Patents by Inventor Melody W. Ma

Melody W. Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alleviating line end shortening by extending phase shifters
    Patent number: 6859918
    Abstract: One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by receiving a specification of the integrated circuit, wherein the specification defines transistors that include gates. Next, the system identifies a gate within the specification, wherein the gate includes an endcap that is susceptible to line end shortening during the optical lithography process. The system then extends a phase shifter used to form the gate, so that the phase shifter defines at least a portion of the endcap and thereby reduces line end shortening of the endcap due to optical effects.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: February 22, 2005
    Assignee: Numerical Technologies
    Inventors: Melody W. Ma, Hua-Yu Liu
  • Alleviating line end shortening in transistor endcaps by extending phase shifters
    Patent number: 6553560
    Abstract: One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by receiving a specification of the integrated circuit, wherein the specification defines transistors that include gates. Next, the system identifies a gate within the specification, wherein the gate includes an endcap that is susceptible to line end shortening during the optical lithography process. The system then extends a phase shifter used to form the gate, so that the phase shifter defines at least a portion of the endcap and thereby reduces line end shortening of the endcap due to optical effects.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: April 22, 2003
    Assignee: Numerical Technologies, Inc.
    Inventors: Melody W. Ma, Hua-Yu Liu
  • Alleviating line end shortening by extending phase shifters
    Publication number: 20030066038
    Abstract: One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by receiving a specification of the integrated circuit, wherein the specification defines transistors that include gates. Next, the system identifies a gate within the specification, wherein the gate includes an endcap that is susceptible to line end shortening during the optical lithography process. The system then extends a phase shifter used to form the gate, so that the phase shifter defines at least a portion of the endcap and thereby reduces line end shortening of the endcap due to optical effects.
    Type: Application
    Filed: December 6, 2002
    Publication date: April 3, 2003
    Applicant: Numerical Technologies, Inc.
    Inventors: Melody W. Ma, Hua-Yu Liu
  • Alleviating line end shortening in transistor endcaps by extending phase shifters
    Publication number: 20020144232
    Abstract: One embodiment of the invention provides a system and a method for reducing line end shortening during an optical lithography process for manufacturing an integrated circuit. The system operates by receiving a specification of the integrated circuit, wherein the specification defines transistors that include gates. Next, the system identifies a gate within the specification, wherein the gate includes an endcap that is susceptible to line end shortening during the optical lithography process. The system then extends a phase shifter used to form the gate, so that the phase shifter defines at least a portion of the endcap and thereby reduces line end shortening of the endcap due to optical effects.
    Type: Application
    Filed: May 31, 2001
    Publication date: October 3, 2002
    Applicant: Numerical Technologies, Inc.
    Inventors: Melody W. Ma, Hua-Yu Liu