Abstract: Systems and methods for optical lithography using photo-masks and accessory optical components are disclosed. In one embodiment, a system includes a photo-mask with a body element, one or more diffractive elements, and one or more functional-element-producing features. The diffractive elements can be disposed on or within at least a portion of the body element and can be configured to produce, upon illumination of the photo-mask, multiple beams to form a three-dimensional periodic-optical-intensity pattern in a photosensitive material. The functional-element-producing features can be disposed on or within at least a portion of the body element and can be configured to produce, upon illumination of the photo-mask, a corresponding functional element pattern as an increased optical intensity pattern or decreased optical intensity pattern within the three-dimensional periodic-optical-intensity pattern in the photosensitive material.