Patents by Inventor Michael Belyanksy

Michael Belyanksy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Amorphous and polycrystalline silicon nanolaminate
    Publication number: 20040171177
    Abstract: A method for forming a uniform layered structure comprising an ultra-thin layer of amorphous silicon and its thermal oxide is disclosed. In one aspect, a method for forming a nanolaminate of silicon oxide on a substrate is disclosed. In another aspect, a method for forming a patterned hard mask on a substrate is disclosed. The patterned hard mask includes a nanolaminate of silicon and silicon oxide. The methods are characterized by the oxidation of an amorphous silicon layer using atomic oxygen.
    Type: Application
    Filed: March 4, 2004
    Publication date: September 2, 2004
    Inventors: Omer H. Dokumaci, Oleg Gluschenkov, Michael Belyanksy, Bruce B. Doris
  • Amorphous and polycrystalline silicon nanolaminate
    Patent number: 6764883
    Abstract: A method for forming a uniform layered structure comprising an ultra-thin layer of amorphous silicon and its thermal oxide is disclosed. In one aspect, a method for forming a nanolaminate of silicon oxide on a substrate is disclosed. In another aspect, a method for forming a patterned hard mask on a substrate is disclosed. The patterned hard mask includes a nanolaminate of silicon and silicon oxide. The methods are characterized by the oxidation of an amorphous silicon layer using atomic oxygen.
    Type: Grant
    Filed: January 7, 2003
    Date of Patent: July 20, 2004
    Assignee: International Business Machines Corp.
    Inventors: Omer H. Dokumaci, Oleg Gluschenkov, Michael Belyanksy, Bruce B. Doris
  • AMORPHOUS AND POLYCRYSTALLINE SILICON NANOLAMINATE
    Publication number: 20040129941
    Abstract: A method for forming a uniform layered structure comprising an ultra-thin layer of amorphous silicon and its thermal oxide is disclosed. In one aspect, a method for forming a nanolaminate of silicon oxide on a substrate is disclosed. In another aspect, a method for forming a patterned hard mask on a substrate is disclosed. The patterned hard mask includes a nanolaminate of silicon and silicon oxide. The methods are characterized by the oxidation of an amorphous silicon layer using atomic oxygen.
    Type: Application
    Filed: January 7, 2003
    Publication date: July 8, 2004
    Applicant: International Business Machines Corporation
    Inventors: Omer H. Dokumaci, Oleg Gluschenkov, Michael Belyanksy, Bruce B. Doris