Patents by Inventor Masatomo Shibui

Masatomo Shibui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cover glass for a mobile device
    Patent number: 9040147
    Abstract: A cover glass for use in a mobile device such as a touch-panel mobile telephone has a thickness in the range of, for example, 0.3 mm to 1.5 mm. A recess that can be recognized as a character or a figure when watching from the front side of the mobile device or a recess that can be recognized when touching from the front side of the mobile device is formed on at least one of opposite main surfaces of the cover glass. A surface of this recess is an etched surface treated by etching.
    Type: Grant
    Filed: April 19, 2012
    Date of Patent: May 26, 2015
    Assignees: HOYA CORPORATION, HOEV COMPANY, LIMITED
    Inventors: Kazuaki Hashimoto, Go Chiwata, Dongna Qin, Masatomo Shibui
  • COVER GLASS FOR A MOBILE DEVICE
    Publication number: 20120270016
    Abstract: A cover glass for use in a mobile device such as a touch-panel mobile telephone has a thickness in the range of, for example, 0.3 mm to 1.5 mm. A recess that can be recognized as a character or a figure when watching from the front side of the mobile device or a recess that can be recognized when touching from the front side of the mobile device is formed on at least one of opposite main surfaces of the cover glass. A surface of this recess is an etched surface treated by etching.
    Type: Application
    Filed: April 19, 2012
    Publication date: October 25, 2012
    Applicants: HOEV COMPANY, LIMITED, HOYA CORPORATION
    Inventors: Kazuaki HASHIMOTO, Go CHIWATA, Dongna QIN, Masatomo SHIBUI
  • Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof
    Patent number: 7220446
    Abstract: There are disclosed an information recording medium substrate having a surface roughness of Rmax 15 nm or less, and an information recording medium, particularly an information recording medium substrate and information recording medium in which for surfaces of the substrate and medium, a bearing area value (offset bearing area value) in a depth of 0.5 to 5 nm (predetermined slice level) from a bearing height (real peak height) corresponding to the bearing area value of 0.2% to 1.0% is 90% or less, and a manufacture method of the substrate and medium.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: May 22, 2007
    Assignee: Hoya Corporation
    Inventors: Tomotaka Yokoyama, Hiroshi Tomiyasu, Masatomo Shibui, Nobuyuki Eto
  • Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof
    Publication number: 20040170870
    Abstract: There are disclosed an information recording medium substrate having a surface roughness of Rmax 15 nm or less, and an information recording medium, particularly an information recording medium substrate and information recording medium in which for surfaces of the substrate and medium, a bearing area value (offset bearing area value) in a depth of 0.5 to 5 nm (predetermined slice level) from a bearing height (real peak height) corresponding to the bearing area value of 0.2% to 1.0% is 90% or less, and a manufacture method of the substrate and medium.
    Type: Application
    Filed: January 20, 2004
    Publication date: September 2, 2004
    Applicant: Hoya Corporation
    Inventors: Tomotaka Yokoyama, Hiroshi Tomiyasu, Masatomo Shibui, Nobuyuki Eto
  • Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof
    Patent number: 6706427
    Abstract: There are disclosed an information recording medium substrate having a surface roughness of Rmax 15 nm or less, and an information recording medium, particularly an information recording medium substrate and information recording medium in which for surfaces of the substrate and medium, a bearing area value (offset bearing area value) in a depth of 0.5 to 5 nm (predetermined slice level) from a bearing height (real peak height) corresponding to the bearing area value of 0.2% to 1.0% is 90% or less, and a manufacture method of the substrate and medium.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: March 16, 2004
    Assignee: Hoya Corporation
    Inventors: Tomotaka Yokoyama, Hiroshi Tomiyasu, Masatomo Shibui, Nobuyuki Eto
  • Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof
    Publication number: 20010053444
    Abstract: There are disclosed an information recording medium substrate having a surface roughness of Rmax 15 nm or less, and an information recording medium, particularly an information recording medium substrate and information recording medium in which for surfaces of the substrate and medium, a bearing area value (offset bearing area value) in a depth of 0.5 to 5 nm (predetermined slice level) from a bearing height (real peak height) corresponding to the bearing area value of 0.2% to 1.0% is 90% or less, and a manufacture method of the substrate and medium.
    Type: Application
    Filed: June 22, 2001
    Publication date: December 20, 2001
    Applicant: Hoya Corporation
    Inventors: Tomotaka Yokoyama, Hiroshi Tomiyasu, Masatomo Shibui, Nobuyuki Eto