Abstract: Described are substrate containers that are useful for holding or transporting substrates such as semiconductor wafers and microelectronic devices, in a clean environment, as well as methods of using the substrate containers.

Abstract: Disclosed is a method of displaying a hierarchical file structure. The method determines a visual arrangement (100) of containers (102) which reflects a hierarchical relationship of the file structure. A concentric curved shape is then formed representing each container in the file structure and files within the containers, the curved shape having a geometry and location according to the determined visual arrangement. A viewpoint (600) is then established for the curved shape which is substantially radial thereto and allows viewing from a root container of the file structure towards one or more child containers of the file structure. The curved shape is then rendered, relative to the viewpoint, to a display (2114). Desirably, the files within a container (102) are represented as a tower (104) in the curved shape.

Abstract: The present invention relates to a process for producing steel with retained austenite. In one embodiment, the process comprises the steps of heating a steel alloy to produce austenite, quenching the steel to produce martensite, and carbon partitioning to transfer carbon from the martensite to the austenite.

Abstract: A method is disclosed for viewing a collection of data objects. The method initially sorts the collection according to at least two fields associated with the data objects. The data objects are then arranged within a range along said at least two fields into groups. A three dimensional presentation of the collection is then formed having two of the dimensions formed by two of the at least two fields and a third dimension incorporating a representation of each data object in the corresponding group.

Abstract: A process of forming a nitride film on a semiconductor substrate including exposing a surface of the substrate to a rapid thermal process to form the nitride film.

Abstract: In a method for the control of the strength and the temperature of at least two temperature controlled air flows which serve for the temperature control of at least two corresponding regions of a space and which are generated by making available a cold air flow and a hot air flow whose temperatures can be controlled individually and/or whose strengths can be controlled individually or in combination, by forming in each case a cold air regional part flow and a hot air flow for each of the regions from the cold air flow and the hot air flow, by respective restriction or additional supply of the regional part flows by respectively corresponding, controllable restrictor devices or at least one additional supply device and mixing of corresponding regional part flows for the respective regions, a desired temperature and a desired strength of an air flow to be supplied to the region are set for each of the regions and the strength of the cold air flow and/or of the hot air flow and/or at least one of the restrictor