Abstract: An apparatus for preconditioning a filter media includes a reservoir containing a liquid; a pump operatively connected and in fluid communication with the reservoir; a filter housing operatively connected and in fluid communication with the reservoir and the pump, and having a filter media disposed therein; a control unit operatively connected to the pump; and wherein the pump is operable to circulate the liquid through the filter media to wet and remove air from the filter media prior to installation of the filter media in a processing application.

Abstract: An apparatus for preconditioning a filter media includes a reservoir containing a liquid; a pump operatively connected and in fluid communication with the reservoir; a filter housing operatively connected and in fluid communication with the reservoir and the pump, and having a filter media disposed therein; a control unit operatively connected to the pump; and wherein the pump is operable to circulate the liquid through the filter media to wet and remove air from the filter media prior to installation of the filter media in a processing application.

Abstract: A method and structure for improving a coating on a substrate comprises a chamber further comprising a rotatable holder, which holds the substrate; a supply of coating material for coating the substrate in the chamber; a window in the wall of the chamber; and a supply of liquid for coating at least a portion of the window on the interior side of the chamber. The chamber is preferably adapted to house the window in multiple configurations. A camera (or other optical detector), which is positioned outside of the chamber, monitors the substrate through the window.

Abstract: A calibration wafer for precisely aligning a wafer-handling system that processes a plurality of product wafers. The calibration wafer has radial and thickness dimensions and tolerances equivalent to those of the product wafers and further comprises a first center marker adapted for alignment with a second center marker external to the calibration wafer. The calibration wafer may be a component of a wafer center alignment device for precisely aligning a wafer-handling system in a calibration location in relation to a wafer-processing tool, the device further comprising an alignment jig adapted to be repeatably mounted on the tool and on which the second center marker is located. The calibration wafer is adapted to be positioned so that the first center marker aligns with the second center marker.