Patents by Inventor Matthias Exler

Matthias Exler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9081310
    Abstract: An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
    Type: Grant
    Filed: September 6, 2012
    Date of Patent: July 14, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Matthias Exler, Ulrich Loering, Toralf Gruner, Holger Walter
  • Publication number: 20130016331
    Abstract: An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
    Type: Application
    Filed: September 6, 2012
    Publication date: January 17, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Matthias Exler, Ulrich Loering, Toralf Gruner, Holger Walter