Patents by Inventor Michael J. Begarney

Michael J. Begarney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHEMICAL VAPOR DEPOSITION REACTOR
    Publication number: 20140216341
    Abstract: A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly, adjustable proportional flow injector assembly, a chamber assembly, and a multi-segment center rotation shaft. The reactor provides a novel geometry to specific components that function to reduce the gas usage while also improving the performance of the deposition.
    Type: Application
    Filed: February 21, 2014
    Publication date: August 7, 2014
    Applicant: Valence Process Equipment, Inc.
    Inventors: Michael J. Begarney, Frank J. Campanale
  • CHEMICAL VAPOR DEPOSITION REACTOR
    Publication number: 20140216347
    Abstract: A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly, adjustable proportional flow injector assembly, a chamber assembly, and a multi-segment center rotation shaft. The reactor provides a novel geometry to specific components that function to reduce the gas usage while also improving the performance of the deposition.
    Type: Application
    Filed: February 21, 2014
    Publication date: August 7, 2014
    Applicant: Valence Process Equipment, Inc.
    Inventors: Michael J. Begarney, Frank J. Campanale
  • Chemical vapor deposition reactor
    Patent number: 8778079
    Abstract: A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly, adjustable proportional flow injector assembly, a chamber assembly, and a multi-segment center rotation shaft. The reactor provides a novel geometry to specific components that function to reduce the gas usage while also improving the performance of the deposition.
    Type: Grant
    Filed: October 9, 2008
    Date of Patent: July 15, 2014
    Assignee: Valence Process Equipment, Inc.
    Inventors: Michael J. Begarney, Frank J. Campanale
  • CHEMICAL VAPOR DEPOSITION REACTOR
    Publication number: 20120111271
    Abstract: A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly, adjustable proportional flow injector assembly, a chamber assembly, and a multi-segment center rotation shaft. The reactor provides a novel geometry to specific components that function to reduce the gas usage while also improving the performance of the deposition.
    Type: Application
    Filed: October 9, 2008
    Publication date: May 10, 2012
    Inventors: Michael J. Begarney, Frank J. Campanale