Patents by Inventor Masayoshi Ueno

Masayoshi Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11795137
    Abstract: A manufacturing method of a nitrile compound comprising a first step of introducing a raw material gas containing a cyclic compound having an organic substituent, ammonia, and air into a reactor and reacting the raw material gas in the presence of a catalyst to generate the nitrile compound, a second step of discharging a reacted gas from the reactor and separating the nitrile compound from the reacted gas, and a third step of collecting mist from a first residual gas obtained by separating the nitrile compound from the reacted gas to remove water and ammonium carbonate in the first residual gas.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: October 24, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventor: Masayoshi Ueno
  • Publication number: 20230250047
    Abstract: A method for isomerizing an aliphatic diamine represented by Formula (1) below in the presence of an imine compound obtained by dehydration condensation of an aliphatic diamine represented by Formula (1) below and an aldehyde and/or a ketone; and in the presence of an alkali metal. A ratio of a total amount of the alkali metal to a total amount of the aliphatic diamine is 0.5 mol % or greater and 6.0 mol % or less, and R represents a single bond or an unsubstituted aliphatic or alicyclic alkylene group having 1 to 8 carbon atoms, and n represents an integer from 0 to 5.
    Type: Application
    Filed: July 6, 2021
    Publication date: August 10, 2023
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masayoshi UENO, Akifumi IIDA, Kentaro NAGAMATSU
  • Publication number: 20220135515
    Abstract: A manufacturing method of a nitrile compound comprising a first step of introducing a raw material gas containing a cyclic compound having an organic substituent, ammonia, and air into a reactor and reacting the raw material gas in the presence of a catalyst to generate the nitrile compound, a second step of discharging a reacted gas from the reactor and separating the nitrile compound from the reacted gas, and a third step of collecting mist from a first residual gas obtained by separating the nitrile compound from the reacted gas to remove water and ammonium carbonate in the first residual gas.
    Type: Application
    Filed: March 25, 2020
    Publication date: May 5, 2022
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventor: Masayoshi UENO
  • Publication number: 20210278767
    Abstract: An object of the present invention is to provide a film forming material for lithography that is applicable to a wet process, and is useful for forming a photoresist underlayer film excellent in heat resistance, etching resistance, embedding properties to a supporting material having difference in level, and film flatness; and the like. A film forming material for lithography comprising a compound having a group of the following formula (0): can solve the problem described above.
    Type: Application
    Filed: June 24, 2019
    Publication date: September 9, 2021
    Inventors: Masayoshi UENO, Kouichi YAMADA, Akifumi CHIBA, Ken SUGITO, Junya HORIUCHI, Takashi MAKINOSHIMA, Masatoshi ECHIGO
  • Publication number: 20210165327
    Abstract: An object of the present invention is to provide a film forming material for lithography that is applicable to a wet process, and is useful for forming a photoresist underlayer film excellent in heat resistance, etching resistance, embedding properties to a supporting material having difference in level, and film flatness; and the like. The problem described above can be solved by the following film forming material for lithography. A film forming material for lithography comprising: a compound having a group of formula (0A): (In formula (0A), RA is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and RB is an alkyl group having 1 to 4 carbon atoms.
    Type: Application
    Filed: August 8, 2019
    Publication date: June 3, 2021
    Inventors: Junya HORIUCHI, Masayoshi UENO, Kouichi YAMADA, Takashi MAKINOSHIMA, Masatoshi ECHIGO
  • Patent number: 9238720
    Abstract: This invention relates to a prepreg having a low thermal expansion coefficient in plane direction and a high rigidity, and more particularly to a prepreg comprising a glass cloth (A), and a resin composition including a cyanate ester resin (B), a non-halogen based epoxy resin (C) and an inorganic filler (D), wherein the glass cloth (A) is characterized that when the weight per 1 m2 is W (g/m2), the thickness is t (?m), the number of warp threads per inch is X (thread/inch), and the number of weft threads per inch is Y (thread/inch), the total of X and Y is 150 to 240, t is 17 to 35, and the value of W/t as the apparent density is 1.1 to 1.5, and that the volume fraction of the glass cloth (A) in the prepreg is 32% to 42%.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: January 19, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
  • Publication number: 20150012180
    Abstract: An electric power steering system includes a motor that generates an assist force; and an ECU that computes a basic current command value corresponding to the assist force, based on a steering torque, and that controls the motor based on the basic current command value and a stabilization current command value computed by an external SC controller so as to stabilize behavior of a vehicle when the behavior of the vehicle is unstable. When the stabilization current command value is input, the ECU determines whether the behavior of the vehicle is stable, and when it is determined that the behavior of the vehicle is stable, the ECU controls the motor based on the basic current command value without using the stabilization current command value.
    Type: Application
    Filed: June 23, 2014
    Publication date: January 8, 2015
    Inventors: Keita HAYASHI, Hiroshi SUZUKI, Masayoshi UENO
  • Publication number: 20140332159
    Abstract: This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).
    Type: Application
    Filed: July 25, 2014
    Publication date: November 13, 2014
    Inventors: Masayoshi UENO, Yoshihiro KATO, Takeshi NOBUKUNI
  • Patent number: 8815986
    Abstract: This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).
    Type: Grant
    Filed: March 24, 2010
    Date of Patent: August 26, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
  • Patent number: 8815401
    Abstract: A prepreg for a printed wiring board, comprising a cyanate ester resin having a specific structure, a non-halogen epoxy resin, a silicone rubber powder as a rubber elasticity powder, an inorganic filler and a base material, which prepreg retains heat resistance owing to a stiff resin skeleton structure, has high-degree flame retardancy without the use of a halogen compound or a phosphorus compound as a flame retardant, and has a small thermal expansion coefficient in plane direction without using a large amount of inorganic filler, and a laminate comprising the above prepreg.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: August 26, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yoshihiro Kato, Takeshi Nobukuni, Masayoshi Ueno
  • Publication number: 20130045650
    Abstract: There is provided a resin composition that, despite the fact that the content of an inorganic filler is on approximately the same level as that of the conventional resins, can provide a cured resin product that has a low coefficient of thermal expansion in a plane direction and possesses excellent heat resistance and flame retardance.
    Type: Application
    Filed: March 1, 2011
    Publication date: February 21, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takaaki Ogashiwa, Hiroshi Takahashi, Tetsuro Miyahira, Masayoshi Ueno, Yoshihiro Kato
  • Publication number: 20120018072
    Abstract: This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).
    Type: Application
    Filed: March 24, 2010
    Publication date: January 26, 2012
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
  • Publication number: 20120009836
    Abstract: This invention relates to a prepreg having a low thermal expansion coefficient in plane direction and a high rigidity, and more particularly to a prepreg comprising a glass cloth (A), and a resin composition including a cyanate ester resin (B), a non-halogen based epoxy resin (C) and an inorganic filler (D), wherein the glass cloth (A) is characterized that when the weight per 1 m2 is W (g/m2), the thickness is t (?m), the number of warp threads per inch is X (thread/inch), and the number of weft threads per inch is Y (thread/inch), the total of X and Y is 150 to 240, t is 17 to 35, and the value of W/t as the apparent density is 1.1 to 1.5, and that the volume fraction of the glass cloth (A) in the prepreg is 32% to 42%.
    Type: Application
    Filed: February 16, 2010
    Publication date: January 12, 2012
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
  • Patent number: 8085736
    Abstract: A CDMA receiving device is provided which can prevent erroneous determination of an SFN detection. The CDMA receiving device (1) performs detection of a slot boundary in a slot timing detection unit (14), and performs detection of frame timing and code group in a code group identification unit (15), with regard to each slot timing detected in this way. The CDMA receiving device (1) uses a P-CPICH to detect scrambling code in a scrambling code identification unit (16) from the detected frame timing and code group. The CDMA receiving device (1) performs detection of SFN in a broadcast channel decoding unit (17) from the frame timing and the scrambling code. A P-CCPCH is used in the detection of the SFN. The SFN is included in the P-CCPCH and it is possible to detect SFN timing of a base station by decoding a BCH.
    Type: Grant
    Filed: January 9, 2007
    Date of Patent: December 27, 2011
    Assignee: NEC Corporation
    Inventor: Masayoshi Ueno
  • Publication number: 20110058489
    Abstract: A CDMA receiving device is provided which can prevent erroneous determination of an SFN detection. The CDMA receiving device (1) performs detection of a slot boundary in a slot timing detection unit (14), and performs detection of frame timing and code group in a code group identification unit (15), with regard to each slot timing detected in this way. The CDMA receiving device (1) uses a P-CPICH to detect scrambling code in a scrambling code identification unit (16) from the detected frame timing and code group. The CDMA receiving device (1) performs detection of SFN in a broadcast channel decoding unit (17) from the frame timing and the scrambling code. A P-CCPCH is used in the detection of the SFN. The SFN is included in the P-CCPCH and it is possible to detect SFN timing of a base station by decoding a BCH.
    Type: Application
    Filed: January 9, 2007
    Publication date: March 10, 2011
    Inventor: Masayoshi Ueno
  • Patent number: 7876809
    Abstract: Upon receiving an instruction to open a radio link, a path management unit designates, for one radio link, a spreading code number for a common pilot channel and a spreading code number for an individual channel to a spreading code generator. The spreading code generator generates spreading codes for the respective channels and sends them to a correlator. The correlator outputs the correlation values between a reception signal (IQ signal), the common pilot channel, and the individual channel. A delay profile unit generates delay profiles concerning the common pilot channel and individual channel by in-phase-adding and power-adding correlation values from the correlator for each channel. The path management unit detects path timings from both the delay profiles concerning the common pilot channel and individual channel, and assigns path timings TM to finger units in descending order of reception power. This improves the stability of reception quality.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: January 25, 2011
    Assignee: NEC Corporation
    Inventor: Masayoshi Ueno
  • Patent number: D870172
    Type: Grant
    Filed: June 19, 2018
    Date of Patent: December 17, 2019
    Assignee: Nikon Vision Co., Ltd.
    Inventor: Masayoshi Ueno
  • Patent number: D870173
    Type: Grant
    Filed: June 19, 2018
    Date of Patent: December 17, 2019
    Assignee: Nikon Vision Co., Ltd.
    Inventor: Masayoshi Ueno
  • Patent number: D870174
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: December 17, 2019
    Assignee: Nikon Vision Co., Ltd.
    Inventors: Masayoshi Ueno, Tomohiro Hoshi
  • Patent number: D945509
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: March 8, 2022
    Assignee: Nikon Vision Co., Ltd.
    Inventors: Masayoshi Ueno, Tomohiro Hoshi