Patents by Inventor Megumi Shimada

Megumi Shimada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11956415
    Abstract: The occlusion is faithfully expressed even in the binocular vision in the AR display by a head mounted display apparatus or the like. A head mounted display apparatus 10 includes a lens, a lens, a camera, a camera, and a control processor. A CG image for a right eye is displayed on the lens. A CG image for a left eye is displayed on the lens. The camera captures an image for the right eye. The camera captures an image for the left eye. The control processor generates the CG image for the right eye in which occlusion at the time of seeing by the right eye is expressed and the CG image for the left eye in which occlusion at the time of seeing by the left eye is expressed, based on the images captured by the cameras and projects the generated CG image for the right eye and CG image for the left eye onto the lenses and. A center of a lens of the camera is provided at the same position as a center of the lens. A center of a lens of the camera is provided at the same position as a center of the lens.
    Type: Grant
    Filed: January 5, 2023
    Date of Patent: April 9, 2024
    Assignee: MAXELL, LTD.
    Inventors: Osamu Kawamae, Kenichi Shimada, Manabu Katsuki, Megumi Kurachi
  • Patent number: 10239758
    Abstract: A silica sol which has excellent moisture absorption resistance and stability as well as high purity and which does not cause coloring of a solvent or a resin to which the silica sol has been applied. The silica sol contains high-purity silica particles, water and/or a liquid organic medium serving as a dispersion medium, and an organic base compound, the silica particles being dispersed in the dispersion medium, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m2/g; (b) the silica particles have a moisture absorption amount per specific surface area thereof of 0.5 mg/m2 or less; and (c) the organic base compound is not substantially contained in the inside thereof.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: March 26, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keiko Yoshitake, Naohiko Suemura, Megumi Shimada, Ichitaro Kikunaga
  • Patent number: 9969867
    Abstract: The silica sol of the invention contains silica particles having a mean primary particle size of 20 to 100 nm and which has a silica particle size/mean primary particle size ratio, determined through dynamic light scattering, of 3.0 or less, wherein the silica particles are surface-treated with an organic silane compound and have an ?-ray emission rate of 0.005 counts/cm2·hr or less and a moisture absorption coefficient, determined after allowing the silica particles to stand for 48 hours at 23° C. and a relative humidity of 50 RH %, of 0.5 mass % or lower.
    Type: Grant
    Filed: May 14, 2014
    Date of Patent: May 15, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naohiko Suemura, Megumi Shimada, Ichitaro Kikunaga
  • Patent number: 9777141
    Abstract: A silica-containing resin composition, characterized by containing a resin and silica particles in an amount of 5 to 300 parts by mass, with respect to 100 parts by mass of the resin, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m2/g; (b) the silica particles have a percent moisture absorption of 5.0 mass % or less at a relative humidity of 50%; and (c) the silica particles contain substantially no metallic impurity or halogen.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: October 3, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keiko Yoshitake, Ichitaro Kikunaga, Ai Miyamoto, Megumi Shimada
  • Publication number: 20160130425
    Abstract: A silica-containing resin composition, characterized by containing a resin and silica particles in an amount of 5 to 300 parts by mass, with respect to 100 parts by mass of the resin, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m2/g; (b) the silica particles have a percent moisture absorption of 5.0 mass % or less at a relative humidity of 50%; and (c) the silica particles contain substantially no metallic impurity or halogen.
    Type: Application
    Filed: June 5, 2014
    Publication date: May 12, 2016
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keiko YOSHITAKE, Ichitaro KIKUNAGA, Ai MIYAMOTO, Megumi SHIMADA
  • Publication number: 20160130152
    Abstract: A silica sol which has excellent moisture absorption resistance and stability as well as high purity and which does not cause coloring of a solvent or a resin to which the silica sol has been applied. The silica sol contains high-purity silica particles, water and/or a liquid organic medium serving as a dispersion medium, and an organic base compound, the silica particles being dispersed in the dispersion medium, wherein the silica particles satisfy the following requirements (a) to (c): (a) the silica particles have a specific surface area, as determined through a nitrogen absorption method, of 20 to 500 m2/g; (b) the silica particles have a moisture absorption amount per specific surface area thereof of 0.5 mg/m2 or less; and (c) the organic base compound is not substantially contained in the inside thereof.
    Type: Application
    Filed: June 5, 2014
    Publication date: May 12, 2016
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Keiko YOSHITAKE, Naohiko SUEMURA, Megumi SHIMADA, Ichitaro KIKUNAGA
  • Publication number: 20160068664
    Abstract: The silica sol of the invention contains silica particles having a mean primary particle size of 20 to 100 nm and which has a silica particle size/mean primary particle size ratio, determined through dynamic light scattering, of 3.0 or less, wherein the silica particles are surface-treated with an organic silane compound and have an ?-ray emission rate of 0.005 counts/cm2·hr or less and a moisture absorption coefficient, determined after allowing the silica particles to stand for 48 hours at 23° C. and a relative humidity of 50 RH %, of 0.5 mass % or lower.
    Type: Application
    Filed: May 14, 2014
    Publication date: March 10, 2016
    Inventors: Naohiko SUEMURA, Megumi SHIMADA, Ichitaro KIKUNAGA
  • Publication number: 20110281974
    Abstract: A process for producing a composition of a polymerizable organic compound containing silica particles characterized by comprising: (a) a process of preparing an amine-added organic solvent-dispersed silica sol, in which an amine compound is added to an organic solvent-dispersed silica sol that contains colloidal silica particles having an average primary particle size of 5 to 100 nm and that has a pH of 2.5 to 4.0 at 20° C. as measured in a diluted solution obtained by a method in which the same mass of the organic solvent-dispersed silica sol, methanol, and pure water are mixed together, so that the diluted solution obtained by the mixing method has a pH of 4.5 to 11.0 at 20° C.; and (b) a process of mixing the amine-added organic solvent-dispersed silica sol obtained in the process (a) with a polymerizable organic compound.
    Type: Application
    Filed: November 16, 2009
    Publication date: November 17, 2011
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Naohiko Suemura, Megumi Shimada, Toshiaki Takeyama