Abstract: A measurement apparatus (10) for interferometrically measuring a shape of a surface (12) of a test object (14) in relation to a reference shape includes a diffractive optical element (30) generating a test wave (32) from measurement radiation (22), whereas a wavefront of the test wave is adapted to a target shape of the surface of the test object and the target shape is configured as a first non-spherical surface, and a reference element (38) with a reference surface (40) having the reference shape, the reference shape being configured as a further non-spherical surface and the reference element including a low thermal expansion material with a mean coefficient of thermal expansion having an absolute value of no more than 200×10?6 K?1 in the temperature range from 5° C. to 35° C.

Abstract: A method for calibrating a measuring device (10) for interferometrically determining a shape of an optical surface (12) of an object under test (14). The measuring device includes a module plane (32) for arranging a diffractive optical test module (30) which is configured to generate a test wave (34) that is directed at the optical surface and that has a wavefront at least approximately adapted to a target shape (60) of the optical surface. The method includes: arranging a diffractive optical calibration module (44) in the module plane for generating a calibration wave (80), acquiring a calibration interferogram (88) generated using the calibration wave in a detector plane (43) of the measuring device, and determining a position assignment distribution (46) of points (52) in the module plane to corresponding points (54) in the detector plane from the acquired calibration interferogram.

Abstract: A measurement apparatus for interferometric shape measurement of a test object surface. A test optical unit produces from measurement radiation a test wave for irradiating the surface. A reference element with an optically effective surface interacts with a reference wave also produced from the measurement radiation. An interferogram is produced by superimposing the test wave after interaction with the test object's surface. A holding device holds the reference element and moves the reference element relative to the reference wave in at least two rigid body degrees of freedom so that a peripheral point of the reference element's optically effective surface shifts by at least 0.1% of a diameter of the optically effective surface. The at least two degrees of freedom include a translational degree, directed transversely to a propagation direction of the reference wave and a rotational degree, whose rotational axis aligns substantially parallel to the reference wave's propagation direction.

Abstract: A method for calibrating a measuring device (10) for interferometrically determining a shape of an optical surface (12) of an object under test (14). The measuring device includes a module plane (32) for arranging a diffractive optical test module (30) which is configured to generate a test wave (34) that is directed at the optical surface and that has a wavefront at least approximately adapted to a target shape (60) of the optical surface. The method includes: arranging a diffractive optical calibration module (44) in the module plane for generating a calibration wave (80), acquiring a calibration interferogram (88) generated using the calibration wave in a detector plane (43) of the measuring device, and determining a position assignment distribution (46) of points (52) in the module plane to corresponding points (54) in the detector plane from the acquired calibration interferogram.

Abstract: In a system and a method for the automated design of an automation unit, multiple electronically controllable components are interconnected in a work dependency. The system includes a central web server having a database, an interface for importing technical application data for the automation unit, a processor, which applies technical application data and provided functionality data sets of the components according to interconnection rules to generate a circuit diagram for the components. The system can also include a converting unit, which converts the generated circuit diagram into control commands for the design of the automation unit.

Abstract: An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 ?m or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

Abstract: An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 ?m or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

Abstract: An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 ?m or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

Abstract: Electromagnetic illumination radiation is produced and provided as an input wave. The input wave passes through a diffractive optical element and leaves as an incoming measuring wave, the wave front of the input wave being transformed such that the wave front of the incoming measuring wave is adapted to the desired shape of the effective reflection surface. Furthermore, the test object is disposed in a test position in which the incoming measuring wave is reflected back to the diffractive optical element as a reflected measuring wave, the reflected measuring wave passing through the diffractive optical element and leaving as an outgoing measuring wave, the propagation direction of the outgoing measuring wave being deviated in relation to the opposite propagation direction of the input wave. A reference wave branched off from the illumination radiation interferes with the outgoing measuring wave this interference being recorded by detector.

Abstract: The invention relates to a method and to an apparatus for interferometrically determining a deviation of an actual shape of an effective reflection surface (12) of a test object (14) from a desired shape of the effective reflection surface (12). In the method according to the invention electromagnetic illumination radiation (24) is produced by means of an illumination device (16) and provided as an input wave (30). The input wave (30) passes through a diffractive optical element (18) and leaves the latter as an incoming measuring wave (42), the wave front of the input wave (30) being transformed upon passing through the optical element (18) such that the wave front of the incoming measuring wave (42) is adapted to the desired shape of the effective reflection surface (12).

Abstract: A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49;