Patents by Inventor Meng-Kai Zhu

Meng-Kai Zhu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabrication deep trench isolation structure
    Patent number: 8703577
    Abstract: A method for fabricating a deep trench isolation structure, wherein the method comprising steps as follows: A first hard mask layer, a second hard mask layer and a third hard mask layer are firstly formed in sequence on a substrate. The third hard mask layer is then patterned using the second hard mask layer as an etching stop layer. Subsequently, a trench etching process is performed using the patterned third hard mask layer as a mask to form a deep trench in the substrate.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: April 22, 2014
    Assignee: United Microelectronics Corp.
    Inventor: Meng-Kai Zhu