Patents by Inventor Masayoshi Ueno
Masayoshi Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11795137Abstract: A manufacturing method of a nitrile compound comprising a first step of introducing a raw material gas containing a cyclic compound having an organic substituent, ammonia, and air into a reactor and reacting the raw material gas in the presence of a catalyst to generate the nitrile compound, a second step of discharging a reacted gas from the reactor and separating the nitrile compound from the reacted gas, and a third step of collecting mist from a first residual gas obtained by separating the nitrile compound from the reacted gas to remove water and ammonium carbonate in the first residual gas.Type: GrantFiled: March 25, 2020Date of Patent: October 24, 2023Assignee: Mitsubishi Gas Chemical Company, Inc.Inventor: Masayoshi Ueno
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Publication number: 20230250047Abstract: A method for isomerizing an aliphatic diamine represented by Formula (1) below in the presence of an imine compound obtained by dehydration condensation of an aliphatic diamine represented by Formula (1) below and an aldehyde and/or a ketone; and in the presence of an alkali metal. A ratio of a total amount of the alkali metal to a total amount of the aliphatic diamine is 0.5 mol % or greater and 6.0 mol % or less, and R represents a single bond or an unsubstituted aliphatic or alicyclic alkylene group having 1 to 8 carbon atoms, and n represents an integer from 0 to 5.Type: ApplicationFiled: July 6, 2021Publication date: August 10, 2023Applicant: Mitsubishi Gas Chemical Company, Inc.Inventors: Masayoshi UENO, Akifumi IIDA, Kentaro NAGAMATSU
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Publication number: 20220135515Abstract: A manufacturing method of a nitrile compound comprising a first step of introducing a raw material gas containing a cyclic compound having an organic substituent, ammonia, and air into a reactor and reacting the raw material gas in the presence of a catalyst to generate the nitrile compound, a second step of discharging a reacted gas from the reactor and separating the nitrile compound from the reacted gas, and a third step of collecting mist from a first residual gas obtained by separating the nitrile compound from the reacted gas to remove water and ammonium carbonate in the first residual gas.Type: ApplicationFiled: March 25, 2020Publication date: May 5, 2022Applicant: Mitsubishi Gas Chemical Company, Inc.Inventor: Masayoshi UENO
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Publication number: 20210278767Abstract: An object of the present invention is to provide a film forming material for lithography that is applicable to a wet process, and is useful for forming a photoresist underlayer film excellent in heat resistance, etching resistance, embedding properties to a supporting material having difference in level, and film flatness; and the like. A film forming material for lithography comprising a compound having a group of the following formula (0): can solve the problem described above.Type: ApplicationFiled: June 24, 2019Publication date: September 9, 2021Inventors: Masayoshi UENO, Kouichi YAMADA, Akifumi CHIBA, Ken SUGITO, Junya HORIUCHI, Takashi MAKINOSHIMA, Masatoshi ECHIGO
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Publication number: 20210165327Abstract: An object of the present invention is to provide a film forming material for lithography that is applicable to a wet process, and is useful for forming a photoresist underlayer film excellent in heat resistance, etching resistance, embedding properties to a supporting material having difference in level, and film flatness; and the like. The problem described above can be solved by the following film forming material for lithography. A film forming material for lithography comprising: a compound having a group of formula (0A): (In formula (0A), RA is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and RB is an alkyl group having 1 to 4 carbon atoms.Type: ApplicationFiled: August 8, 2019Publication date: June 3, 2021Inventors: Junya HORIUCHI, Masayoshi UENO, Kouichi YAMADA, Takashi MAKINOSHIMA, Masatoshi ECHIGO
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Patent number: 9238720Abstract: This invention relates to a prepreg having a low thermal expansion coefficient in plane direction and a high rigidity, and more particularly to a prepreg comprising a glass cloth (A), and a resin composition including a cyanate ester resin (B), a non-halogen based epoxy resin (C) and an inorganic filler (D), wherein the glass cloth (A) is characterized that when the weight per 1 m2 is W (g/m2), the thickness is t (?m), the number of warp threads per inch is X (thread/inch), and the number of weft threads per inch is Y (thread/inch), the total of X and Y is 150 to 240, t is 17 to 35, and the value of W/t as the apparent density is 1.1 to 1.5, and that the volume fraction of the glass cloth (A) in the prepreg is 32% to 42%.Type: GrantFiled: February 16, 2010Date of Patent: January 19, 2016Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
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Publication number: 20150012180Abstract: An electric power steering system includes a motor that generates an assist force; and an ECU that computes a basic current command value corresponding to the assist force, based on a steering torque, and that controls the motor based on the basic current command value and a stabilization current command value computed by an external SC controller so as to stabilize behavior of a vehicle when the behavior of the vehicle is unstable. When the stabilization current command value is input, the ECU determines whether the behavior of the vehicle is stable, and when it is determined that the behavior of the vehicle is stable, the ECU controls the motor based on the basic current command value without using the stabilization current command value.Type: ApplicationFiled: June 23, 2014Publication date: January 8, 2015Inventors: Keita HAYASHI, Hiroshi SUZUKI, Masayoshi UENO
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Publication number: 20140332159Abstract: This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).Type: ApplicationFiled: July 25, 2014Publication date: November 13, 2014Inventors: Masayoshi UENO, Yoshihiro KATO, Takeshi NOBUKUNI
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Patent number: 8815986Abstract: This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).Type: GrantFiled: March 24, 2010Date of Patent: August 26, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
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Patent number: 8815401Abstract: A prepreg for a printed wiring board, comprising a cyanate ester resin having a specific structure, a non-halogen epoxy resin, a silicone rubber powder as a rubber elasticity powder, an inorganic filler and a base material, which prepreg retains heat resistance owing to a stiff resin skeleton structure, has high-degree flame retardancy without the use of a halogen compound or a phosphorus compound as a flame retardant, and has a small thermal expansion coefficient in plane direction without using a large amount of inorganic filler, and a laminate comprising the above prepreg.Type: GrantFiled: July 11, 2008Date of Patent: August 26, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Yoshihiro Kato, Takeshi Nobukuni, Masayoshi Ueno
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Publication number: 20130045650Abstract: There is provided a resin composition that, despite the fact that the content of an inorganic filler is on approximately the same level as that of the conventional resins, can provide a cured resin product that has a low coefficient of thermal expansion in a plane direction and possesses excellent heat resistance and flame retardance.Type: ApplicationFiled: March 1, 2011Publication date: February 21, 2013Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Takaaki Ogashiwa, Hiroshi Takahashi, Tetsuro Miyahira, Masayoshi Ueno, Yoshihiro Kato
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Publication number: 20120018072Abstract: This invention relates to a method for storing a naphthol aralkyl type cyanate ester resin solution, which is difficult to precipitate due to long term storage in a solution state, and particularly relates to a method for storing a naphthol aralkyl type cyanate ester resin solution (AB), which comprises: preparing (i) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, (ii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A), a maleimide compound (B) and a solvent, or (iii) a naphthol aralkyl type cyanate ester resin solution (AB) comprising a prepolymer of a naphthol aralkyl type cyanate ester resin (A) and a maleimide compound (B), and a solvent, and; storing the resin solution (AB).Type: ApplicationFiled: March 24, 2010Publication date: January 26, 2012Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
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Publication number: 20120009836Abstract: This invention relates to a prepreg having a low thermal expansion coefficient in plane direction and a high rigidity, and more particularly to a prepreg comprising a glass cloth (A), and a resin composition including a cyanate ester resin (B), a non-halogen based epoxy resin (C) and an inorganic filler (D), wherein the glass cloth (A) is characterized that when the weight per 1 m2 is W (g/m2), the thickness is t (?m), the number of warp threads per inch is X (thread/inch), and the number of weft threads per inch is Y (thread/inch), the total of X and Y is 150 to 240, t is 17 to 35, and the value of W/t as the apparent density is 1.1 to 1.5, and that the volume fraction of the glass cloth (A) in the prepreg is 32% to 42%.Type: ApplicationFiled: February 16, 2010Publication date: January 12, 2012Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Masayoshi Ueno, Yoshihiro Kato, Takeshi Nobukuni
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Patent number: 8085736Abstract: A CDMA receiving device is provided which can prevent erroneous determination of an SFN detection. The CDMA receiving device (1) performs detection of a slot boundary in a slot timing detection unit (14), and performs detection of frame timing and code group in a code group identification unit (15), with regard to each slot timing detected in this way. The CDMA receiving device (1) uses a P-CPICH to detect scrambling code in a scrambling code identification unit (16) from the detected frame timing and code group. The CDMA receiving device (1) performs detection of SFN in a broadcast channel decoding unit (17) from the frame timing and the scrambling code. A P-CCPCH is used in the detection of the SFN. The SFN is included in the P-CCPCH and it is possible to detect SFN timing of a base station by decoding a BCH.Type: GrantFiled: January 9, 2007Date of Patent: December 27, 2011Assignee: NEC CorporationInventor: Masayoshi Ueno
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Publication number: 20110058489Abstract: A CDMA receiving device is provided which can prevent erroneous determination of an SFN detection. The CDMA receiving device (1) performs detection of a slot boundary in a slot timing detection unit (14), and performs detection of frame timing and code group in a code group identification unit (15), with regard to each slot timing detected in this way. The CDMA receiving device (1) uses a P-CPICH to detect scrambling code in a scrambling code identification unit (16) from the detected frame timing and code group. The CDMA receiving device (1) performs detection of SFN in a broadcast channel decoding unit (17) from the frame timing and the scrambling code. A P-CCPCH is used in the detection of the SFN. The SFN is included in the P-CCPCH and it is possible to detect SFN timing of a base station by decoding a BCH.Type: ApplicationFiled: January 9, 2007Publication date: March 10, 2011Inventor: Masayoshi Ueno
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Patent number: 7876809Abstract: Upon receiving an instruction to open a radio link, a path management unit designates, for one radio link, a spreading code number for a common pilot channel and a spreading code number for an individual channel to a spreading code generator. The spreading code generator generates spreading codes for the respective channels and sends them to a correlator. The correlator outputs the correlation values between a reception signal (IQ signal), the common pilot channel, and the individual channel. A delay profile unit generates delay profiles concerning the common pilot channel and individual channel by in-phase-adding and power-adding correlation values from the correlator for each channel. The path management unit detects path timings from both the delay profiles concerning the common pilot channel and individual channel, and assigns path timings TM to finger units in descending order of reception power. This improves the stability of reception quality.Type: GrantFiled: February 16, 2006Date of Patent: January 25, 2011Assignee: NEC CorporationInventor: Masayoshi Ueno
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Patent number: D870172Type: GrantFiled: June 19, 2018Date of Patent: December 17, 2019Assignee: Nikon Vision Co., Ltd.Inventor: Masayoshi Ueno
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Patent number: D870173Type: GrantFiled: June 19, 2018Date of Patent: December 17, 2019Assignee: Nikon Vision Co., Ltd.Inventor: Masayoshi Ueno
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Patent number: D870174Type: GrantFiled: June 12, 2019Date of Patent: December 17, 2019Assignee: Nikon Vision Co., Ltd.Inventors: Masayoshi Ueno, Tomohiro Hoshi
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Patent number: D945509Type: GrantFiled: June 24, 2019Date of Patent: March 8, 2022Assignee: Nikon Vision Co., Ltd.Inventors: Masayoshi Ueno, Tomohiro Hoshi