Patents by Inventor Michael Matthew M. CROUSE

Michael Matthew M. CROUSE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lens heating aware source mask optimization for advanced lithography
    Patent number: 9940427
    Abstract: A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: April 10, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Michael Matthew M. Crouse, Youri Johannes Laurentius Maria Van Dommelen, Peng Liu, Hua-Yu Liu, Aiqin Jiang, Wenjin Huang
  • LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY
    Publication number: 20130212543
    Abstract: A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.
    Type: Application
    Filed: January 29, 2013
    Publication date: August 15, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michael Matthew M. CROUSE, Youri Johannes Laurentius Maria VAN DOMMELEN, Peng LIU, Hua-Yu LIU, Aiqin JIANG, Wenjin HUANG