Patents by Inventor Matthias A. Colomb

Matthias A. Colomb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11958022
    Abstract: A polymer handling method for a polycrystalline silicon manufacturing device, wherein the polymer byproducts are treated in a manner that the silicon polymers are hydrolyzed. The method creates a heated treatment gas with a moisture content that both treats the polymer to a depth of about 0.25 mm to prohibit formation of the friction and shock sensitive layer near the polymer surface and keeps the hydrolyzed polymer humidified. Furthermore the polymer handling method includes inactivation of the polymer, removal of the polymer of the system and disposal of the polymer after removal.
    Type: Grant
    Filed: October 7, 2020
    Date of Patent: April 16, 2024
    Assignees: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA), HIGH-PURITY SILICON CORPORATION
    Inventors: Wes Teichmiller, Bryan H. Nettles, Mark Servos, Matthias A. Colomb
  • Patent number: 11786877
    Abstract: In the hydrochlorination reaction, silicon tetrachloride (STC), metallurgical silicon, and hydrogen are converted to trichlorosilane (TCS) at about 540° C. Previously, a pilot-scale reactor was used to study the yield of TCS produced by the hydrochlorination reaction. The yield observed by experimentation compared favorably with a scalable mathematical model developed to predict the rate of TCS conversion. The model predicted that 90% of the final amount of TCS produced was achieved after the reactant gas traveled a quarter of the vertical distance in the reaction section of the reactor. The pilot-scale reactor was shortened to verify the model predictions. In addition, some catalytic effects on the reaction were studied.
    Type: Grant
    Filed: March 23, 2021
    Date of Patent: October 17, 2023
    Assignees: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA), HIGH-PURITY SILICON CORPORATION
    Inventors: Matthias A. Colomb, Bryan H. Nettles
  • Publication number: 20220105477
    Abstract: A polymer handling method for a polycrystalline silicon manufacturing device, wherein the polymer byproducts are treated in a manner that the silicon polymers are hydrolyzed. The method creates a heated treatment gas with a moisture content that both treats the polymer to a depth of about 0.25 mm to prohibit formation of the friction and shock sensitive layer near the polymer surface and keeps the hydrolyzed polymer humidified. Furthermore the polymer handling method includes inactivation of the polymer, removal of the polymer of the system and disposal of the polymer after removal.
    Type: Application
    Filed: October 7, 2020
    Publication date: April 7, 2022
    Applicant: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA)
    Inventors: Wes Teichmiller, Bryan H. Nettles, Mark Servos, Matthias A. Colomb
  • Patent number: 11261096
    Abstract: A polymer inactivation method for a polycrystalline silicon manufacturing device, wherein the polymer byproducts are treated and additionally treated in a manner that controls the rate of reaction. The polymer byproducts are treated with a first inert gas under partial vacuum and a second oxygen containing gas to convert the polymer byproducts. The reaction rate can be controlled by regulating the fill pressure of reactant gas, controlling the amount of oxygen in the reactant gas, and stripping of the raw polymer with heat and or a vacuum. The solid byproduct remaining after treating the polymer, which is predominately silicon suboxides (SiOx) and silicon dioxide (SiO2), is inert and is easily removed.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: March 1, 2022
    Assignees: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA), MITSUBISHI MATERIALS CORPORATION
    Inventors: Matthias Colomb, Rick Deckbar, Bryan Nettles
  • Publication number: 20210291133
    Abstract: In the hydrochlorination reaction, silicon tetrachloride (STC), metallurgical silicon, and hydrogen are converted to trichlorosilane (TCS) at about 540° C. Previously, a pilot-scale reactor was used to study the yield of TCS produced by the hydrochlorination reaction. The yield observed by experimentation compared favorably with a scalable mathematical model developed to predict the rate of TCS conversion. The model predicted that 90% of the final amount of TCS produced was achieved after the reactant gas traveled a quarter of the vertical distance in the reaction section of the reactor. The pilot-scale reactor was shortened to verify the model predictions. In addition, some catalytic effects on the reaction were studied.
    Type: Application
    Filed: March 23, 2021
    Publication date: September 23, 2021
    Applicant: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA)
    Inventors: Matthias A. Colomb, Bryan H. Nettles
  • Patent number: 10512954
    Abstract: A method to prevent groundings of polycrystalline silicon rod holders to a reactor plate by the residual polymer in the following manner: first, providing a polycrystalline silicon reactor having a reactor plate with a plurality of silicon rod holders separated from the reactor plate with an insulation; next establishing an electrical circuit from a ground connection on the reactor plate connected to high potential test equipment to a high voltage probe; and finally completing the electrical circuit by contacting the high voltage probe to the holder. By this method any remaining polymer is physically removed as the polymer burns or is ejected by the energetic release caused by mild arcing from the holder to the reactor plate.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: December 24, 2019
    Assignees: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA), MITSUBISHI MATERIALS CORPORATION
    Inventors: Mark Servos, Steve Varnes, Matthias Colomb
  • Publication number: 20190337030
    Abstract: A method to prevent groundings of polycrystalline silicon rod holders to a reactor plate by the residual polymer in the following manner: first, providing a polycrystalline silicon reactor having a reactor plate with a plurality of silicon rod holders separated from the reactor plate with an insulation; next establishing an electrical circuit from a ground connection on the reactor plate connected to high potential test equipment to a high voltage probe; and finally completing the electrical circuit by contacting the high voltage probe to the holder. By this method any remaining polymer is physically removed as the polymer burns or is ejected by the energetic release caused by mild arcing from the holder to the reactor plate.
    Type: Application
    Filed: May 2, 2018
    Publication date: November 7, 2019
    Inventors: Mark Servos, Steve Varnes, Matthias Colomb
  • Publication number: 20190002296
    Abstract: A polymer inactivation method for a polycrystalline silicon manufacturing device, wherein the polymer byproducts are treated in a manner that controls the rate of reaction.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 3, 2019
    Inventors: Matthias Colomb, Rick Deckbar, Bryan Nettles
  • Patent number: 9758384
    Abstract: The present invention relates to internals useful for minimizing bubble size in a bubbling fluidized bed reactor. One use for the invention is in an apparatus and method for producing trichlorosilane in which metallurgical grade silicon is reacted with hydrogen chloride gas and while being fluidized by the hydrogen chloride gas, thereby producing trichlorosilane.
    Type: Grant
    Filed: December 1, 2014
    Date of Patent: September 12, 2017
    Assignees: Mitsubishi Polycrystalline Silicon America Corporation (MIPSA), MITSUBISHI MATERIALS CORPORATION
    Inventors: Bryan Nettles, Matthias Colomb, Rick Deckbar
  • Publication number: 20160152482
    Abstract: The present invention relates to internals useful for minimizing bubble size in a bubbling fluidized bed reactor. One use for the invention is in an apparatus and method for producing trichlorosilane in which metallurgical grade silicon is reacted with hydrogen chloride gas and while being fluidized by the hydrogen chloride gas, thereby producing trichlorosilane.
    Type: Application
    Filed: December 1, 2014
    Publication date: June 2, 2016
    Inventors: Bryan Nettles, Matthias Colomb, Rick Deckbar
  • Patent number: 8945474
    Abstract: This invention is a heater used to heat the feed process gas from 450° C. to greater than about 600° C. for the fluidized bed reactor (FBR) used for conversion of silicon tetrachloride (STC) to trichlorosilane (TCS). The invention involves stacked heater element carbon plates. The design of the plates allow the plates to act as baffles which improve heat transfer to the feed gas. Also, the heat gradients across each plate is calculated to be approximately 100° C. which is much lower than the gradient seen by conventional vertical heater elements. The design of the present invention prevents electrical grounding. In the design, the elements are surrounded by graphite wrapped in carbon felt to prevent heat loss by radiation and conduction.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 3, 2015
    Assignees: Mitsubishi Polycrystaline Silicon America Corporation (MIPSA), Mitsubishi Materials Corporation
    Inventors: Matthias Colomb, Rick Deckbar, Wesley Teichmiller, Bryan Nettles