Patents by Inventor Michael A. Pickering
Michael A. Pickering has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7438884Abstract: A chemical vapor deposited, ? phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.Type: GrantFiled: August 2, 2004Date of Patent: October 21, 2008Assignee: Rohm and Haas Electronic Materials LLCInventors: Nathaniel E. Brese, Jitendra S. Goela, Michael A. Pickering
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Publication number: 20080226868Abstract: Chemical vapor deposited silicon carbide articles and the methods of making them are disclosed. The chemical vapor deposited silicon carbide articles are composed of multiple parts which are joined together by sintered ceramics joints. The joints strengthen and maintain tolerances at the joints of the articles. The articles may be used in semi-conductor processing.Type: ApplicationFiled: March 7, 2008Publication date: September 18, 2008Applicants: Rohm and Haas Electronic Materials LLC, AGC Electronic MaterialsInventors: Michael A. Pickering, Jamie L. Mayer, Kevin D. Lais
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Publication number: 20080000851Abstract: A wafer holding apparatus including a plurality of rods joined at opposite ends to endplates by joints having flanges with a fillet radius. The joints which join the component parts of the apparatus provide a stable wafer holding apparatus for manual handling as well as for the harsh processing conditions of semiconductor wafer processing chambers.Type: ApplicationFiled: June 1, 2007Publication date: January 3, 2008Applicant: Rohm and Haas Electronic Materials LLCInventors: Michael Pickering, Jitendra Goela, Jamie Triba, Thomas Payne
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Publication number: 20070128837Abstract: Methods are disclosed for providing reduced particle generating silicon carbide. The silicon carbide articles may be used as component parts in apparatus used to process semiconductor wafers. The reduced particle generation during semiconductor processing reduces contamination on semiconductor wafers thus increasing their yield.Type: ApplicationFiled: December 1, 2006Publication date: June 7, 2007Applicant: Rohm and Haas Electronic Materials LLCInventors: Jitendra Goela, Nathaniel Brese, Michael Pickering
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Publication number: 20070084827Abstract: Semiconductor processing and equipment are disclosed. The semiconductor equipment and processing provide semiconductor wafers with reduced defects.Type: ApplicationFiled: October 6, 2006Publication date: April 19, 2007Applicant: Rohm and Haas Electronic Materials LLCInventors: Jitendra Goela, Michael Pickering, James Fahey, Melinda Strickland
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Patent number: 7018947Abstract: Free standing articles of chemical vapor deposited silicon carbide with electrical resistivities of less than 0.9 ohm-cm are provided without substantially degrading its thermal conductivity or other properties.Type: GrantFiled: February 21, 2001Date of Patent: March 28, 2006Assignee: Shipley Company, L.L.C.Inventors: Jitendra S. Goela, Michael A. Pickering
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Patent number: 6939821Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: GrantFiled: June 6, 2002Date of Patent: September 6, 2005Assignee: Shipley Company, L.L.C.Inventors: Jitendra S. Goela, Michael A. Pickering
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Publication number: 20050145968Abstract: An optical article and method of making the same are provided. The optical article has optical multi-aperture operation. The optical article has one or more electrically conductive and selectively passivated patterns.Type: ApplicationFiled: November 6, 2004Publication date: July 7, 2005Applicant: Rohm and Haas Electronic Materials, L.L.C.Inventors: Jitendra Goela, Michael Pickering, Neil Brown, Angelo Chirafisi, Mark LeFebvre, Jamie Triba
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Patent number: 6872637Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: GrantFiled: July 16, 2003Date of Patent: March 29, 2005Assignee: Shipley Company, L.L.C.Inventors: Michael A. Pickering, Jitendra S. Goela
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Publication number: 20050000412Abstract: A chemical vapor deposited, ? phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.Type: ApplicationFiled: August 2, 2004Publication date: January 6, 2005Inventors: Nathaniel Brese, Jitendra Goela, Michael Pickering
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Publication number: 20040229395Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: ApplicationFiled: June 21, 2004Publication date: November 18, 2004Inventors: Jitendra S. Goela, Michael A. Pickering
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Patent number: 6811761Abstract: A chemical vapor deposited, &bgr; phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.Type: GrantFiled: November 9, 2001Date of Patent: November 2, 2004Assignee: Shipley Company, L.L.C.Inventors: Nathaniel E. Brese, Jitendra S. Goela, Michael A. Pickering
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Patent number: 6811040Abstract: A wafer holding apparatus composed of a plurality of rods joined at opposite ends by endplates. Each rod at each end is secured to the endplates by a mechanical dovetail joint. The dovetail joint secures the rods to the endplates without the need for sealing or coating agents. Also, auxiliary mechanical components such as nuts and bolts to secure the joint components need not be employed to secure the joint. Each rod has multiple grooves or slits for placing multiple semiconductor wafers that are to be processed in processing chambers. The wafer holding apparatus is oxidation resistant, chemical resistant and thermal shock resistant.Type: GrantFiled: July 9, 2002Date of Patent: November 2, 2004Assignee: Rohm and Haas CompanyInventors: Thomas Payne, Jitendra S. Goela, Lee E. Burns, Michael A. Pickering
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Publication number: 20040012024Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: ApplicationFiled: July 16, 2003Publication date: January 22, 2004Applicant: Shipley Company, L.L.C.Inventors: Michael A. Pickering, Jitendra S. Goela
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Patent number: 6648977Abstract: Near net shape free standing articles can be produced by chemical vapor deposition techniques when a suitable substrate is suspended in a chemical vapor deposition zone according to the disclosed technique. By suspending such substrates from linear suspension supports such as ropes, cables and wires, multiple near net shape articles can be produced with substantial manufacturing cost savings over previously employed techniques.Type: GrantFiled: July 17, 2001Date of Patent: November 18, 2003Assignee: Shipley Company, L.L.C.Inventors: Jitendra Singh Goela, Zlatko Salihbegovic, Michael A. Pickering, Mitch Boudreaux
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Publication number: 20030178735Abstract: A process of producing relatively large, dense, free-standing silicon carbide articles by chemical vapor deposition is enabled by the provision of specially designed isolation devices. These devices segregate silicon carbide deposits on the intended portions of substrates, thereby alleviating the need to fracture heavy silicon carbide deposits in order to remove, or otherwise move, the substrate, with the heavy deposit thereon, from the deposition furnace. The isolation devices enable the use of more efficient vertically extended vacuum furnaces. The isolation devices also enable the commercial production of relatively dense, large, thin-walled, silicon carbide shells.Type: ApplicationFiled: March 22, 2003Publication date: September 25, 2003Applicant: Shipley Company, L.L.C.Inventors: Jitendra Singh Goela, Michael A. Pickering
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Publication number: 20030059568Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: ApplicationFiled: October 24, 2001Publication date: March 27, 2003Applicant: Shipley Company, L.L.C.Inventors: Michael A. Pickering, Jitendra S. Goela
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Publication number: 20030036471Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.Type: ApplicationFiled: June 6, 2002Publication date: February 20, 2003Applicant: Shipley Company, L.L.C.Inventors: Jitendra S. Goela, Michael A. Pickering
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Publication number: 20030024888Abstract: A wafer holding apparatus composed of a plurality of rods joined at opposite ends by endplates. Each rod at each end is secured to the endplates by a mechanical dovetail joint. The dovetail joint secures the rods to the endplates without the need for sealing or coating agents. Also , auxiliary mechanical components such as nuts and bolts to secure the joint components need not be employed to secure the joint. Each rod has multiple grooves or slits for placing multiple semiconductor wafers that are to be processed in processing chambers. The wafer holding apparatus is oxidation resistant, chemical resistant and thermal shock resistant.Type: ApplicationFiled: July 9, 2002Publication date: February 6, 2003Applicant: Rohm and Haas CompanyInventors: Thomas Payne, Jitendra S. Goela, Lee E. Burns, Michael A. Pickering
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Patent number: 6464912Abstract: Near net shape free standing articles can be produced by chemical vapor deposition techniques when a suitable substrate is suspended in a chemical vapor deposition zone according to the disclosed technique. By suspending such substrates from linear suspension supports such as ropes, cables and wires, multiple near net shape articles can be produced with substantial manufacturing cost savings over previously employed techniques.Type: GrantFiled: January 6, 1999Date of Patent: October 15, 2002Assignee: CVD, IncorporatedInventors: Jitendra Singh Goela, Zlatko Salihbegovic, Michael A. Pickering, Mitch Boudreaux