Patents by Inventor Mayumi Kataoka, legal representative

Mayumi Kataoka, legal representative has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive electron beam resist composition containing cresolnovolak resin, select additive and methyl gallate/1,2-naphthoquinonediazido-4-sulfonyl chloride reaction product
    Patent number: 5629127
    Abstract: The present invention relates to a positive electron beam resist composition containing a cresolnovolak resin, a lower molecular additive with a specific structure and a quinonediazide compound with a specific structure, and a developer for the positive electron beam resist, containing specific amounts of alkali metal ions, weak acid radical ions and a water soluble organic compound. The present invention can provide a positive electron beam resist composition with a novolak and a quinonediazide as main ingredients, excellent in dry etching resistance and resolution, and it if is used, a fine pattern can be obtained at high sensitivity especially when the developer of the present invention is used.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: May 13, 1997
    Assignee: Toray Industries, Inc.
    Inventors: Hiroki Oosedo, Mutsuo Kataoka, deceased, Mayumi Kataoka, legal representative, Shigeyoshi Kanetsuki, Kazutaka Tamura, Masaya Asano