Abstract: The present disclosure provides novel pladienolide compounds, pharmaceutical compositions containing such compounds, and methods for using the compounds as therapeutic agents. These compounds may be useful in the treatment of cancers, particularly cancers in which agents that target the spliceosome and mutations therein are known to be useful. Also provided herein are methods of treating cancers by administering at least one compound disclosed herein and at least one additional therapy.

Abstract: A biosensing platform capable of high throughput mechanochemical biosensing comprising a DNA origami nanostructure having a plurality of slots into which recognition elements are strategically placed and apparatus that senses a change in the origami nanostructure in response to the introduction of a target where the apparatus includes a signal transduction unit and signal sensor which exploits mechanical signals in a recognition element which signal includes one or more mechanical tension or mechanochemical rearrangement event. The nanostructure is preferably a 2-dimensional or 3-dimensional arrangement of tiles linked by locking elements, such as aptamers that will open in response to an event such as exposure to a drug molecule, DNA, RNA or protein target.

Abstract: A suture needle for uterine hemostatic compression comprises at least one suture needle and a suture thread. The at least one suture needle includes a body portion extending linearly in a lengthwise direction and a puncture portion provided at a tip of the body portion in the lengthwise direction to be thrust into a uterus. The suture thread is attached to a base end portion that is on an opposite side of the puncture portion in the suture needle. The puncture portion is formed as a spherical surface that bulges toward a tip side of the lengthwise direction. The spherical surface has a radius in a connection portion with the body portion substantially identical to a radius of the body portion.

Abstract: An imaging apparatus of an embodiment of the present invention includes an imaging means (an imaging unit), and a CPU that is configured to perform orientation detection (an orientation detecting unit) to detect an orientation of the imaging apparatus, perform subject detection (a detecting unit) to detect a subject in a detection area (a detection area in a live view image) in an image captured by the imaging means (the live view image), and perform position change (a position changing unit) to change the position of the detection area in the image according to the detected orientation of the imaging apparatus.

Abstract: An imaging apparatus of an embodiment of the present invention includes a detecting unit 4d for detecting a state in a detection area T within an image displayed in a display panel 8a, an identifying unit 4b for identifying a subject from the image, an acquiring unit 4c for acquiring information relating to a predetermined subject in the case that the identifying unit 4b identifies the predetermined subject outside the detection area T, and a control unit (the detecting unit 4d) for controlling detection of the state in the detection area T based on the information relating to the predetermined subject acquired by the acquiring unit 4c.

Abstract: A method of manufacturing a steel wire material that contains 0.05%-1.2% C (“%” means “% by mass,” same hereinafter for chemical components.), 0.01%-0.7% Si, 0.1%-1.5% Mn, 0.02% max. P (not including 0%), 0.02% max. S (not including 0%), and 0.005% max. N (not including 0%), with the remainder being iron and unavoidable impurities. The steel wire material has a scale 6.0-20 ?m thick and holes of an equivalent circle diameter of 1 ?m max. in said scale that occupy 10% by area max. Said scale does not detach in the cooling process after hot rolling or during storage or transportation but can readily detach during mechanical descaling.

Abstract: A biosensing platform capable of high throughput mechanochemical biosensing comprising a DNA origami nanostructure having a plurality of slots into which recognition elements are strategically placed and apparatus that senses a change in the origami nanostructure in response to the introduction of a target where the apparatus includes a signal transduction unit and signal sensor which exploits mechanical signals in a recognition element which signal includes one or more mechanical tension or mechanochemical rearrangement event. The nanostructure is preferably a 2-dimensional or 3-dimensional arrangement of tiles linked by locking elements, such as aptamers that will open in response to an event such as exposure to a drug molecule, DNA, RNA or protein target.

Abstract: An imaging apparatus of an embodiment of the present invention includes an imaging means (an imaging unit), and a CPU that is configured to perform orientation detection (an orientation detecting unit) to detect an orientation of the imaging apparatus, perform subject detection (a detecting unit) to detect a subject in a detection area (a detection area in a live view image) in an image captured by the imaging means (the live view image), and perform position change (a position changing unit) to change the position of the detection area in the image according to the detected orientation of the imaging apparatus.

Abstract: An imaging apparatus of an embodiment of the present invention includes a detecting unit 4d for detecting a state in a detection area T within an image displayed in a display panel 8a, an identifying unit 4b for identifying a subject from the image, an acquiring unit 4c for acquiring information relating to a predetermined subject in the case that the identifying unit 4b identifies the predetermined subject outside the detection area T, and a control unit (the detecting unit 4d) for controlling detection of the state in the detection area T based on the information relating to the predetermined subject acquired by the acquiring unit 4c.

Abstract: A method of manufacturing a steel wire material that contains 0.05%-1.2% C (“%” means “% by mass,” same hereinafter for chemical components.), 0.01%-0.7% Si, 0.1%-1.5% Mn, 0.02% max. P (not including 0%), 0.02% max. S (not including 0%), and 0.005% max. N (not including 0%), with the remainder being iron and unavoidable impurities. The steel wire material has a scale 6.0-20 ?m thick and holes of an equivalent circle diameter of 1 ?m max. in said scale that occupy 10% by area max. Said scale does not detach in the cooling process after hot rolling or during storage or transportation but can readily detach during mechanical descaling.

Abstract: An ozone generating apparatus for making a temperature distribution in a dielectric tube more uniform including a sealed vessel, two tube sheets made of a conductive metal plate having a hole formed therein which are provided at a predetermined interval to divide the inside of the sealed vessel into three spaces; a metal tube formed so as to connect holes of the tow tube sheets, a dielectric tube which is inserted into the inner part of a dielectric tube so as to have a predetermined gap between an outer wall an inner wall of a metal tube and a metal electrode formed inside the dielectric tube. An alternating current voltage is applied between the tube and electrode, a gas including oxygen flowing in a gap is discharged to generate ozone, and a discharge suppressing member is provided at a part of the gap facing a tube sheet.

Abstract: The steel wire material of the present invention contains 0.05 to 1.2% of C (mass %; same for the chemical components hereafter), 0.01 to 0.5% of Si, 0.1 to 1.5% of Mn, 0.02% or less (but not 0%) of P, 0.02% or less (but not 0%) of S, and 0.005% or less (but not 0%) of N, with the balance being iron and inevitable impurities. The wire material has a scale layer that is no thicker than 7.0 ?m or less. The scale layer has an FeO percentage of 30 to 80 vol % and an Fe2SiO4 percentage of less than 0.1 vol %. The scale layer that is formed will not peel when cooled after hot rolling or during storage and transport, but will easily peel during mechanical descaling.

Abstract: This steel wire material contains 0.05%-1.2% C (“%” means “% by mass,” same hereinafter for chemical components.), 0.01%-0.7% Si, 0.1%-1.5% Mn, 0.02% max. P (not including 0%), 0.02% max. S (not including 0%), and 0.005% max. N (not including 0%), with the remainder being iron and unavoidable impurities. The steel wire material has a scale 6.0-20 ?m thick and holes of an equivalent circle diameter of 1 ?m max. in said scale that occupy 10% by area max. Said scale does not detach in the cooling process after hot rolling or during storage or transportation but can readily detach during mechanical descaling.

Abstract: Without the use of a third monomer, no copolymer practicable as a base polymer for a radiation-sensitive resin composition has been obtained by copolymerizing two ingredients, i.e., a carboxylated monomer and an epoxidized monomer. A carboxylated monomer is reacted with a specific nonpolymerizable compound, and this reaction mixture is then copolymerized with an epoxidized monomer. A radiation-sensitive resin composition and a thermosetting resin composition each containing the resultant copolymer have satisfactory storage stability and are useful as a spacer for liquid-crystal display panels, etc., a planarization film for TFT elements, and a protective film for color filters.

Abstract: After forming a lower layer film, an intermediate layer film and a first resist film on a substrate, a first resist pattern is formed by performing first exposure. Then, after a first intermediate layer pattern is formed by transferring the first resist pattern onto the intermediate layer film, a second resist film is formed thereon, and a second resist pattern is formed by performing second exposure. Thereafter, a second intermediate layer pattern is formed by transferring the second resist pattern onto the intermediate layer film. After removing the second resist film, the lower layer film is etched by using the second intermediate layer pattern as a mask, so as to form a lower layer pattern.

Abstract: An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens.