Patents by Inventor Mei Ling Cheah

Mei Ling Cheah has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NITRILE GLOVE
    Publication number: 20230255286
    Abstract: Provided are nitrile gloves comprising manganese dioxide, that may have improved permeation resistance, especially improved permeation resistance against hydrogen peroxide. Provided also are methods for preparing the nitrile gloves and improving the permeation resistance of nitrile gloves.
    Type: Application
    Filed: August 2, 2021
    Publication date: August 17, 2023
    Inventors: Wei Kit Chee, Kam Hon @ Kwan Kam Onn Kuan, Mun Leong Kuan, Eu Jin Kuan, Fook Chuan Lai, Mei Ling Cheah, Sze Hui Lim
  • Glove and production process thereof
    Patent number: 9808039
    Abstract: The present invention reduces the minimum detectable volume of a piece of a glove in the detection using a metal detector. A glove made of a rubber or resin film which contains magnetic particles, wherein the quantity of the magnetic particles is 0.2 to less than 40 mass % relative to the whole of the film; and the magnetic particles comprise secondary particles formed by the agglomeration of primary particles.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: November 7, 2017
    Assignees: Midori Anzen Co. Ltd., Hartalega SDN BHD
    Inventors: Norihide Enomoto, Taichi Ogawa, Daisuke Hirama, Kam Hon Kuan, Mun Leong Kuan, Eu Jin Kuan, Mei Ling Cheah, Bin Mat Satar Mohd Zaidi
  • GLOVE AND PRODUCTION PROCESS THEREOF
    Publication number: 20160150840
    Abstract: The present invention reduces the minimum detectable volume of a piece of a glove in the detection using a metal detector. A glove made of a rubber or resin film which contains magnetic particles, wherein the quantity of the magnetic particles is 0.2 to less than 40 mass % relative to the whole of the film; and the magnetic particles comprise secondary particles formed by the agglomeration of primary particles.
    Type: Application
    Filed: June 12, 2014
    Publication date: June 2, 2016
    Inventors: Norihide Enomoto, Taichi Ogawa, Daisuke Hirama, Kam Hon Kuan, Mun Leong Kuan, Eu Jin Kuan, Mei Ling Cheah, Bin Mat Satar Mohd Zaidi