Patents by Inventor Masayoshi Nagata

Masayoshi Nagata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-silver halide light-sensitive material sensitized by colloidal elements
    Patent number: 4062685
    Abstract: An organo-tellurium light-sensitive material is described which comprises a support having coated thereon at least one layer comprising an organo-tellurium compound, a sensitizer, a binder, and colloidal particles of an element selected from the group consisting of gold, tellurium, germanium, palladium and platinum. The light-sensitive material has improved sensitivity as compared with one not containing the above colloidal particles.
    Type: Grant
    Filed: May 6, 1976
    Date of Patent: December 13, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiji Takeda, Kenji Matsumoto, Hiroshi Tamura, Masayoshi Nagata
  • Photo-sensitive etchant and method for forming metal image using same
    Patent number: 3992208
    Abstract: A photo-sensitive etchant comprising (1) a first composition comprising a substance capable of producing water upon exposure to light, a binder and a solvent and (2) a second composition comprising a compound capable of producing, upon exposure to light, a metal-etching substance or a substance which reacts with another other substance to form a metal-etching product, a binder and a solvent; and a method for forming metal image by using the photosensitive etchant.
    Type: Grant
    Filed: March 12, 1974
    Date of Patent: November 16, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayoshi Nagata, Gyoji Suzuki, Takeshi Tomotsu
  • Method of making a semiconductor device utilizing a light-sensitive etching agent
    Patent number: 3960559
    Abstract: A light-sensitive etching agent comprising (a) a photodecomposable compound forming upon decomposition a material capable of etching a silicon compound containing film or capable of etching the film after reaction with another material, (b) a material capable of forming water upon exposure to light, (c) a binder and (d) a solvent, and a method of making a semiconductor device utilizing the light-sensitive etching agent.
    Type: Grant
    Filed: October 16, 1973
    Date of Patent: June 1, 1976
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Gyoji Suzuki, Masayoshi Nagata, Takeshi Tomotsu, Hisatake Ono