Patents by Inventor Michael L'Bassi
Michael L'Bassi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230304837Abstract: Devices and methods for mass flow verification are provided. A mass flow verifier includes a chamber configured to receive a fluid, a critical flow nozzle upstream of the chamber, a chamber valve, a downstream valve, and a bypass valve. The chamber valve is configured to selectively enable fluid flow from the critical flow nozzle to the chamber. The downstream valve is configured to selectively enable fluid flow from the chamber to a downstream location. The bypass valve is configured to selectively enable fluid flow from the critical flow nozzle to a dump location. The mass flow verifier further includes a controller configured to verify flow rate of the fluid based on a rate of rise in pressure of the fluid as detected by a pressure sensor in the chamber.Type: ApplicationFiled: March 23, 2022Publication date: September 28, 2023Inventors: Junhua Ding, Michael L'Bassi
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Patent number: 11513542Abstract: A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.Type: GrantFiled: June 10, 2020Date of Patent: November 29, 2022Assignee: MKS Instruments, Inc.Inventors: Michael L'Bassi, Mark J. Quaratiello, Junhua Ding
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Patent number: 11404290Abstract: In a pulse gas delivery system, a chamber is pre-charged to a prescribed pressure through an upstream valve. Thereafter, a downstream control valve is opened to control flow of the gas during a gas pulse. A dedicated controller may control the downstream control valve in a feedback loop during the pulse based on pressure and temperature detected during the pulse.Type: GrantFiled: April 5, 2019Date of Patent: August 2, 2022Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi
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Publication number: 20220161288Abstract: Pulsed gas delivery is obtained with mass flow control using a thermal mass flow sensor and control valve. The controller is augmented for pressure control with a downstream pressure sensor. In separate control modes of operation, the control valve is controlled in response to the flow sensor during pulse gas delivery mode and controlled in response to the downstream pressure sensor during pressure control mode of operation.Type: ApplicationFiled: November 18, 2021Publication date: May 26, 2022Inventors: Junhua Ding, Michael L'Bassi
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Patent number: 10969799Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode.Type: GrantFiled: October 23, 2018Date of Patent: April 6, 2021Assignee: MKS INSTRUMENTS, INC.Inventors: Junhua Ding, Michael L'Bassi, Tseng-Chung Lee
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Publication number: 20200321225Abstract: In a pulse gas delivery system, a chamber is pre-charged to a prescribed pressure through an upstream valve. Thereafter, a downstream control valve is opened to control flow of the gas during a gas pulse. A dedicated controller may control the downstream control valve in a feedback loop during the pulse based on pressure and temperature detected during the pulse.Type: ApplicationFiled: April 5, 2019Publication date: October 8, 2020Inventors: Junhua Ding, Michael L'Bassi
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Publication number: 20200301455Abstract: A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.Type: ApplicationFiled: June 10, 2020Publication date: September 24, 2020Inventors: Michael L'Bassi, Mark J. Quaratiello, Junhua Ding
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Publication number: 20200241578Abstract: A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.Type: ApplicationFiled: September 7, 2018Publication date: July 30, 2020Inventors: Michael L'Bassi, Mark J. Quaratiello, Junhua Ding
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Patent number: 10725484Abstract: A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.Type: GrantFiled: September 7, 2018Date of Patent: July 28, 2020Assignee: MKS Instruments, Inc.Inventors: Michael L'Bassi, Mark J. Quaratiello, Junhua Ding
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Patent number: 10698426Abstract: Fluid control systems, including mass flow control systems, mass flow ratio control systems, and mass flow and ratio control systems, as well as corresponding methods for fluid control are provided. These systems allow one shared pressure sensor to be used for multiple flow channels, and a controller which can accurately determine mass flow on the basis of fluid pressure detected by this shared pressure sensor.Type: GrantFiled: May 7, 2018Date of Patent: June 30, 2020Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Wayne Cole
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Patent number: 10649471Abstract: A fluid control system for pulse delivery of a fluid include a flow channel, an isolation valve to initiate and terminate a pulse of fluid from the flow channel, and a pulse mass flow controller (MFC). The MFC includes a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller to control flow of fluid through the control valve and switching of the isolation valve, to control a mass of fluid delivered during the pulse of fluid. Controlling the flow of fluid through the control valve can be based on feedback from the flow sensor during the pulse initiated and terminated by the isolation valve.Type: GrantFiled: February 2, 2018Date of Patent: May 12, 2020Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Gordon Hill
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Publication number: 20200081459Abstract: A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.Type: ApplicationFiled: September 7, 2018Publication date: March 12, 2020Inventors: Michael L'Bassi, Mark J. Quaratiello, Junhua Ding
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Patent number: 10514712Abstract: Methods, systems, and apparatus for pressure-based flow measurement are provided. A processor receives, from the pressure-based mass flow controller (MFC), an upstream pressure value Pu. The processor computes, for the pressure-based mass flow controller (MFC), a downstream pressure value Pd based on the received upstream pressure value Pu. The processor computes, for the pressure-based mass flow controller (MFC), a flow rate Q based on the received upstream pressure value Pu and the computed downstream pressure value Pd. The processor controls a flow through the pressure-based mass flow controller (MFC) based on the computed flow rate Q. The methods, systems, and apparatus can be used for flow measurement in non-critical or un-choked flow conditions.Type: GrantFiled: August 23, 2016Date of Patent: December 24, 2019Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi
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Publication number: 20190339725Abstract: Fluid control systems, including mass flow control systems, mass flow ratio control systems, and mass flow and ratio control systems, as well as corresponding methods for fluid control are provided. These systems allow one shared pressure sensor to be used for multiple flow channels, and a controller which can accurately determine mass flow on the basis of fluid pressure detected by this shared pressure sensor.Type: ApplicationFiled: May 7, 2018Publication date: November 7, 2019Inventors: Junhua Ding, Michael L'Bassi, Wayne Cole
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Publication number: 20190243392Abstract: A fluid control system for pulse delivery of a fluid include a flow channel, an isolation valve to initiate and terminate a pulse of fluid from the flow channel, and a pulse mass flow controller (MFC). The MFC includes a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller to control flow of fluid through the control valve and switching of the isolation valve, to control a mass of fluid delivered during the pulse of fluid. Controlling the flow of fluid through the control valve can be based on feedback from the flow sensor during the pulse initiated and terminated by the isolation valve.Type: ApplicationFiled: February 2, 2018Publication date: August 8, 2019Inventors: Junhua Ding, Michael L'Bassi, Gordon Hill
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Patent number: 10353408Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the dedicated controller is configured and arranged to delivery pulses of gas in accordance with anyone of three different types of pulse gas delivery processes: a time based pulse delivery process, a mole based pulse delivery process and a profile based pulse delivery process.Type: GrantFiled: January 5, 2012Date of Patent: July 16, 2019Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Tseng-Chung Lee
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Publication number: 20190056755Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode.Type: ApplicationFiled: October 23, 2018Publication date: February 21, 2019Inventors: Junhua Ding, Michael L'Bassi, Tseng-Chung Lee
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Patent number: 10126760Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode.Type: GrantFiled: March 13, 2014Date of Patent: November 13, 2018Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Tseng-Chung Lee
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Patent number: 10031004Abstract: A mass flow verifier (MFV) that is space-efficient and can verify flow rates for unknown fluids over a wide range of flow rates includes a chamber configured to receive a fluid, a critical flow nozzle connected to the chamber, and first and second pressure sensors that, respectively, detect fluid pressure in the chamber and upstream of the critical flow nozzle. A controller of the MFV is configured to verify flow rate of the fluid by, (i) at a first flow range, measuring a first flow rate based on a rate of rise in pressure of the fluid as detected by the first pressure sensor and determining a gas property function of the fluid based on pressures as detected by the first second pressure sensors, and (ii) at a second flow range, measuring a second flow rate based on pressure detected by the second pressure sensor and the determined gas property function.Type: GrantFiled: December 15, 2016Date of Patent: July 24, 2018Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi, Wayne Cole
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Publication number: 20180172491Abstract: A mass flow verifier (MFV) that is space-efficient and can verify flow rates for unknown fluids over a wide range of flow rates includes a chamber configured to receive a fluid, a critical flow nozzle connected to the chamber, and first and second pressure sensors that, respectively, detect fluid pressure in the chamber and upstream of the critical flow nozzle. A controller of the MFV is configured to verify flow rate of the fluid by, (i) at a first flow range, measuring a first flow rate based on a rate of rise in pressure of the fluid as detected by the first pressure sensor and determining a gas property function of the fluid based on pressures as detected by the first second pressure sensors, and (ii) at a second flow range, measuring a second flow rate based on pressure detected by the second pressure sensor and the determined gas property function.Type: ApplicationFiled: December 15, 2016Publication date: June 21, 2018Inventors: Junhua Ding, Michael L'Bassi, Wayne Cole