Patents by Inventor Michael Giarratano

Michael Giarratano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radio frequency (RF) power filters and plasma processing systems including RF power filters
    Patent number: 8742666
    Abstract: A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.
    Type: Grant
    Filed: December 6, 2010
    Date of Patent: June 3, 2014
    Assignee: Lam Research Corporation
    Inventors: Maolin Long, Ralph Lu, Fred Egley, Thomas Anderson, Seyed Jafar Jafarian-Tehrani, Michael Giarratano
  • RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS INCLUDING RF POWER FILTERS
    Publication number: 20120032756
    Abstract: A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.
    Type: Application
    Filed: December 6, 2010
    Publication date: February 9, 2012
    Inventors: Maolin LONG, Ralph Lu, Fred Egley, Thomas Anderson, Seyed Jafar Jafarian-Tehrani, Michael Giarratano
  • Microwave plasma processor
    Patent number: 6016766
    Abstract: Ionizable gas supplied to an electron cyclotron resonance vacuum plasma processor chamber for semiconductor wafers is excited to a plasma state by microwave energy coupled to the chamber. The level of microwave power reflected from the chamber controls the level of microwave power derived from a source driving the ionizable gas in the chamber.
    Type: Grant
    Filed: December 29, 1997
    Date of Patent: January 25, 2000
    Assignee: Lam Research Corporation
    Inventors: David R. Pirkle, John Daugherty, Michael Giarratano, C. Robert Koemtzopoulos, Felix Kozakevich