Abstract: Some embodiments correlate various manufacturing or design information or data with patterns used to represent electronic designs and provide pertinent pattern-based information to metrology, fabrication, or testing tools to enhance their performances of their intended functions. Some embodiments further utilize cross-design or cross-process analytics to perform various pattern-based analyses on electronic designs. Some embodiments perform squish analysis with a squish pattern library on an electronic design to represent the electronic design with squish patterns by performing pattern matching, pattern decomposition, and pattern classification process.

Abstract: Some embodiments correlate various manufacturing or design information or data with patterns used to represent electronic designs and provide pertinent pattern-based information to metrology, fabrication, or testing tools to enhance their performances of their intended functions. Some embodiments further utilize cross-design or cross-process analytics to perform various pattern-based analysis on electronic designs. Some embodiments perform squish analysis with a squish pattern library on an electronic design to represent the electronic design with squish patterns by performing pattern matching, pattern decomposition, and pattern classification process.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: According to various embodiments of the invention, systems and methods for design rule checking enhanced with pattern matching is provided, wherein the design rule checker ignores certain patterns of the layout that violate design rules during validation. One embodiment of the invention includes receiving a first layout pattern that containing the original layout of an integrated circuit pattern. The pattern matcher processes the layout pattern and designates certain patterns of the integrated circuit pattern that meet a design waiver. The pattern matcher generates a second layout pattern with the waived patterns marked. The design rule checker subsequently processes the marked layout pattern and validates all but the marked patterns of the second layout pattern against a set of specified design rules. The design rule checker generates a third layout pattern with only the unmarked patterns of the layout being validated against the set of specified design rules.

Abstract: According to various embodiments of the invention, systems and methods for design rule checking enhanced with pattern matching is provided, wherein the design rule checker ignores certain patterns of the layout that violate design rules during validation. One embodiment of the invention includes receiving a first layout pattern that containing the original layout of an integrated circuit pattern. The pattern matcher processes the layout pattern and designates certain patterns of the integrated circuit pattern that meet a design waiver. The pattern matcher generates a second layout pattern with the waived patterns marked. The design rule checker subsequently processes the marked layout pattern and validates all but the marked patterns of the second layout pattern against a set of specified design rules. The design rule checker generates a third layout pattern with only the unmarked patterns of the layout being validated against the set of specified design rules.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: Disclosed is a complete SAT solver, Chaff, which is one to two orders of magnitude faster than existing SAT solvers. Using the Davis-Putnam (DP) backtrack search strategy, Chaff employs efficient Boolean Constraint Propagation (BCP), termed two literal watching, and a low overhead decision making strategy, termed Variable State Independent Decaying Sum (VSIDS). During BCP, Chaff watches two literals not assigned to zero. The literals can be specifically ordered or randomly selected. VSIDS ranks variables, the highest-ranking literal having the highest counter value, where counter value is incremented by one for each occurrence of a literal in a clause. Periodically, the counters are divided by a constant to favor literals included in recently created conflict clauses. VSIDS can also be used to select watched literals, the literal least likely to be set (i.e., lowest VSIDS rank, or lowest VSIDS rank combined with last decision level) being selected to watch.

Abstract: Disclosed is a complete SAT solver, Chaff, which is one to two orders of magnitude faster than existing SAT solvers. Using the Davis-Putnam (DP) backtrack search strategy, Chaff employs efficient Boolean Constraint Propagation (BCP), termed two literal watching, and a low overhead decision making strategy, termed Variable State Independent Decaying Sum (VSIDS). During BCP, Chaff watches two literals not assigned to zero. The literals can be specifically ordered or randomly selected. VSIDS ranks variables, the highest-ranking literal having the highest counter value, where counter value is incremented by one for each occurrence of a literal in a clause. Periodically, the counters are divided by a constant to favor literals included in recently created conflict clauses. VSIDS can also be used to select watched literals, the literal least likely to be set (i.e., lowest VSIDS rank, or lowest VSIDS rank combined with last decision level) being selected to watch.