Abstract: A method for cleaning a semiconductor substrate is provided. The method includes the steps of: applying a first agent onto a top surface of the semiconductor substrate while the semiconductor substrate is rotated at a first rotational frequency; immersing the semiconductor substrate in a second agent while rotating the semiconductor substrate at a second rotational frequency; and rotating the semiconductor substrate at a third rotational frequency while a third agent is introduced onto the top surface of the semiconductor substrate. The first rotational frequency may be greater than the third rotational frequency and the third rotational frequency is greater than the second rotational frequency. In some embodiments, the second rotational frequency is zero and the semiconductor substrate is held stationary during the immersing step.

Abstract: A method for cleaning a semiconductor substrate is provided. The method includes the steps of: applying a first agent onto a top surface of the semiconductor substrate while the semiconductor substrate is rotated at a first rotational frequency; immersing the semiconductor substrate in a second agent while rotating the semiconductor substrate at a second rotational frequency; and rotating the semiconductor substrate at a third rotational frequency while a third agent is introduced onto the top surface of the semiconductor substrate. The first rotational frequency may be greater than the third rotational frequency and the third rotational frequency is greater than the second rotational frequency. In some embodiments, the second rotational frequency is zero and the semiconductor substrate is held stationary during the immersing step.

Abstract: The present invention provides a polymer and graphene blended electroactive composite coating material and method for preparing the same. The composite coating material is a composite material formed by blending a specific polymer and graphene; where the specific polymer is formed by polymerization of (A) aniline oligomer and (B) amino reactive monomer together with (C) modified graphene and is a kind of polymer selected by the group consisting of the following: epoxy resin, polyimide, polyamide, polyurethane, polylactic acid; (C) modified graphene is uniformly dispersed in the matrix of the specific polymer but not involved in polymerization; and the composite coating material is electroactive.

Abstract: A multifunctional massage joint protector, comprising an elastic piece body, a palm-shaped and a low-frequency massage part. The elastic piece body is used for coating and fixed on a human joint, the palm-shaped coating part coats the periphery of the human joint, and the low-frequency massage part is adjacent to the palm-shaped coating part and arranged on the elastic piece body. The joint protector, on one hand, uses the palm shape of the palm-shaped coating part to locate the human joint, in order to avoid the problem of shifting of the protector due to detachment when the human joint moves, and uses the low-frequency massage part to enhance the effect of the kneading and massaging, and on the other hand, coats the human joint by means of the palm-shaped coating part and the massage possesses a tactile sensation, thereby improving the use value of the protector.

Abstract: The present invention provides a method of producing hollow silica particles. First, an amine-ketimine compound is mixed with water to obtain a hydrophobic core dispersion, and then an organic siloxane compound and/or a coupling reagent is added into the hydrophobic core dispersion to form a core-shell silica dispersion. Then, the core-shell silica precipitate is separated from the core-shell silica dispersion, and then it is further dispersed and washed by a low carbon alcohol solution. Finally, hollow silica particles in accordance with the present invention are produced. In addition, the present invention also provides hollow silica particles produced by the afore-mentioned method without using any additional surfactant.

Abstract: The present invention provides a method of producing hollow silica particles. First, an amine-ketimine compound is mixed with water to obtain a hydrophobic core dispersion, and then an organic siloxane compound and/or a coupling reagent is added into the hydrophobic core dispersion to form a core-shell silica dispersion. Then, the core-shell silica precipitate is separated from the core-shell silica dispersion, and then it is further dispersed and washed by a low carbon alcohol solution. Finally, hollow silica particles in accordance with the present invention are produced. In addition, the present invention also provides hollow silica particles produced by the afore-mentioned method without using any additional surfactant.