Patents by Inventor Matthew Alonso

Matthew Alonso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Devices, methods, and graphical user interfaces for moving a current focus using a touch-sensitive remote control
    Patent number: 11960707
    Abstract: An electronic device provides, to a display, data to present a user interface that includes a plurality of user interface objects, and a current focus on a first user interface object. While the display is presenting the user interface, the electronic device receives an input that corresponds to a movement of a contact across on a touch-sensitive surface. The electronic device, in response to receiving the input and in accordance with a determination that a first axis is a dominant axis, moves the current focus along the first axis by a first amount and along the second axis by a second amount. The amount of movement of the current focus along the second axis is reduced to a first non-zero amount by a scaling factor that is based on one or more inputs received prior to receiving the input.
    Type: Grant
    Filed: April 24, 2023
    Date of Patent: April 16, 2024
    Assignee: APPLE INC.
    Inventors: Marcos Alonso Ruiz, Nicole M. Wells, Justin T. Voss, Blake R. Seely, Matthew D. Ricketson, Henrique D. Penha, Grace H. Hwang, Graham R. Clarke, Jeffrey L. Robbin, William M. Bachman, Benjamin W. Keighran, Jennifer L. C. Folse, Jonathan Lochhead, Joe R. Howard, Joshua K. McGlinn
  • High Resolution Projection Micro-Stereolithography System And Method
    Publication number: 20170057162
    Abstract: A high-resolution P?SL system and method incorporating one or more of the following features with a standard P?SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P?SL system to fabricate microstructures of different materials.
    Type: Application
    Filed: November 15, 2016
    Publication date: March 2, 2017
    Inventors: Christopher M. Spadaccini, Todd Weisgraber, George Farquar, Steven Gemberling, Nicholas Fang, Matthew Alonso, Jun Xu, Howon Lee
  • High resolution projection micro stereolithography system and method
    Patent number: 9492969
    Abstract: A high-resolution P?SL system and method incorporating one or more of the following features with a standard P?SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P?SL system to fabricate microstructures of different materials.
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: November 15, 2016
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Christopher M. Spadaccini, George Farquar, Todd Weisgraber, Steven Gemberling, Nicholas Fang, Jun Xu, Matthew Alonso, Howon Lee
  • High Resolution Projection Micro Stereolithography System And Method
    Publication number: 20150309473
    Abstract: A high-resolution P?SL system and method incorporating one or more of the following features with a standard P?SL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a P?SL system to fabricate microstructures of different materials.
    Type: Application
    Filed: May 31, 2011
    Publication date: October 29, 2015
    Inventors: Christopher M. Spadaccini, George Farquar, Todd Weisgraber, Steven Gemberling, Nicholas Fang, Jun Xu, Matthew Alonso, Howon Lee