Patents by Inventor Max Haider

Max Haider has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
    Patent number: 7135677
    Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: November 14, 2006
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Oliver Kienzle, Rainer Knippelmeyer, Stephan Uhlemann, Max Haider, Heiko Müller
  • Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same
    Patent number: 6903337
    Abstract: An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.
    Type: Grant
    Filed: July 1, 2002
    Date of Patent: June 7, 2005
    Assignee: Carl Zeiss SMT AG
    Inventors: Oliver Kienzle, Dirk Stenkamp, Michael Steigerwald, Rainer Knippelmeyer, Max Haider, Heiko Müller, Stephan Uhlemann
  • Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
    Publication number: 20040084621
    Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.
    Type: Application
    Filed: August 12, 2003
    Publication date: May 6, 2004
    Applicant: LEO Elektronenmikroskopie GmbH
    Inventors: Oliver Kienzle, Rainer Knippelmeyer, Stephan Uhlemann, Max Haider, Heiko Muller