Abstract: A coupler and a chuck are described. The chuck is configured to secure an article while the wafer is undergoing an inspection process. The chuck has a plurality of vacuum areas. Some vacuum areas hold the wafer in place while other vacuum areas suction couplant from the edge surface of the wafer. The coupler is used to inspect a surface and subsurface of the wafer for defects and includes a sensing device, which may be a transducer. One or more couplant inlet couplings are disposed on a second portion of the coupler, the couplant inlet couplings provide a couplant to a portion of the wafer inspected by the sensing device. A plurality of vacuum inlet couplings is disposed on a third portion of the coupler. At least one of the vacuum inlet couplings provide suction through a recessed portion of a lower surface of the coupler to remove couplant that is outside the portion of the wafer that is being inspected by the sensing device.

Abstract: A wafer chuck includes a support structure having a first side structurally configured to support a wafer, and a vacuum zone formed on the first side of the support structure. The vacuum zone may be at least partially bounded by a ring extending from a recessed surface of the first side of the support structure. The wafer chuck further includes a plurality of suction cups disposed in the vacuum zone, where one or more of the plurality of suction cups is coupled with a channel extending through the support structure. One or more vacuums are in fluid communication with the channel, where a vacuum is structurally configured to provide suction through the channel.

Abstract: An adjustable fixture for holding a sample for inspection with a scanning acoustic microscope includes a first horizontal bar disposed on a first end of a frame, and a second horizontal bar disposed on a second end of the frame. The second horizontal bar may be engaged with the frame to be movable between the first end and the second end of the frame. The adjustable fixture may further include a side bar disposed on one or more of the first side and the second side of the frame, with an end of the second horizontal bar slidable and lockable along the side bar, and an engagement mechanism releasably coupling the end of the second horizontal bar to the side bar.

Abstract: A wafer chuck includes a support structure having a first side structurally configured to support a wafer, and a vacuum zone formed on the first side of the support structure. The vacuum zone may be at least partially bounded by a ring extending from a recessed surface of the first side of the support structure. The wafer chuck further includes a plurality of suction cups disposed in the vacuum zone, where one or more of the plurality of suction cups is coupled with a channel extending through the support structure. One or more vacuums are in fluid communication with the channel, where a vacuum is structurally configured to provide suction through the channel.

Abstract: An adjustable fixture for holding a sample for inspection with a scanning acoustic microscope includes a first horizontal bar disposed on a first end of a frame, and a second horizontal bar disposed on a second end of the frame. The second horizontal bar may be engaged with the frame to be movable between the first end and the second end of the frame. The adjustable fixture may further include a side bar disposed on one or more of the first side and the second side of the frame, with an end of the second horizontal bar slidable and lockable along the side bar, and an engagement mechanism releasably coupling the end of the second horizontal bar to the side bar.