Abstract: A bis(aryl)acetal has structure (1) wherein Ar1 and Ar2 are each independently an aryl or heteroaryl group. R1 and R2 are each independently hydrogen, or an alkyl, cycloalkyl, aryl, or heteroaryl group, and R1 and R2 can connect directly with each other. Y is a leaving group or a boron-containing functional group bonded to Ar2 via a boron atom. The bis(aryl)acetal is useful as a monomer that can be polymerized to yield a polymer with an acid-sensitive backbone.

Abstract: Provided is a non-cyclopentadienyl-based chromium-ligand complex, preferably a chromium-ligand complex of formula (J): LCr(RA)m(D)k (J), wherein L is a non-Cp monoanionic ligand; Cr (chromium) is in a formal oxidation state of +3 or +2; when Cr formally is Cr+3, either m is 1 and RA is hydrocarbylene (a hydrocarbylene chromium-ligand complex of formula (J)) or m is 2 and each RA independently is hydrocarbyl (a dihydrocarbyl chromium-ligand complex of formula (J)), wherein each hydrocarbyl or hydrocarbylene of RA independently is unsubstituted or substituted by from 1 to 5 RAS; each RAS independently is a neutral aprotic heteroalkyl, neutral aprotic heterocycloalkyl, neutral aprotic heteroaryl, or neutral aprotic aryl; when Cr formally is Cr+2, m is 1 and RA is hydrocarbyl (a hydrocarbyl chromium-ligand complex of formula (J)); k is an integer of 0 or 1; D is absent when k is 0 or D is a neutral ligand when k is 1; wherein the chromium-ligand complex of formula (J) is overall neutral and lacks a cyclopentadien

Abstract: A polymer includes repeat units having the structure wherein R1, R2, Ar1, Ar2, and Ar3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Abstract: Provided is a non-cyclopentadienyl-based chromium-ligand complex, preferably a chromium-ligand complex of formula (J): LCr(RA)m(D)k (J), wherein L is a non-Cp monoanionic ligand; Cr (chromium) is in a formal oxidation state of +3 or +2; when Cr formally is Cr+3, either m is 1 and RA is hydrocarbylene (a hydrocarbylene chromium-ligand complex of formula (J)) or m is 2 and each RA independently is hydrocarbyl (a dihydrocarbyl chromium-ligand complex of formula (J)), wherein each hydrocarbyl or hydrocarbylene of RA independently is unsubstituted or substituted by from 1 to 5 RAS; each RAS independently is a neutral aprotic heteroalkyl, neutral aprotic heterocycloalkyl, neutral aprotic heteroaryl, or neutral aprotic aryl; when Cr formally is Cr+2, m is 1 and RA is hydrocarbyl (a hydrocarbyl chromium-ligand complex of formula (J)); k is an integer of 0 or 1; D is absent when k is 0 or D is a neutral ligand when k is 1; wherein the chromium-ligand complex of formula (J) is overall neutral and lacks a cyclopentadien

Abstract: Provided is a non-cyclopentadienyl-based chromium-ligand complex, preferably a chromium-ligand complex of formula (J): LCr(RA)m(D)k (J), wherein L is a non-Cp monoanionic ligand; Cr (chromium) is in a formal oxidation state of +3 or +2; when Cr formally is Cr+3, either m is 1 and RA is hydrocarbylene (a hydrocarbylene chromium-ligand complex of formula (J)) or m is 2 and each RA independently is hydrocarbyl (a dihydrocarbyl chromium-ligand complex of formula (J)), wherein each hydrocarbyl or hydrocarbylene of RA independently is unsubstituted or substituted by from 1 to 5 RAS; each RAS independently is a neutral aprotic heteroalkyl, neutral aprotic heterocycloalkyl, neutral aprotic heteroaryl, or neutral aprotic aryl; when Cr formally is Cr+2, m is 1 and RA is hydrocarbyl (a hydrocarbyl chromium-ligand complex of formula (J)); k is an integer of 0 or 1; D is absent when k is 0 or D is a neutral ligand when k is 1; wherein the chromium-ligand complex of formula (J) is overall neutral and lacks a cyclopentadien

Abstract: The invention provides a composition comprising at least one compound selected from the following Formulas A, B1, B2, B3, B4 or C: or a combination thereof (C). For each formula, the R groups are described herein.

Abstract: A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.

Abstract: Provided is a non-cyclopentadienyl-based chromium-ligand complex, preferably a chromium-ligand complex of formula (J): LCr(RA)m(D)k (J), wherein L is a non-Cp monoanionic ligand; Cr (chromium) is in a formal oxidation state of +3 or +2; when Cr formally is Cr+3, either m is 1 and RA is hydrocarbylene (a hydrocarbylene chromium-ligand complex of formula (J)) or m is 2 and each RA independently is hydrocarbyl (a dihydrocarbyl chromium-ligand complex of formula (J)), wherein each hydrocarbyl or hydrocarbylene of RA independently is unsubstituted or substituted by from 1 to 5 RAS; each RAS independently is a neutral aprotic heteroalkyl, neutral aprotic heterocycloalkyl, neutral aprotic heteroaryl, or neutral aprotic aryl; when Cr formally is Cr+2, m is 1 and RA is hydrocarbyl (a hydrocarbyl chromium-ligand complex of formula (J)); k is an integer of 0 or 1; D is absent when k is 0 or D is a neutral ligand when k is 1; wherein the chromium-ligand complex of formula (J) is overall neutral and lacks a cyclopentadien

Abstract: In a method of forming a polyacetal or polyketal, a specific acetal- or ketal-containing bis(aryl)acetal is coupled with itself or a comonomer in the presence of a catalyst and a base. The polymerization reaction tolerates hydroxyl and other functional groups on the bis(aryl)acetal. Among other applications, the polyacetals and polyketals are useful components of photoresist compositions.

Abstract: In a method of forming a polyacetal or polyketal, a specific acetal- or ketal-containing bis(aryl)acetal is coupled with itself or a comonomer in the presence of a catalyst and a base. The polymerization reaction tolerates hydroxyl and other functional groups on the bis(aryl)acetal. Among other applications, the polyacetals and polyketals are useful components of photoresist compositions.

Abstract: A polymer includes repeat units having the structure wherein R1, R2, Ar1, Ar2, and Ar3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Abstract: A bis(aryl)acetal has the formula wherein Y1 and Y2 are each independently chloro, bromo, iodo, mesylate, tosylate, triflate, or Bx, provided that Y1 and Y2 are not both selected from chloro, bromo, and iodo; each occurrence of Bx is independently a boron-containing functional group bonded to Ar1 or Ar2 via a boron atom; Ar1 and Ar2 are each independently unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene; provided that Ar1 and Ar2 are not covalently linked to each other to form a ring structure that includes -Ar1-O—C—O-Ar2-; and R1 and R2 are each independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-20 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-20 heteroaryl. The bis(aryl)acetal is useful as a monomer for oligoacetal and polyacetal synthesis via Suzuki polycondensation.

Abstract: A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.

Abstract: A bis(aryl)acetal has the formula wherein Y1 and Y2 are each independently chloro, bromo, iodo, mesylate, tosylate, triflate, or Bx, provided that Y1 and Y2 are not both selected from chloro, bromo, and iodo; each occurrence of Bx is independently a boron-containing functional group bonded to Ar1 or Ar2 via a boron atom; Ar1 and Ar2 are each independently unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene; provided that Ar1 and Ar2 are not covalently linked to each other to form a ring structure that includes —Ar1—O—C—O—Ar2—; and R1 and R2 are each independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-20 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-20 heteroaryl. The bis(aryl)acetal is useful as a monomer for oligoacetal and polyacetal synthesis via Suzuki polycondensation.

Abstract: Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: The invention provides a composition comprising at least one compound selected from the following Formulas A, B1, B2, B3, B4 or C: or a combination thereof (C). For each formula, the R groups are described herein.

Abstract: Provided are new functionalized surfactants and methods of their preparation and use. The surfactants are compounds of formula I: wherein R1, R2, and R3 are as defined herein.

Abstract: The invention disclosed in this document is related to field of pesticides and their use in controlling pests. In particular compounds having the following formula are disclosed.

Abstract: Compounds having the following generic formula are disclosed.

Abstract: Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.