Abstract: A multilayer Laue lens (MLL) that can be operated over a large range of wavelengths which is achieved by providing a lens blank comprising a substrate element extending in a plane defined by orthogonal axes x, y, z, with a layered structure deposited on the upper surface with at least two different materials that are layered upon one another in an alternating manner, wherein the y-extension of the layered structure is constant along the x-axis and varies along the z-axis within a ramp section where the y-extension of the layered structure increases from a starting point, where first particles of material of the layered structure are deposited on the upper surface of the substrate element, to a saturation point, where a maximum y-extension of the layered structure is reached; and slicing a lens out of the lens blank.

Abstract: Disclosed is a method for producing a multilayer Laue lens.

Abstract: An optical element for deflecting X-rays comprising a multilayer structure including amorphous first WC layers and amorphous second SiC layers, wherein each two adjacent ones of the first layers are separated by a respective one of the second layers such that the first and second layers are arranged alternatingly, wherein at least some of the first layers and at least some of the second layers have a thickness of at least 3 nm. A method of producing such an optical element and to use of such an optical element is also disclosed.

Abstract: An optical element for deflecting X-rays comprising a multilayer structure including amorphous first WC layers and amorphous second SiC layers, wherein each two adjacent ones of the first layers are separated by a respective one of the second layers such that the first and second layers are arranged alternatingly, wherein at least some of the first layers and at least some of the second layers have a thickness of at least 3 nm. A method of producing such an optical element and to use of such an optical element is also disclosed.

Abstract: A method and a system for manufacturing two-dimensional and three-dimensional nanostructures and nanodevices are described, wherein the formation of the nanostructure (of the nanodevice) on a target substrate is made, at a millimetric or super-millimetric distance from the substrate, by the deposition of material emitted in the form of an atomic/molecular beam having a selected pattern corresponding, at an enlarged scale, to the desired pattern of the nanostructure (nanodevice). The projection of the patterned beam through a diaphragm, associated with the substrate at a micrometric or sub-micrometric distance and having at least one shaped aperture of nanometric size, brings about the formation of a nanostructure pattern which is a convolution of the patterned beam with the diaphragm aperture.