Patents by Inventor Matthew T. Whitman

Matthew T. Whitman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Selective titanium nitride deposition using oxides of lanthanum masks
    Patent number: 10332747
    Abstract: In an exemplary method, a dielectric layer is deposited on a substrate. A masking layer is formed over a first region and a second region of the dielectric layer. The masking layer is made of an oxide of lanthanum. The masking layer is removed from the second region of the dielectric layer. A work function layer is formed directly on only the second region of the dielectric layer. The work function layer is made of titanium nitride that is formed by using a combination of titanium tetrachloride and ammonia (TiCl4/NH3).
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: June 25, 2019
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Koji Watanabe, Meng Zhu, Brian A. Cohen, Matthew T. Whitman, Balaji Kannan