Patents by Inventor Masatoki Ito

Masatoki Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190252106
    Abstract: A low pass filter including: a coil that includes a band-shaped conductor and is wound a plurality of times around an axis; a capacitor that has one terminal connected to the conductor and the other terminal connected to ground; a cooling plate in contact with an end surface of the wound coil with respect to a direction of the axis; and a ceramic layer that has a flat surface and is disposed on the end surface of the would coil facing the direction of the axis, wherein the ceramic layer contacts the cooling plate, and the cooling plate includes a flow path through which water flows.
    Type: Application
    Filed: April 24, 2019
    Publication date: August 15, 2019
    Applicant: CKD Corporation
    Inventors: Akihiro Ito, Masayuki Kouketsu, Masatoki Ito, Takashi Hosono
  • Publication number: 20010003672
    Abstract: A polishing composition for silicon wafers having a resistivity of at most 0.1 &OHgr;·cm, comprising water, an abrasive and, as an additive, at least one compound selected from the group consisting of an alkali metal hydroxide, an alkali metal carbonate, an alkali metal hydrogencarbonate, a quaternary ammonium salt, a peroxide and a peroxo acid compound.
    Type: Application
    Filed: June 21, 1999
    Publication date: June 14, 2001
    Inventors: YUTAKA INOUE, MASATOKI ITO
  • Patent number: 6027554
    Abstract: A polishing composition comprising silicon nitride fine powder, water and an acid.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: February 22, 2000
    Assignee: Fujimi Incorporated
    Inventors: Hitoshi Kodama, Satoshi Suzumura, Noritaka Yokomichi, Shirou Miura, Hideki Otake, Atsunori Kawamura, Masatoki Ito
  • Patent number: 5733819
    Abstract: A polishing composition comprising silicon nitride fine powder, water and an acid.
    Type: Grant
    Filed: January 27, 1997
    Date of Patent: March 31, 1998
    Assignee: Fujimi Incorporated
    Inventors: Hitoshi Kodama, Satoshi Suzumura, Noritaka Yokomichi, Shirou Miura, Hideki Otake, Atsunori Kawamura, Masatoki Ito