Patents by Inventor Maurice Willem Jozef Etiënne Wijckmans
Maurice Willem Jozef Etiënne Wijckmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11269262Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.Type: GrantFiled: April 4, 2019Date of Patent: March 8, 2022Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 11169450Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.Type: GrantFiled: March 18, 2019Date of Patent: November 9, 2021Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 11029612Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator.Type: GrantFiled: February 15, 2018Date of Patent: June 8, 2021Assignee: ASML Netherlands B.V.Inventors: Maarten Hartger Kimman, Hans Butler, Olof Martinus Josephus Fischer, Christiaan Alexander Hoogendam, Theodorus Mattheus Joannus Maria Huizinga, Johannes Marinus Maria Rovers, Eric Pierre-Yves Vennat, Maurice Willem Jozef Etienne Wijckmans
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Patent number: 10962890Abstract: The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.Type: GrantFiled: November 29, 2018Date of Patent: March 30, 2021Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Franciscus Johannes Simons, Dave Braaksma, Hans Butler, Hendrikus Herman Marie Cox, René Wilhelmus Antonius Hubertus Leenaars, Stephan Christiaan Quintus Libourel, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10955761Abstract: The present invention relates to a lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, a sensor frame, a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, a sensor frame support supporting the sensor frame on a reference, a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.Type: GrantFiled: January 11, 2018Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10866529Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.Type: GrantFiled: January 11, 2018Date of Patent: December 15, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Michael Johannes Vervoordeldonk, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20200363732Abstract: The present invention relates to a positioning system, comprising: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.Type: ApplicationFiled: November 29, 2018Publication date: November 19, 2020Applicant: ASML Netherlands B.V.Inventors: Wilhelmus Franciscus Johannes SIMONS, Dave BRAAKSMA, Hans BUTLER, Hendrikus Herman Marie COX, René Wilhelmus Antonius Hubertus LEENAARS, Stephan Christiaan Quintus LIBOUREL, Martinus VAN DUIJNHOVEN, Maurice Willem Jozef Etiënne WIJCKMANS
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Patent number: 10838312Abstract: The present invention relates to a lithographic apparatus, comprising: —a primary frame (10) which is provided with a functional unit (11, 12, 14), —a secondary frame (20), —a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, —a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), —a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.Type: GrantFiled: January 30, 2018Date of Patent: November 17, 2020Assignee: ASML Netherlands B.V.Inventors: Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10816910Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.Type: GrantFiled: February 3, 2017Date of Patent: October 27, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
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Patent number: 10578983Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.Type: GrantFiled: November 17, 2016Date of Patent: March 3, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Björn Hubertus Maria Bukkems, Cornelius Adrianus Lambertus De Hoon, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20200057379Abstract: The present invention relates to a lithographic apparatus, comprising: a primary frame (10) which is provided with a functional unit (11, 12, 14), a secondary frame (20), a primary frame support (30), which is adapted to support the primary frame onto the secondary frame, a flexible utility connection (40), adapted to connect the functional unit to an auxiliary system (51, 52, 53), a vibration isolation body (60) having a body mass, which is moveably connected to the secondary frame by a flexible passive body support (61) having a body support stiffness, wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.Type: ApplicationFiled: January 30, 2018Publication date: February 20, 2020Inventors: Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
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Publication number: 20200049203Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator.Type: ApplicationFiled: February 15, 2018Publication date: February 13, 2020Inventors: Maarten Hartger KIMMAN, Hans BUTLER, Olof Martinus Josephus FISCHER, Christiaan Alexander HOOGENDAM, Theodorus Mattheus Joannus Maria HUIZINGA, Johannes Marinus Maria ROVERS, Eric Pierre-Yves VENNAT, Maurice Willem Jozef Etiënne WIJCKMANS
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Publication number: 20200050120Abstract: The present invention relates to a lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, a sensor frame, a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, a sensor frame support supporting the sensor frame on a reference, a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.Type: ApplicationFiled: January 11, 2018Publication date: February 13, 2020Inventors: Hans BUTLER, Maurice Willem Jozef Etiënne WIJCKMANS
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Patent number: 10503086Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: GrantFiled: December 7, 2016Date of Patent: December 10, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20190354021Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.Type: ApplicationFiled: January 11, 2018Publication date: November 21, 2019Inventors: Hans BUTLER, Michael Johannes VERVOORDELDONK, Maurice Willem Jozef Etiënne WIJCKMANS
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Patent number: 10209634Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.Type: GrantFiled: January 26, 2016Date of Patent: February 19, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Maurice Willem Jozef Etiënne Wijckmans, Engelbertus Antonius Fransiscus Van Der Pasch, Christiaan Alexander Hoogendam, Bernardus Antonius Johannes Luttikhuis
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Publication number: 20190049852Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.Type: ApplicationFiled: February 3, 2017Publication date: February 14, 2019Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etienne Wijckmans
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Publication number: 20190011838Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: ApplicationFiled: December 7, 2016Publication date: January 10, 2019Inventors: Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Fransiscus Mathijs JACOBS, Pavel KAGAN, Jeroen Pieter STARREVELD, Maurice Willem Jozef Etiënne WIJCKMANS
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Publication number: 20180373156Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.Type: ApplicationFiled: November 17, 2016Publication date: December 27, 2018Inventors: Hans BUTLER, Björn Hubertus Maria BUKKEMS, Cornelius Adrianus Lambertus DE HOON, Maurice Willem Jozef Etiënne WIJCKMANS
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Publication number: 20180017879Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.Type: ApplicationFiled: January 26, 2016Publication date: January 18, 2018Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Maurice Willem Jozef Etiënne WIJCKMANS, Engelbertus Antonius Fransiscus VAN DER PASCH, Christiaan Alexander HOOGENDAM, Bernardus Antonius Johannes LUTTIKHUIS