Patents by Inventor Mathew S. Cooper

Mathew S. Cooper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7219412
    Abstract: The invention includes superconducting titanium-containing compositions having less than 200 ppm, by weight, of a combined total of interstitial materials selected from the group consisting of nitrogen, oxygen, carbon and hydrogen. The invention also includes methods of forming superconducting titanium-containing superconducting compositions containing less than 100 ppm, by weight, of a combined total of interstitial materials selected from the group consisting of nitrogen, oxygen, carbon and hydrogen.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: May 22, 2007
    Assignee: Honeywell International Inc.
    Inventors: Yun Xu, Stephen P. Turner, Mathew S. Cooper, Wei Guo, David B. Love, Edward Cawley
  • Patent number: 6585866
    Abstract: A high purity cobalt sputter target is disclosed which contains a face centered cubic (fcc) phase and a hexagonal close packed (hcp) phase, wherein the value of the ratio of X-ray diffraction peak intensity, Ifcc(200)/Ihcp(10 1), is smaller than the value of the same ratio in a high purity cobalt material obtained by cooling fcc cobalt to room temperature from the high temperature at which it is molten. High purity cobalt is defined as having an oxygen content of not more than 500 ppm, a Ni content of not more than 200 ppm, contents of Fe, Al and Cr of not more than 50 ppm each, and Na and K of less than 0.5 ppm. The disclosed sputter target is manufactured by subjecting the material to cold-working treatments (less than 4221C). Annealing the material, at a temperature in the range 300-4221C for several hours, between cold working treatments significantly increases the amount of cold work which could be imparted into the material.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: July 1, 2003
    Assignee: Honeywell International Inc.
    Inventors: Robert S. Cole, Mathew S. Cooper, Stephen P. Turner, Yinshi Liu, Michael McCarty, Rodney L. Scagline
  • Publication number: 20020148724
    Abstract: A high purity cobalt sputter target is disclosed which contains a face centered cubic (fcc) phase and a hexagonal close packed (hcp) phase, wherein the value of the ratio of X-ray diffraction peak intensity, Ifcc (200)/Ihcp (10 {overscore (1)}1), is smaller than the value of the same ratio in a high purity cobalt material obtained by cooling fcc cobalt to room temperature from the high temperature at which it is molten.
    Type: Application
    Filed: March 21, 2002
    Publication date: October 17, 2002
    Inventors: Robert S. Cole, Mathew S. Cooper, Stephen P. Turner, Yinshi Liu, Michael McCarty, Rodney L. Scagline
  • Patent number: 6391172
    Abstract: A high purity cobalt sputter target is disclosed which contains a face centered cubic (fcc) phase and a hexagonal close packed (hcp) phase, wherein the value of the ratio of X-ray diffraction peak intensity, Ifcc(200)/Ihcp(10 {overscore (1)}1), is smaller than the value of the same ratio in a high purity cobalt material obtained by cooling fcc cobalt to room temperature from the high temperature at which it is molten. High purity cobalt is defined as having an oxygen content of not more than 500 ppm, a Ni content of not more than 200 ppm, contents of Fe, Al and Cr of not more than 50 ppm each, and Na and K of less than 0.5 ppm. The disclosed sputter target is manufactured by subjecting the material to cold-working treatments (less than 422° C.). Annealing the material, at a temperature in the range 300-422° C. for several hours, between cold working treatments significantly increases the amount of cold work which could be imparted into the material.
    Type: Grant
    Filed: August 25, 1998
    Date of Patent: May 21, 2002
    Assignee: The Alta Group, Inc.
    Inventors: Robert S. Cole, Mathew S. Cooper, Stephen P. Turner, Yinshi Liu, Michael McCarty, Rodney L. Scagline
  • Publication number: 20010001438
    Abstract: A high purity cobalt sputter target is disclosed which contains a face centered cubic (fcc) phase and a hexagonal close packed (hcp) phase, wherein the value of the ratio of X-ray diffraction peak intensity, Ifcc(200)/Ihcp(10 {overscore (1)}1), is smaller than the value of the same ratio in a high purity cobalt material obtained by cooling fcc cobalt to room temperature from the high temperature at which it is molten.
    Type: Application
    Filed: August 25, 1998
    Publication date: May 24, 2001
    Applicant: Robert S. Cole et al
    Inventors: ROBERT S. COLE, MATHEW S. COOPER, STEPHEN P. TURNER, YINSHI LIU, MICHAEL MCCARTY, RODNEY L. SCAGLINE