Patents by Inventor Maxim Philippe Frederic GENIN

Maxim Philippe Frederic GENIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for controlling a manufacturing process and associated apparatuses
    Patent number: 11947266
    Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: April 2, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Petrus Marcus Brantjes, Matthijs Cox, Boris Menchtchikov, Cyrus Emil Tabery, Youping Zhang, Yi Zou, Chenxi Lin, Yana Cheng, Simon Philip Spencer Hastings, Maxim Philippe Frederic Genin
  • METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES
    Publication number: 20220026810
    Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.
    Type: Application
    Filed: November 14, 2019
    Publication date: January 27, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Petrus Marcus BRANTJES, Matthijs COX, Boris MENCHTCHIKOV, Cyrus Emil TABERY, Youping ZHANG, Yi ZOU, Chenxi LIN, Yana CHENG, Simon Philip Spencer HASTINGS, Maxim Philippe Frederic GENIN