a coherent light beam, and means for forming a substantially incoherent light source from the coherent light beam. The incoherent light source forming means includes means for periodically deflecting the coherent light beam and scanning a predetermined scanning area by the coherent light beam, and optical means for forming a plurality of optical paths for directing the coherent light beam passed through the predetermined scanning area to a plurality of different secondary scanning areas. Each of the plurality of secondary scanning areas is scanned by the periodically deflected coherent light beam.

Abstract: An f.multidot..theta. lens includes, in succession from the incident light side, a first group having a negative refractive power, a second group having a meniscus lens component having its convex surface facing the incident light side, a third group having a meniscus lens component having its convex surface facing the emergent light side, and a fourth group having a positive refractive power.