Abstract: A chemical-mechanical polishing (“CMP”) composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of A/-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group consisting of: (C1) an acetylene alcohol, and (C2) a salt or an adduct of (C2a) an amine, and (C2b) a carboxylic acid comprising an amide moiety, (D) at least one type of an oxidizing agent, (E) at least one type of a complexing agent, and (F) an aqueous medium.

Abstract: A chemical mechanical polishing (CMP) composition, comprising (A) at least one type of inorganic particles which are dispersed in the liquid medium (C), (B) at least one type of polymer particles which are dispersed in the liquid medium (C), (C) a liquid medium, wherein the zeta-potential of the inorganic particles (A) in the liquid medium (C) and the zeta-potential of the polymer particles in the liquid medium (C) are of same signs.

Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) a carbonate or hydrogen carbonate salt, (D) an alcohol, and (M) an aqueous medium.

Abstract: Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous medium.

Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) an aromatic compound comprising at least one acid group (Y), or a salt thereof, and (M) an aqueous medium.

Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) a carbonate or hydrogen carbonate salt, (D) an alcohol, and (M) an aqueous medium.

Abstract: A chemical-mechanical polishing (CMP) composition comprising (A) inorganic particles, organic particles, or a composite or mixture thereof, (B) a polymeric polyamine or a salt thereof comprising at least one type of pendant group (Y) which comprises at least one moiety (Z), wherein (Z) is a carboxylate (—COOR1), sulfonate (—SO3R2), sulfate (—O—SO3R3), phosphonate (—P(?O) (OR4)(OR5)), phosphate (—O—P(?O)(OR6)(OR7)), carboxylic acid (—COOH), sulfonic acid (—SO3H), sulfuric acid (—O—SO3—), phosphonic acid (—P(?O)(OH)2), phosphoric acid (—O—P(?O)(OH)2) moiety, or their deprotonated forms, R1 is alkyl, aryl, alkylaryl, or arylalkyl R2 is alkyl, aryl, alkylaryl, or arylalkyl, R3 is alkyl, aryl, alkylaryl, or arylalkyl, R4 is alkyl, aryl, alkylaryl, or arylalkyl, R5 is H, alkyl, aryl, alkylaryl, or arylalkyl, R6 is alkyl, aryl, alkylaryl, or arylalkyl, R7 is H, alkyl, aryl, alkylaryl, or arylalkyl, and (C) an aqueous medium.

Abstract: A chemical mechanical polishing (CMP) composition, comprising (A) at least one type of inorganic particles which are dispersed in the liquid medium (C), (B) at least one type of polymer particles which are dispersed in the liquid medium (C), (C) a liquid medium, wherein the zeta-potential of the inorganic particles (A) in the liquid medium (C) and the zeta-potential of the polymer particles in the liquid medium (C) are of same signs.

Abstract: Raspberry-type coated particles comprising a core selected from the group consisting of metal oxides of Si, Ti, Zr, Al, Zn and mixtures thereof with a core size of from 20 to 100 nm wherein the core is coated with CeCO2 particles having a particle size below 10 nm; process for preparing raspberry type coated particles comprising the steps of i) providing a mixture containing: a) core particles selected from the group of metal oxides of Si, Ti, Zr, Al, Zn and mixtures thereof, with a particle size of from 20 to 100 nm; b) a water soluble Ce-salt and c) water; ii) adding an organic or inorganic base to the mixture of step i) at temperatures of from 10 to 90° C. and iii) aging the mixture at temperatures of from 10 to 90° C.; and polishing agents containing the particles and their use for polishing surfaces.

Abstract: The process and the apparatus are used for low-temperature air fractionation. Input air (8) is cooled in a main heat exchanger (9) and introduced into a single column (12) for obtaining nitrogen (11, 43). A nitrogen product stream (15, 16, 17) is removed from the upper region of the single column (12). A first residual fraction (18, 29) is removed from the lower or central region of the single column (12), re-compressed (30) and then fed to the single column (12) again (32). An oxygen-containing stream (36) is removed from the single column (12) at an intermediate point and fed to a pure oxygen column (38) (39). A pure oxygen product stream (41) in the liquid state is removed from the lower region of the pure oxygen column (38). The pure oxygen product stream (41, 56) is evaporated and warmed with respect to input air (8) in the main heat exchanger (9) and finally obtained as a gaseous product (57).

Abstract: A light emitting composition includes a light-emitting lumophore-functionalized nanoparticle, such as an organic-inorganic light-emitting lumophore-functionalized nanoparticle. A light emitting device includes an anode, a cathode, and a layer containing such a light-emitting composition. In an embodiment, the light emitting device can emit white light.

Abstract: The invention relates to a process and apparatus for producing nitrogen by low-temperature fractionation of air in a rectification system which has a high-pressure column (4) and a low-pressure column (5). Feed air (1, 3) is introduced into the high-pressure column (4). An oxygen-containing liquid fraction (11) is removed from the high-pressure column (4) and fed into the low-pressure column (5). Gaseous nitrogen (18) is extracted from the low-pressure column (5) above a mass transfer section (25), which has at least one theoretical or practical plate, and is at least partially condensed in a top condenser (17) by indirect heat exchange with a refrigerant (13). High-purity nitrogen is removed from the low-pressure column below the mass transfer section (25), and is obtained as a nitrogen product (26, 27, 30). The process and apparatus have a refrigeration-supply system, in which a refrigeration fluid (31) flows.

Abstract: An apparatus and process for producing gaseous oxygen under elevated pressure utilize a distillation column system which has a high-pressure column (106), a low-pressure column (107) located above the high-pressure column (106), and a side condenser (102), which has a liquefaction space and a vaporization space, used to vaporize a liquid oxygen fraction from the low-pressure column (107). The side condenser (102) is located below the high-pressure column (106).

Abstract: An apparatus and process for producing gaseous oxygen under elevated pressure utilize a distillation column system which has a high-pressure column (106), a low-pressure column (107) located above the high-pressure column (106), and a side condenser (102), which has a liquefaction space and a vaporization space, used to vaporize a liquid oxygen fraction from the low-pressure column (107). The side condenser (102) is located below the high-pressure column (106).

Abstract: The invention relates to a process and apparatus for producing nitrogen by low-temperature fractionation of air in a rectification system which has a high-pressure column (4) and a low-pressure column (5). Feed air (1, 3) is introduced into the high-pressure column (4). An oxygen-containing liquid fraction (11) is removed from the high-pressure column (4) and fed into the low-pressure column (5). Gaseous nitrogen (18) is extracted from the low-pressure column (5) above a mass transfer section (25), which has at least one theoretical or practical plate, and is at least partially condensed in a top condenser (17) by indirect heat exchange with a refrigerant (13). High-purity nitrogen is removed from the low-pressure column below the mass transfer section (25), and is obtained as a nitrogen product (26, 27, 30). The process and apparatus have a refrigeration-supply system, in which a refrigeration fluid (31) flows.