Patents by Inventor Michael F. Schultz

Michael F. Schultz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for controlling vapor phase processing
    Patent number: 11891693
    Abstract: A semiconductor processing device can include a reactor assembly comprising a reaction chamber sized to receive a substrate therein. An exhaust line can be in fluid communication with the reaction chamber, the exhaust line configured to transfer gas out of the reaction chamber. A valve can be disposed along the exhaust line to regulate the flow of the gas along the exhaust line. A control system can be configured to operate in an open loop control mode to control the operation of the valve.
    Type: Grant
    Filed: August 11, 2020
    Date of Patent: February 6, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Jereld Lee Winkler, Cheuk Li, Michael F. Schultz, John Kevin Shugrue
  • SYSTEMS AND METHODS FOR CONTROLLING VAPOR PHASE PROCESSING
    Publication number: 20200370179
    Abstract: A semiconductor processing device can include a reactor assembly comprising a reaction chamber sized to receive a substrate therein. An exhaust line can be in fluid communication with the reaction chamber, the exhaust line configured to transfer gas out of the reaction chamber. A valve can be disposed along the exhaust line to regulate the flow of the gas along the exhaust line. A control system can be configured to operate in an open loop control mode to control the operation of the valve.
    Type: Application
    Filed: August 11, 2020
    Publication date: November 26, 2020
    Inventors: Jereld Lee Winkler, Cheuk Li, Michael F. Schultz, John Kevin Shugrue
  • Systems and methods for controlling vapor phase processing
    Patent number: 10774422
    Abstract: A semiconductor processing device can include a reactor assembly comprising a reaction chamber sized to receive a substrate therein. An exhaust line can be in fluid communication with the reaction chamber, the exhaust line configured to transfer gas out of the reaction chamber. A valve can be disposed along the exhaust line to regulate the flow of the gas along the exhaust line. A control system can be configured to operate in an open loop control mode to control the operation of the valve.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: September 15, 2020
    Assignee: ASM IP HOLDING B.V.
    Inventors: Jereld Lee Winkler, Cheuk Li, Michael F. Schultz, John Kevin Shugrue
  • SYSTEMS AND METHODS FOR CONTROLLING VAPOR PHASE PROCESSING
    Publication number: 20190368038
    Abstract: A semiconductor processing device can include a reactor assembly comprising a reaction chamber sized to receive a substrate therein. An exhaust line can be in fluid communication with the reaction chamber, the exhaust line configured to transfer gas out of the reaction chamber. A valve can be disposed along the exhaust line to regulate the flow of the gas along the exhaust line. A control system can be configured to operate in an open loop control mode to control the operation of the valve.
    Type: Application
    Filed: June 1, 2018
    Publication date: December 5, 2019
    Inventors: Jereld Lee Winkler, Cheuk Li, Michael F. Schultz, John Kevin Shugrue